DE69808171D1 - Entfernung von Phosphor aus Chlorosilan - Google Patents

Entfernung von Phosphor aus Chlorosilan

Info

Publication number
DE69808171D1
DE69808171D1 DE69808171T DE69808171T DE69808171D1 DE 69808171 D1 DE69808171 D1 DE 69808171D1 DE 69808171 T DE69808171 T DE 69808171T DE 69808171 T DE69808171 T DE 69808171T DE 69808171 D1 DE69808171 D1 DE 69808171D1
Authority
DE
Germany
Prior art keywords
chlorosilane
phosphorus
removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69808171T
Other languages
English (en)
Other versions
DE69808171T2 (de
Inventor
Ming-Shin Tzou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of DE69808171D1 publication Critical patent/DE69808171D1/de
Application granted granted Critical
Publication of DE69808171T2 publication Critical patent/DE69808171T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/128—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions covered by more than one of the groups C07F7/122 - C07F7/127 and of which the starting material is unknown or insufficiently determined

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
DE69808171T 1997-04-28 1998-04-27 Entfernung von Phosphor aus Chlorosilan Expired - Lifetime DE69808171T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/846,190 US5723644A (en) 1997-04-28 1997-04-28 Phosphorous removal from chlorosilane

Publications (2)

Publication Number Publication Date
DE69808171D1 true DE69808171D1 (de) 2002-10-31
DE69808171T2 DE69808171T2 (de) 2003-05-22

Family

ID=25297201

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69808171T Expired - Lifetime DE69808171T2 (de) 1997-04-28 1998-04-27 Entfernung von Phosphor aus Chlorosilan

Country Status (4)

Country Link
US (1) US5723644A (de)
EP (1) EP0878477B1 (de)
JP (1) JPH10316691A (de)
DE (1) DE69808171T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458984B1 (en) * 2000-03-31 2002-10-01 Advanced Technology Materials, Inc. Chemical method for removal and analysis of boron impurities in tetraethylorthosilicate (TEOS)
US7273588B1 (en) * 2003-07-17 2007-09-25 Air Liquide America L.P. Methods of sampling halosilanes for metal analytes
CN101148453B (zh) * 2006-09-21 2010-05-12 蓝星化工新材料股份有限公司 一种有机氯硅烷气体干法除尘方法及其装置
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
WO2013089014A1 (ja) * 2011-12-16 2013-06-20 東亞合成株式会社 高純度クロロポリシランの製造方法
DE102014220539A1 (de) * 2014-10-09 2016-04-14 Wacker Chemie Ag Reinigung von Chlorsilanen mittels Destillation und Adsorption
CN107235494A (zh) * 2017-07-05 2017-10-10 四川瑞能硅材料有限公司 一种去除高纯氯硅烷痕量杂质的装置和方法
CN108299492A (zh) * 2018-03-15 2018-07-20 河北百灵威超精细材料有限公司 一种有机硅化合物的纯化方法
EP4065512B1 (de) * 2019-11-27 2024-03-20 Wacker Chemie AG Verfahren zur entfernung einer verunreinigung aus einem chlorsilangemisch

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL241272A (de) * 1958-07-14
BE632835A (de) * 1962-06-04
US4099936A (en) * 1976-12-16 1978-07-11 Union Carbide Corporation Process for the purification of silane
US4156689A (en) * 1978-02-13 1979-05-29 General Electric Company Purification of hydrosilanes and siloxanes
US4374110A (en) * 1981-06-15 1983-02-15 Motorola, Inc. Purification of silicon source materials
US4481178A (en) * 1982-11-08 1984-11-06 General Electric Company Purification of chlorosilanes
JP2570409B2 (ja) * 1988-12-06 1997-01-08 三菱マテリアル株式会社 クロロポリシランの精製方法
US5232602A (en) * 1992-07-01 1993-08-03 Hemlock Semiconductor Corporation Phosphorous removal from tetrachlorosilane
US5567836A (en) * 1995-11-29 1996-10-22 Dow Corning Corporation Process for separation of methyltrichlorosilane from dimethyldichlorosilane

Also Published As

Publication number Publication date
DE69808171T2 (de) 2003-05-22
EP0878477A1 (de) 1998-11-18
EP0878477B1 (de) 2002-09-25
JPH10316691A (ja) 1998-12-02
US5723644A (en) 1998-03-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: KROHER, STROBEL RECHTS- UND PATENTANWAELTE, 80336

8328 Change in the person/name/address of the agent

Representative=s name: DR. SCHOEN & PARTNER, 80336 MUENCHEN