DE69725430D1 - Elektrochemische entfernung von material insbesondere von überflüssigem emittierendem material, in einer elektronenemittierenden vorrichtung - Google Patents

Elektrochemische entfernung von material insbesondere von überflüssigem emittierendem material, in einer elektronenemittierenden vorrichtung

Info

Publication number
DE69725430D1
DE69725430D1 DE69725430T DE69725430T DE69725430D1 DE 69725430 D1 DE69725430 D1 DE 69725430D1 DE 69725430 T DE69725430 T DE 69725430T DE 69725430 T DE69725430 T DE 69725430T DE 69725430 D1 DE69725430 D1 DE 69725430D1
Authority
DE
Germany
Prior art keywords
emitting
electron
excessive
emitting device
electrochemical removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69725430T
Other languages
English (en)
Other versions
DE69725430T2 (de
Inventor
J Spindt
S Chakarova
S Nikolova
C Searson
A Haven
Johan Knall
M Macaulay
W Barton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Candescent Intellectual Property Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Candescent Intellectual Property Services Inc filed Critical Candescent Intellectual Property Services Inc
Application granted granted Critical
Publication of DE69725430D1 publication Critical patent/DE69725430D1/de
Publication of DE69725430T2 publication Critical patent/DE69725430T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
DE69725430T 1996-03-05 1997-03-05 Elektrochemische entfernung von material insbesondere von überflüssigem emittierendem material, in einer elektronenemittierenden vorrichtung Expired - Lifetime DE69725430T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/610,729 US5766446A (en) 1996-03-05 1996-03-05 Electrochemical removal of material, particularly excess emitter material in electron-emitting device
US610729 1996-03-05
PCT/US1997/002973 WO1997033297A1 (en) 1996-03-05 1997-03-05 Electrochemical removal of material, particularly excess emitter material in electron-emitting device

Publications (2)

Publication Number Publication Date
DE69725430D1 true DE69725430D1 (de) 2003-11-13
DE69725430T2 DE69725430T2 (de) 2004-07-22

Family

ID=24446186

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69725430T Expired - Lifetime DE69725430T2 (de) 1996-03-05 1997-03-05 Elektrochemische entfernung von material insbesondere von überflüssigem emittierendem material, in einer elektronenemittierenden vorrichtung
DE0885452T Pending DE885452T1 (de) 1996-03-05 1997-03-05 Elektrochemische entfernung von material insbesondere von überflüssigem emitterendem material, in einer elektronenemitterenden vorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE0885452T Pending DE885452T1 (de) 1996-03-05 1997-03-05 Elektrochemische entfernung von material insbesondere von überflüssigem emitterendem material, in einer elektronenemitterenden vorrichtung

Country Status (7)

Country Link
US (1) US5766446A (de)
EP (1) EP0885452B1 (de)
JP (1) JP3747291B2 (de)
KR (1) KR100305986B1 (de)
DE (2) DE69725430T2 (de)
HK (1) HK1016744A1 (de)
WO (1) WO1997033297A1 (de)

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US6027632A (en) * 1996-03-05 2000-02-22 Candescent Technologies Corporation Multi-step removal of excess emitter material in fabricating electron-emitting device
US5863233A (en) * 1996-03-05 1999-01-26 Candescent Technologies Corporation Field emitter fabrication using open circuit electrochemical lift off
US5893967A (en) * 1996-03-05 1999-04-13 Candescent Technologies Corporation Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device
US6500885B1 (en) * 1997-02-28 2002-12-31 Candescent Technologies Corporation Polycarbonate-containing liquid chemical formulation and methods for making and using polycarbonate film
US6120674A (en) * 1997-06-30 2000-09-19 Candescent Technologies Corporation Electrochemical removal of material in electron-emitting device
JP3648255B2 (ja) * 1997-06-30 2005-05-18 キャンデセント・インテレクチュアル・プロパティ・サービシーズ・インコーポレイテッド 電子放出デバイスにおいて材料、特に余分なエミッタ材料を除去するためのインピーダンス利用電気化学技術及び電気化学的方法
US6007695A (en) * 1997-09-30 1999-12-28 Candescent Technologies Corporation Selective removal of material using self-initiated galvanic activity in electrolytic bath
US6103095A (en) * 1998-02-27 2000-08-15 Candescent Technologies Corporation Non-hazardous wet etching method
US6392750B1 (en) 1999-08-31 2002-05-21 Candescent Technologies Corporation Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display
WO2001035435A1 (en) * 1999-11-12 2001-05-17 Orion Electric Co., Ltd. Electron tube cathode and method for manufacturing the same
US6991526B2 (en) * 2002-09-16 2006-01-31 Applied Materials, Inc. Control of removal profile in electrochemically assisted CMP
US6848970B2 (en) * 2002-09-16 2005-02-01 Applied Materials, Inc. Process control in electrochemically assisted planarization
US20040182721A1 (en) * 2003-03-18 2004-09-23 Applied Materials, Inc. Process control in electro-chemical mechanical polishing
US6821409B2 (en) * 2001-04-06 2004-11-23 Asm-Nutool, Inc. Electroetching methods and systems using chemical and mechanical influence
ATE366633T1 (de) * 2001-04-27 2007-08-15 Erowa Ag Spannvorrichtung
US6837983B2 (en) * 2002-01-22 2005-01-04 Applied Materials, Inc. Endpoint detection for electro chemical mechanical polishing and electropolishing processes
US7312305B2 (en) * 2002-03-20 2007-12-25 Morehouse School Of Medicine Tumor cytotoxicity induced by modulators of the CXCR4 receptor
US20040072445A1 (en) * 2002-07-11 2004-04-15 Applied Materials, Inc. Effective method to improve surface finish in electrochemically assisted CMP
US7112270B2 (en) * 2002-09-16 2006-09-26 Applied Materials, Inc. Algorithm for real-time process control of electro-polishing
US20050061674A1 (en) * 2002-09-16 2005-03-24 Yan Wang Endpoint compensation in electroprocessing
US7842169B2 (en) * 2003-03-04 2010-11-30 Applied Materials, Inc. Method and apparatus for local polishing control
JP4803998B2 (ja) * 2004-12-08 2011-10-26 ソニー株式会社 電界放出型電子放出素子の製造方法
US7655565B2 (en) * 2005-01-26 2010-02-02 Applied Materials, Inc. Electroprocessing profile control
US20070218587A1 (en) * 2006-03-07 2007-09-20 Applied Materials, Inc. Soft conductive polymer processing pad and method for fabricating the same
US7422982B2 (en) * 2006-07-07 2008-09-09 Applied Materials, Inc. Method and apparatus for electroprocessing a substrate with edge profile control
TWI339444B (en) 2007-05-30 2011-03-21 Au Optronics Corp Conductor structure, pixel structure, and methods of forming the same
TWI437615B (zh) * 2011-06-07 2014-05-11 Au Optronics Corp 場發射顯示元件之製作方法及應用於製作場發射顯示元件之電化學系統

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US3407125A (en) * 1965-01-18 1968-10-22 Corning Glass Works Method of making filamentary metal structures
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US5007873A (en) * 1990-02-09 1991-04-16 Motorola, Inc. Non-planar field emission device having an emitter formed with a substantially normal vapor deposition process
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US5217586A (en) * 1992-01-09 1993-06-08 International Business Machines Corporation Electrochemical tool for uniform metal removal during electropolishing
US5477105A (en) * 1992-04-10 1995-12-19 Silicon Video Corporation Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tubes
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US5462467A (en) * 1993-09-08 1995-10-31 Silicon Video Corporation Fabrication of filamentary field-emission device, including self-aligned gate
FR2723799B1 (fr) * 1994-08-16 1996-09-20 Commissariat Energie Atomique Procede de fabrication d'une source d'electrons a micropointes
GB9416754D0 (en) * 1994-08-18 1994-10-12 Isis Innovation Field emitter structures
FR2726122B1 (fr) * 1994-10-19 1996-11-22 Commissariat Energie Atomique Procede de fabrication d'une source d'electrons a micropointes
US5458520A (en) * 1994-12-13 1995-10-17 International Business Machines Corporation Method for producing planar field emission structure

Also Published As

Publication number Publication date
DE69725430T2 (de) 2004-07-22
DE885452T1 (de) 1999-07-22
US5766446A (en) 1998-06-16
EP0885452A1 (de) 1998-12-23
HK1016744A1 (en) 1999-11-05
KR100305986B1 (ko) 2001-12-17
WO1997033297A1 (en) 1997-09-12
JP3747291B2 (ja) 2006-02-22
KR19990087637A (ko) 1999-12-27
JP2000506224A (ja) 2000-05-23
EP0885452B1 (de) 2003-10-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CANON K.K., TOKYO, JP

8328 Change in the person/name/address of the agent

Representative=s name: BOEHMERT & BOEHMERT, 28209 BREMEN