DE69723699D1 - Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens - Google Patents

Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens

Info

Publication number
DE69723699D1
DE69723699D1 DE69723699T DE69723699T DE69723699D1 DE 69723699 D1 DE69723699 D1 DE 69723699D1 DE 69723699 T DE69723699 T DE 69723699T DE 69723699 T DE69723699 T DE 69723699T DE 69723699 D1 DE69723699 D1 DE 69723699D1
Authority
DE
Germany
Prior art keywords
substrate
electrodes
cleaning
carrying
counter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69723699T
Other languages
English (en)
Other versions
DE69723699T2 (de
Inventor
Brande Pierre Vanden
Alain Weymeersch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Publication of DE69723699D1 publication Critical patent/DE69723699D1/de
Application granted granted Critical
Publication of DE69723699T2 publication Critical patent/DE69723699T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/32779—Continuous moving of batches of workpieces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Physical Vapour Deposition (AREA)
  • Transplanting Machines (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69723699T 1997-10-08 1997-10-08 Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens Expired - Lifetime DE69723699T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97203136A EP0908535B1 (de) 1997-10-08 1997-10-08 Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens

Publications (2)

Publication Number Publication Date
DE69723699D1 true DE69723699D1 (de) 2003-08-28
DE69723699T2 DE69723699T2 (de) 2004-06-17

Family

ID=8228812

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69723699T Expired - Lifetime DE69723699T2 (de) 1997-10-08 1997-10-08 Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens

Country Status (8)

Country Link
US (1) US6231727B1 (de)
EP (1) EP0908535B1 (de)
JP (1) JP4004152B2 (de)
AT (1) ATE245717T1 (de)
DE (1) DE69723699T2 (de)
DK (1) DK0908535T3 (de)
ES (1) ES2203748T3 (de)
PT (1) PT908535E (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000320464A (ja) * 1999-05-10 2000-11-21 Saginomiya Seisakusho Inc 容量可変型圧縮機用制御弁
WO2001029278A1 (en) * 1999-10-15 2001-04-26 Advanced Energy Industries, Inc. Method and apparatus for substrate biasing in multiple electrode sputtering systems
CN1323409C (zh) * 2001-06-08 2007-06-27 松下电器产业株式会社 两面金属化膜制造方法以及使用它的金属化膜电容器
EP1783814A1 (de) * 2005-11-07 2007-05-09 ARCELOR France Verfahren und Einrichtung zum Reinigen eines Metallbandes mittels Magnetron-Zerstäubung
EP1783815A1 (de) * 2005-11-07 2007-05-09 ARCELOR France Verfahren und Anlage zum Ätzen eines Metallbandes mittels Vakuum-Magnetron-Zerstäubung
US20110233049A1 (en) * 2007-08-30 2011-09-29 Koninklijke Philips Electronics N.V. Sputtering system
JP5810462B2 (ja) * 2011-07-21 2015-11-11 地方独立行政法人山口県産業技術センター プラズマ処理装置及び基材の表面処理方法
WO2019003809A1 (ja) * 2017-06-30 2019-01-03 凸版印刷株式会社 フィルムの処理方法及びフィルムの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2867912A (en) * 1956-05-11 1959-01-13 Horace Dawson Method for the decontamination of metal foils
JPS60126832A (ja) * 1983-12-14 1985-07-06 Hitachi Ltd ドライエツチング方法および装置
JPS62274080A (ja) * 1986-05-21 1987-11-28 Hitachi Ltd プラズマ処理方法
US5283087A (en) * 1988-02-05 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Plasma processing method and apparatus
US5178739A (en) * 1990-10-31 1993-01-12 International Business Machines Corporation Apparatus for depositing material into high aspect ratio holes
JPH0768620B2 (ja) * 1991-09-30 1995-07-26 中外炉工業株式会社 金属ストリップの表面清浄化装置

Also Published As

Publication number Publication date
JP4004152B2 (ja) 2007-11-07
PT908535E (pt) 2003-11-28
EP0908535B1 (de) 2003-07-23
US6231727B1 (en) 2001-05-15
ES2203748T3 (es) 2004-04-16
DK0908535T3 (da) 2003-11-10
DE69723699T2 (de) 2004-06-17
JPH11209886A (ja) 1999-08-03
ATE245717T1 (de) 2003-08-15
EP0908535A1 (de) 1999-04-14

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Legal Events

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8364 No opposition during term of opposition