DE69637696D1 - Leistungsversorgung für multielektroden-entladung - Google Patents

Leistungsversorgung für multielektroden-entladung

Info

Publication number
DE69637696D1
DE69637696D1 DE69637696T DE69637696T DE69637696D1 DE 69637696 D1 DE69637696 D1 DE 69637696D1 DE 69637696 T DE69637696 T DE 69637696T DE 69637696 T DE69637696 T DE 69637696T DE 69637696 D1 DE69637696 D1 DE 69637696D1
Authority
DE
Germany
Prior art keywords
multichectrode
discharge
power supply
supply
power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69637696T
Other languages
English (en)
Inventor
Kazunori Matsumoto
Toru Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MUSASHINO KIKAI CO Ltd
Original Assignee
MUSASHINO KIKAI CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP16137995A external-priority patent/JPH08330079A/ja
Priority claimed from JP16138095A external-priority patent/JPH08333103A/ja
Priority claimed from JP7180792A external-priority patent/JPH097792A/ja
Priority claimed from JP7184689A external-priority patent/JPH0913168A/ja
Application filed by MUSASHINO KIKAI CO Ltd filed Critical MUSASHINO KIKAI CO Ltd
Application granted granted Critical
Publication of DE69637696D1 publication Critical patent/DE69637696D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C01B13/115—Preparation of ozone by electric discharge characterised by the electrical circuits producing the electrical discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/10—Dischargers used for production of ozone
    • C01B2201/12—Plate-type dischargers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/64—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/90—Control of the process
DE69637696T 1995-06-05 1996-06-05 Leistungsversorgung für multielektroden-entladung Expired - Fee Related DE69637696D1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP16137995A JPH08330079A (ja) 1995-06-05 1995-06-05 多電極型放電用電源装置
JP16138095A JPH08333103A (ja) 1995-06-05 1995-06-05 位相制御多電極型オゾナイザー
JP7180792A JPH097792A (ja) 1995-06-23 1995-06-23 多相交流多電極放電による薄膜形成装置
JP7184689A JPH0913168A (ja) 1995-06-28 1995-06-28 位相制御多電極型放電表面処理装置
PCT/JP1996/001521 WO1996039794A1 (fr) 1995-06-05 1996-06-05 Alimentation servant a une decharge par electrodes multiples

Publications (1)

Publication Number Publication Date
DE69637696D1 true DE69637696D1 (de) 2008-11-13

Family

ID=27473726

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69637696T Expired - Fee Related DE69637696D1 (de) 1995-06-05 1996-06-05 Leistungsversorgung für multielektroden-entladung

Country Status (4)

Country Link
US (1) US5932116A (de)
EP (1) EP0831679B1 (de)
DE (1) DE69637696D1 (de)
WO (1) WO1996039794A1 (de)

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US6395128B2 (en) 1998-02-19 2002-05-28 Micron Technology, Inc. RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
US6112697A (en) 1998-02-19 2000-09-05 Micron Technology, Inc. RF powered plasma enhanced chemical vapor deposition reactor and methods
JP2002535825A (ja) 1999-01-20 2002-10-22 エヌ・ケー・ティー リサーチ センター アクティーゼルスカブ プラズマ励起方法及びその使用
JP4365927B2 (ja) * 1999-03-12 2009-11-18 キヤノン株式会社 干渉計測装置及び格子干渉式エンコーダ
WO2001069649A1 (fr) * 2000-03-13 2001-09-20 Toyama Prefecture Source de lumiere a decharge ca de type a electrodes multiples a commande de phase
TW507256B (en) * 2000-03-13 2002-10-21 Mitsubishi Heavy Ind Ltd Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus
AT4667U1 (de) * 2000-06-21 2001-10-25 Inocon Technologie Gmbh Plasmabrenner
US6562684B1 (en) 2000-08-30 2003-05-13 Micron Technology, Inc. Methods of forming dielectric materials
US6447719B1 (en) * 2000-10-02 2002-09-10 Johnson & Johnson Power system for sterilization systems employing low frequency plasma
US6841124B2 (en) 2000-10-02 2005-01-11 Ethicon, Inc. Sterilization system with a plasma generator controlled by a digital signal processor
US6852277B2 (en) * 2000-10-02 2005-02-08 Ethicon, Inc. Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma
AU2002212101A1 (en) * 2000-10-27 2002-05-06 Nkt Research A/S A method and an apparatus for excitation of a plasma
WO2002054835A2 (en) * 2001-01-08 2002-07-11 Tokyo Electron Limited Addition of power at selected harmonics of plasma processor drive frequency
TW562869B (en) * 2001-01-29 2003-11-21 Nippon Sheet Glass Co Ltd Sputtering apparatus
KR20020091430A (ko) * 2001-05-30 2002-12-06 사단법인 고등기술연구원 연구조합 원편광 공진 모드를 이용한 플라즈마 방전 시스템
US6872909B2 (en) 2003-04-16 2005-03-29 Applied Science And Technology, Inc. Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
US9771648B2 (en) * 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US20050103620A1 (en) * 2003-11-19 2005-05-19 Zond, Inc. Plasma source with segmented magnetron cathode
US7095179B2 (en) 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US7663319B2 (en) 2004-02-22 2010-02-16 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US9123508B2 (en) 2004-02-22 2015-09-01 Zond, Llc Apparatus and method for sputtering hard coatings
WO2005094138A1 (ja) * 2004-03-29 2005-10-06 Mitsubishi Denki Kabushiki Kaisha プラズマ発生用電源装置
US20060002051A1 (en) * 2004-07-01 2006-01-05 Goudy Paul R Jr Electric discharge apparatus and method for ionizing fluid and method of deodorizing and eliminating mold
WO2006036846A1 (en) * 2004-09-24 2006-04-06 Zond, Inc. Apparatus for generating high-current electrical discharges
CN1976870B (zh) * 2004-09-29 2012-08-29 东芝三菱电机产业系统株式会社 n相臭氧发生装置
WO2007032172A1 (ja) 2005-09-16 2007-03-22 Tohoku University プラズマ発生装置およびプラズマ発生方法
US7758718B1 (en) * 2006-12-29 2010-07-20 Lam Research Corporation Reduced electric field arrangement for managing plasma confinement
WO2008083687A1 (en) 2007-01-10 2008-07-17 Scandinavian Micro Biodevices Aps A microfluidic device and a microfluidic system and a method of performing a test
US20110025221A1 (en) * 2008-04-02 2011-02-03 Toyama Prefecture Ultraviolet generating device and lighting device using the same
DE102009017888B4 (de) * 2009-03-20 2013-01-17 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Steuern einer Plasmadichteverteilung in einem Vakuumprozess
JP5606063B2 (ja) * 2009-12-28 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
KR101147349B1 (ko) * 2010-09-17 2012-05-23 인제대학교 산학협력단 누설 전류형 변압기를 이용한 플라즈마 처리장치
JP5170216B2 (ja) * 2010-11-16 2013-03-27 株式会社デンソー プラズマ発生装置
JP2012175001A (ja) * 2011-02-23 2012-09-10 Toshiba Corp 制御装置、プラズマ処理装置、及び制御方法
CN102167289A (zh) * 2011-02-26 2011-08-31 福州欣联达电子科技有限公司 多路同步输出臭氧发生电源
DE102012200878B4 (de) 2012-01-23 2014-11-20 Forschungsverbund Berlin E.V. Verfahren und Vorrichtung zum Erzeugen von Plasmapulsen
NL2009466C2 (nl) * 2012-09-14 2014-03-18 Zwanenberg Food Group B V Inrichting voor het pasteuriseren van een massa voedingswaar.
WO2015074155A1 (en) 2013-11-25 2015-05-28 Imalog Inc. Method and device for controlling an ozone generator power supply
JP6224247B2 (ja) * 2014-07-25 2017-11-01 東芝三菱電機産業システム株式会社 ラジカルガス発生システム
KR101913985B1 (ko) 2014-10-29 2018-10-31 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 라디칼 가스 발생 시스템
DE102015212243A1 (de) 2015-06-30 2017-01-05 TRUMPF Hüttinger GmbH + Co. KG Vorrichtung zur Erzeugung mehrerer Takt- oder Hochfrequenzsignale
DE102016104490B3 (de) 2016-03-11 2017-05-24 Epcos Ag Vorrichtung und Verfahren zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas
US20170314133A1 (en) * 2016-04-29 2017-11-02 Retro-Semi Technologies, Llc Plasma reactor having divided electrodes
WO2017189222A1 (en) * 2016-04-29 2017-11-02 Retro-Semi Technologies, Llc Plasma reactor having divided electrodes
KR102192566B1 (ko) * 2016-12-19 2020-12-18 어플라이드 머티어리얼스, 인코포레이티드 스퍼터 증착 소스, 스퍼터 증착 장치, 및 기판 상에 층을 증착하는 방법
US11483002B2 (en) * 2017-02-23 2022-10-25 General Electric Company System and methods for electric discharge machining
WO2019004187A1 (ja) * 2017-06-27 2019-01-03 キヤノンアネルバ株式会社 プラズマ処理装置
SG11201912567RA (en) * 2017-06-27 2020-01-30 Canon Anelva Corp Plasma processing apparatus
PL3648550T3 (pl) 2017-06-27 2021-11-22 Canon Anelva Corporation Urządzenie do przetwarzania plazmowego
KR102257134B1 (ko) 2017-06-27 2021-05-26 캐논 아네르바 가부시키가이샤 플라스마 처리 장치
EP3517498B1 (de) * 2018-01-29 2020-03-18 Xylem Europe GmbH Kompakter ozongenerator mit mehrspaltiger elektrodenanordnung
EP3817517A4 (de) 2018-06-26 2022-03-16 Canon Anelva Corporation Plasmabehandlungsvorrichtung, plasmabehandlungsverfahren, programm und speichermedium

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GB2111772B (en) * 1981-12-10 1985-09-18 Tioxide Group Plc Electric arc discharge apparatus
JPH0457406A (ja) * 1990-06-27 1992-02-25 Shindengen Electric Mfg Co Ltd Ｒｆ発生装置のフェーズシフト回路
US5057185A (en) * 1990-09-27 1991-10-15 Consortium For Surface Processing, Inc. Triode plasma reactor with phase modulated plasma control
JPH0613196A (ja) * 1992-06-25 1994-01-21 Matsushita Electric Ind Co Ltd プラズマ発生方法および発生装置
JP2902910B2 (ja) * 1993-07-14 1999-06-07 日新電機株式会社 Ｌｅｐ電源位相微調機構
WO1995005263A1 (en) * 1993-08-19 1995-02-23 Refranco Corp. Treatment of particulate matter by electrical discharge

Also Published As

Publication number Publication date
EP0831679A1 (de) 1998-03-25
US5932116A (en) 1999-08-03
WO1996039794A1 (fr) 1996-12-12
EP0831679B1 (de) 2008-10-01
EP0831679A4 (de) 1998-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee