DE69620350D1 - Optoelektronische Quantumwell-Vorrichtung - Google Patents
Optoelektronische Quantumwell-VorrichtungInfo
- Publication number
- DE69620350D1 DE69620350D1 DE69620350T DE69620350T DE69620350D1 DE 69620350 D1 DE69620350 D1 DE 69620350D1 DE 69620350 T DE69620350 T DE 69620350T DE 69620350 T DE69620350 T DE 69620350T DE 69620350 D1 DE69620350 D1 DE 69620350D1
- Authority
- DE
- Germany
- Prior art keywords
- quantumwell
- optoelectronic device
- optoelectronic
- quantumwell optoelectronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005693 optoelectronics Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference
- G02F1/218—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference using semi-conducting materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/0014—Measuring characteristics or properties thereof
- H01S5/0028—Laser diodes used as detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18319—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement comprising a periodical structure in lateral directions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3401—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers
- H01S5/3402—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers intersubband lasers, e.g. transitions within the conduction or valence bands
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
- H01S5/3432—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs the whole junction comprising only (AI)GaAs
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9513785A FR2741483B1 (fr) | 1995-11-21 | 1995-11-21 | Dispositif optoelectronique a puits quantiques |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69620350D1 true DE69620350D1 (de) | 2002-05-08 |
DE69620350T2 DE69620350T2 (de) | 2002-11-07 |
Family
ID=9484764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69620350T Expired - Fee Related DE69620350T2 (de) | 1995-11-21 | 1996-11-12 | Optoelektronische Quantumwell-Vorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5818066A (de) |
EP (1) | EP0776076B1 (de) |
JP (1) | JPH09172227A (de) |
DE (1) | DE69620350T2 (de) |
FR (1) | FR2741483B1 (de) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6074892A (en) * | 1996-05-07 | 2000-06-13 | Ciena Corporation | Semiconductor hetero-interface photodetector |
US6055262A (en) * | 1997-06-11 | 2000-04-25 | Honeywell Inc. | Resonant reflector for improved optoelectronic device performance and enhanced applicability |
US6330265B1 (en) * | 1998-04-21 | 2001-12-11 | Kabushiki Kaisha Toshiba | Optical functional element and transmission device |
JP3555924B2 (ja) * | 1998-06-15 | 2004-08-18 | Nec化合物デバイス株式会社 | 半導体受光素子 |
US6222206B1 (en) * | 1998-06-25 | 2001-04-24 | Lucent Technologies Inc | Wafer having top and bottom emitting vertical-cavity lasers |
US6172379B1 (en) * | 1998-07-28 | 2001-01-09 | Sagi-Nahor Ltd. | Method for optimizing QWIP grating depth |
US6104046A (en) * | 1999-03-12 | 2000-08-15 | Sagi-Nahor Ltd. | Dual-band infrared sensing material array and focal plane array |
US6207975B1 (en) * | 1999-03-23 | 2001-03-27 | Trw Inc. | Angle cavity resonant photodetector |
FR2791477B1 (fr) * | 1999-03-25 | 2001-06-29 | Alpes Lasers | Laser semi-conducteur infrarouge |
US6133571A (en) * | 1999-04-26 | 2000-10-17 | Lockheed Martin Corporation | Resonant cavity field enhancing boundary |
US6423980B1 (en) * | 1999-06-25 | 2002-07-23 | California Institute Of Technology | Multi-directional radiation coupling in quantum-well infrared photodetectors |
GB9916145D0 (en) * | 1999-07-10 | 1999-09-08 | Secr Defence | Control of polarisation of vertical cavity surface emitting lasers |
AU1821001A (en) * | 1999-10-13 | 2001-04-23 | Lockheed Martin Corporation | Optical interconnect using multifunctional optical elements |
US6452187B1 (en) | 2000-08-24 | 2002-09-17 | Lockheed Martin Corporation | Two-color grating coupled infrared photodetector |
JP2002072010A (ja) * | 2000-09-05 | 2002-03-12 | Nippon Sheet Glass Co Ltd | 波長選択性を有する光学素子 |
US6990135B2 (en) | 2002-10-28 | 2006-01-24 | Finisar Corporation | Distributed bragg reflector for optoelectronic device |
US7065124B2 (en) | 2000-11-28 | 2006-06-20 | Finlsar Corporation | Electron affinity engineered VCSELs |
US6905900B1 (en) | 2000-11-28 | 2005-06-14 | Finisar Corporation | Versatile method and system for single mode VCSELs |
US6580089B2 (en) * | 2000-12-01 | 2003-06-17 | California Institute Of Technology | Multi-quantum-well infrared sensor array in spatially-separated multi-band configuration |
TWI227799B (en) | 2000-12-29 | 2005-02-11 | Honeywell Int Inc | Resonant reflector for increased wavelength and polarization control |
US6836501B2 (en) | 2000-12-29 | 2004-12-28 | Finisar Corporation | Resonant reflector for increased wavelength and polarization control |
US6782027B2 (en) | 2000-12-29 | 2004-08-24 | Finisar Corporation | Resonant reflector for use with optoelectronic devices |
US6727520B2 (en) * | 2000-12-29 | 2004-04-27 | Honeywell International Inc. | Spatially modulated reflector for an optoelectronic device |
US6828642B2 (en) | 2001-04-17 | 2004-12-07 | Lockhead Martin Corporation | Diffraction grating coupled infrared photodetector |
US6920290B2 (en) * | 2001-07-11 | 2005-07-19 | Lockheed Martin Corporation | Multi-wavelength high bandwidth communication receiver and system |
JP5143985B2 (ja) * | 2001-08-10 | 2013-02-13 | 古河電気工業株式会社 | 分布帰還型半導体レーザ素子 |
US6606199B2 (en) | 2001-10-10 | 2003-08-12 | Honeywell International Inc. | Graded thickness optical element and method of manufacture therefor |
US6667528B2 (en) * | 2002-01-03 | 2003-12-23 | International Business Machines Corporation | Semiconductor-on-insulator lateral p-i-n photodetector with a reflecting mirror and backside contact and method for forming the same |
US6965626B2 (en) | 2002-09-03 | 2005-11-15 | Finisar Corporation | Single mode VCSEL |
US6813293B2 (en) | 2002-11-21 | 2004-11-02 | Finisar Corporation | Long wavelength VCSEL with tunnel junction, and implant |
US6897447B2 (en) * | 2002-12-05 | 2005-05-24 | Lockheed Martin Corporation | Bias controlled multi-spectral infrared photodetector and imager |
US7135698B2 (en) * | 2002-12-05 | 2006-11-14 | Lockheed Martin Corporation | Multi-spectral infrared super-pixel photodetector and imager |
US7298942B2 (en) | 2003-06-06 | 2007-11-20 | Finisar Corporation | Pluggable optical optic system having a lens fiber stop |
US6781160B1 (en) * | 2003-06-24 | 2004-08-24 | United Epitaxy Company, Ltd. | Semiconductor light emitting device and method for manufacturing the same |
US7433381B2 (en) | 2003-06-25 | 2008-10-07 | Finisar Corporation | InP based long wavelength VCSEL |
US7075962B2 (en) | 2003-06-27 | 2006-07-11 | Finisar Corporation | VCSEL having thermal management |
US7277461B2 (en) | 2003-06-27 | 2007-10-02 | Finisar Corporation | Dielectric VCSEL gain guide |
US7054345B2 (en) | 2003-06-27 | 2006-05-30 | Finisar Corporation | Enhanced lateral oxidation |
US7210857B2 (en) | 2003-07-16 | 2007-05-01 | Finisar Corporation | Optical coupling system |
US6887801B2 (en) | 2003-07-18 | 2005-05-03 | Finisar Corporation | Edge bead control method and apparatus |
US7031363B2 (en) | 2003-10-29 | 2006-04-18 | Finisar Corporation | Long wavelength VCSEL device processing |
US7829912B2 (en) | 2006-07-31 | 2010-11-09 | Finisar Corporation | Efficient carrier injection in a semiconductor device |
US7596165B2 (en) * | 2004-08-31 | 2009-09-29 | Finisar Corporation | Distributed Bragg Reflector for optoelectronic device |
US7920612B2 (en) | 2004-08-31 | 2011-04-05 | Finisar Corporation | Light emitting semiconductor device having an electrical confinement barrier near the active region |
WO2006044983A2 (en) * | 2004-10-20 | 2006-04-27 | Massachusetts Institute Of Technology | Multi-spectral pixel and focal plane array |
JP4250603B2 (ja) * | 2005-03-28 | 2009-04-08 | キヤノン株式会社 | テラヘルツ波の発生素子、及びその製造方法 |
US8031752B1 (en) | 2007-04-16 | 2011-10-04 | Finisar Corporation | VCSEL optimized for high speed data |
US7781779B2 (en) * | 2007-05-08 | 2010-08-24 | Luminus Devices, Inc. | Light emitting devices including wavelength converting material |
JP5336114B2 (ja) * | 2008-06-20 | 2013-11-06 | 矢崎総業株式会社 | 赤外線センサ及び二酸化炭素センサ |
JP4639249B2 (ja) * | 2008-07-31 | 2011-02-23 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
FR2937791B1 (fr) * | 2008-10-24 | 2010-11-26 | Thales Sa | Dispositif d'imagerie polarimetrique optimise par rapport au contraste de polarisation |
EP2467910B1 (de) * | 2009-08-20 | 2019-02-06 | Koninklijke Philips N.V. | Vertikalresonator-oberflächenemissionslaservorrichtung mit feedback mit wählbarem winkel |
JP5427531B2 (ja) * | 2009-09-29 | 2014-02-26 | 三菱重工業株式会社 | 光検出素子、光検出装置及び赤外線検出素子、赤外線検出装置 |
TWI597863B (zh) * | 2013-10-22 | 2017-09-01 | 晶元光電股份有限公司 | 發光元件及其製造方法 |
FR3015113B1 (fr) | 2013-12-17 | 2018-06-01 | Centre National De La Recherche Scientifique- Cnrs | Element de detection quantique a faible bruit et procede de fabrication d'un tel element de photodetection |
US10254407B2 (en) * | 2015-03-02 | 2019-04-09 | Northwestern University | Electroabsorption modulator for depth imaging and other applications |
JP2016178234A (ja) * | 2015-03-20 | 2016-10-06 | 株式会社東芝 | 半導体受光デバイス |
JP6822151B2 (ja) | 2017-01-06 | 2021-01-27 | 富士通株式会社 | 光検知器及び撮像装置 |
JP7052362B2 (ja) * | 2018-01-16 | 2022-04-12 | 日本電気株式会社 | 赤外線検出素子、赤外線検出器及び赤外線検出素子の製造方法 |
DE102018130560A1 (de) * | 2018-11-30 | 2020-06-04 | Osram Opto Semiconductors Gmbh | Optoelektronisches halbleiterbauelement mit einer brechungsindexmodulationsschicht und verfahren zur herstellung des optoelektronischen halbleiterbauelements |
US11476378B2 (en) * | 2019-05-03 | 2022-10-18 | University Of Central Florida Research Foundation, Inc. | Solar-energy apparatus, methods, and applications |
CN112018141B (zh) * | 2020-08-14 | 2023-11-28 | 清华大学 | 基于不同形状单元的微型光谱芯片 |
US20220352693A1 (en) * | 2021-04-30 | 2022-11-03 | Lumentum Operations Llc | Methods for incorporating a control structure within a vertical cavity surface emitting laser device cavity |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4135813C2 (de) * | 1990-10-31 | 1997-11-06 | Toshiba Kawasaki Kk | Oberflächenemittierende Halbleiter-Laservorrichtung |
US5300789A (en) * | 1991-12-24 | 1994-04-05 | At&T Bell Laboratories | Article comprising means for modulating the optical transparency of a semiconductor body, and method of operating the article |
-
1995
- 1995-11-21 FR FR9513785A patent/FR2741483B1/fr not_active Expired - Fee Related
-
1996
- 1996-11-12 DE DE69620350T patent/DE69620350T2/de not_active Expired - Fee Related
- 1996-11-12 EP EP96402406A patent/EP0776076B1/de not_active Expired - Lifetime
- 1996-11-18 US US08/746,810 patent/US5818066A/en not_active Expired - Fee Related
- 1996-11-20 JP JP8309628A patent/JPH09172227A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2741483A1 (fr) | 1997-05-23 |
JPH09172227A (ja) | 1997-06-30 |
US5818066A (en) | 1998-10-06 |
EP0776076A1 (de) | 1997-05-28 |
DE69620350T2 (de) | 2002-11-07 |
EP0776076B1 (de) | 2002-04-03 |
FR2741483B1 (fr) | 1998-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |