DE69615598D1 - Erzeugung des Magnesiumdampfes mit hocher Verdampfungsgeschwindigkeit - Google Patents

Erzeugung des Magnesiumdampfes mit hocher Verdampfungsgeschwindigkeit

Info

Publication number
DE69615598D1
DE69615598D1 DE69615598T DE69615598T DE69615598D1 DE 69615598 D1 DE69615598 D1 DE 69615598D1 DE 69615598 T DE69615598 T DE 69615598T DE 69615598 T DE69615598 T DE 69615598T DE 69615598 D1 DE69615598 D1 DE 69615598D1
Authority
DE
Germany
Prior art keywords
generation
evaporation rate
magnesium vapor
high evaporation
magnesium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69615598T
Other languages
English (en)
Other versions
DE69615598T2 (de
Inventor
Yasushi Fukui
Tadaaki Miono
Minoru Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14107361&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69615598(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Publication of DE69615598D1 publication Critical patent/DE69615598D1/de
Application granted granted Critical
Publication of DE69615598T2 publication Critical patent/DE69615598T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
DE69615598T 1995-03-28 1996-02-27 Erzeugung des Magnesiumdampfes mit hocher Verdampfungsgeschwindigkeit Expired - Fee Related DE69615598T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7094333A JPH08269696A (ja) 1995-03-28 1995-03-28 Ｍｇの蒸発方法

Publications (2)

Publication Number Publication Date
DE69615598D1 true DE69615598D1 (de) 2001-11-08
DE69615598T2 DE69615598T2 (de) 2002-10-02

Family

ID=14107361

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69615598T Expired - Fee Related DE69615598T2 (de) 1995-03-28 1996-02-27 Erzeugung des Magnesiumdampfes mit hocher Verdampfungsgeschwindigkeit

Country Status (6)

Country Link
US (1) US5705226A (de)
EP (1) EP0735157B1 (de)
JP (1) JPH08269696A (de)
KR (1) KR100287978B1 (de)
CN (1) CN1070934C (de)
DE (1) DE69615598T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000068055A (ja) * 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
EP1174526A1 (de) * 2000-07-17 2002-01-23 Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO Kontinuierliches Abscheiden aus der Gasphase
DE10111515A1 (de) * 2001-02-19 2002-08-14 Fraunhofer Ges Forschung Plasma-Beschichtungsanlage, Plasma-Beschichtungsverfahren und Verwendung des Verfahrens
US8522799B2 (en) * 2005-12-30 2013-09-03 Lam Research Corporation Apparatus and system for cleaning a substrate
DE102004041846B4 (de) * 2004-04-27 2007-08-02 Von Ardenne Anlagentechnik Gmbh Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial
KR20060081015A (ko) * 2005-01-06 2006-07-12 삼성에스디아이 주식회사 진공 증착기
US7398605B2 (en) * 2005-02-04 2008-07-15 Eastman Kodak Company Method of feeding particulate material to a heated vaporization surface
US7165340B2 (en) * 2005-02-04 2007-01-23 Eastman Kodak Company Feeding organic material to a heated surface
DE102005049906B4 (de) * 2005-10-17 2009-12-03 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Verdampfung von Verdampfungsmaterial
ITMI20060444A1 (it) * 2006-03-13 2007-09-14 Getters Spa Uso di composizioni magnesio-rame per l'evaporazione di magnesio e dispensatori di magnesio
CN104078626B (zh) * 2014-07-22 2016-07-06 深圳市华星光电技术有限公司 用于oled材料蒸镀的加热装置
CN104988462B (zh) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 一种坩埚装置
CN112630105A (zh) * 2020-12-09 2021-04-09 中山赛特奥日用科技有限公司 一种模拟电加热香氛产品实际挥发的蒸发方法
CN115181861A (zh) * 2022-07-20 2022-10-14 磐一(西安)装备技术有限公司 一种电子束对金属镁锭扫描获取高纯镁装置及提纯方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
US2996418A (en) * 1957-06-05 1961-08-15 Gen Motors Corp Method and apparatus for vapor depositing thin films
US3637421A (en) * 1969-08-27 1972-01-25 Joseph Paul Gimigliano Vacuum vapor coating with metals of high vapor pressure
US5002837A (en) * 1988-07-06 1991-03-26 Kabushiki Kaisha Kobe Seiko Sho Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them
JPH0273960A (ja) * 1988-09-09 1990-03-13 Kobe Steel Ltd 真空蒸着装置
JPH02125866A (ja) * 1988-11-04 1990-05-14 Kobe Steel Ltd 合金蒸着めっき装置
JPH0689418B2 (ja) * 1989-05-19 1994-11-09 宇部興産株式会社 連続マグネシウム溶解蒸発装置
JPH04308076A (ja) * 1991-04-03 1992-10-30 Mitsubishi Heavy Ind Ltd 昇華性物質真空蒸着装置
JPH0892734A (ja) * 1994-09-22 1996-04-09 Nisshin Steel Co Ltd Ｍｇの蒸発方法
JPH08165562A (ja) * 1994-12-12 1996-06-25 Nisshin Steel Co Ltd 安定条件下でのＭｇ蒸発方法及び装置

Also Published As

Publication number Publication date
JPH08269696A (ja) 1996-10-15
KR960034458A (ko) 1996-10-22
EP0735157B1 (de) 2001-10-04
KR100287978B1 (ko) 2001-05-02
EP0735157A3 (de) 1997-08-27
EP0735157A2 (de) 1996-10-02
CN1070934C (zh) 2001-09-12
US5705226A (en) 1998-01-06
CN1137574A (zh) 1996-12-11
DE69615598T2 (de) 2002-10-02

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8363 Opposition against the patent
8339 Ceased/non-payment of the annual fee