DE69608664D1 - Verfahren zur Herstellung eines blasenfreien Lichtwellenleiters - Google Patents

Verfahren zur Herstellung eines blasenfreien Lichtwellenleiters

Info

Publication number
DE69608664D1
DE69608664D1 DE69608664T DE69608664T DE69608664D1 DE 69608664 D1 DE69608664 D1 DE 69608664D1 DE 69608664 T DE69608664 T DE 69608664T DE 69608664 T DE69608664 T DE 69608664T DE 69608664 D1 DE69608664 D1 DE 69608664D1
Authority
DE
Germany
Prior art keywords
bubble
production
optical fiber
free optical
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69608664T
Other languages
English (en)
Other versions
DE69608664T2 (de
Inventor
Hiroshi Nishimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of DE69608664D1 publication Critical patent/DE69608664D1/de
Application granted granted Critical
Publication of DE69608664T2 publication Critical patent/DE69608664T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/125—Bends, branchings or intersections
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12176—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Composite Materials (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Optical Integrated Circuits (AREA)
DE69608664T 1995-11-09 1996-11-08 Verfahren zur Herstellung eines Hohlraumfreien optischen Wellenleiters Expired - Lifetime DE69608664T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7314935A JP3001406B2 (ja) 1995-11-09 1995-11-09 光導波路の製造方法

Publications (2)

Publication Number Publication Date
DE69608664D1 true DE69608664D1 (de) 2000-07-06
DE69608664T2 DE69608664T2 (de) 2001-02-08

Family

ID=18059428

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69608664T Expired - Lifetime DE69608664T2 (de) 1995-11-09 1996-11-08 Verfahren zur Herstellung eines Hohlraumfreien optischen Wellenleiters

Country Status (3)

Country Link
EP (1) EP0803589B1 (de)
JP (1) JP3001406B2 (de)
DE (1) DE69608664T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2309096A (en) * 1996-01-09 1997-07-16 Northern Telecom Ltd Optical waveguide pair with cladding on buffered substrate
WO1998027018A1 (en) * 1996-12-16 1998-06-25 Corning Incorporated Organometallics for lightwave optical circuit applications
GB2346452A (en) 1999-02-05 2000-08-09 Univ Glasgow Waveguides
JP2001290040A (ja) * 2000-04-04 2001-10-19 Furukawa Electric Co Ltd:The 光導波路部品の製造方法と光導波路部品
US7087179B2 (en) 2000-12-11 2006-08-08 Applied Materials, Inc. Optical integrated circuits (ICs)
JP4640745B2 (ja) * 2001-05-21 2011-03-02 株式会社Ａｄｅｋａ 化学気相成長用原料及びこれを用いたセラミックスの製造方法
US6749893B2 (en) * 2002-01-31 2004-06-15 Dalsa Semiconductor Inc. Method of preventing cracking in optical quality silica layers
US7080528B2 (en) 2002-10-23 2006-07-25 Applied Materials, Inc. Method of forming a phosphorus doped optical core using a PECVD process
US20040086643A1 (en) * 2002-11-05 2004-05-06 Asahi Denka Co., Ltd. Precursor for chemical vapor deposition and thin film formation process using the same
US7079740B2 (en) 2004-03-12 2006-07-18 Applied Materials, Inc. Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
CN101859001B (zh) * 2010-06-08 2012-06-27 浙江大学 基于硼锗共掺上包层的二氧化硅光波导器件及制备方法
JP6331336B2 (ja) * 2013-10-31 2018-05-30 住友ベークライト株式会社 光導波路、光電気混載基板および電子機器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5076654A (en) * 1990-10-29 1991-12-31 At&T Bell Laboratories Packaging of silicon optical components
JP2984130B2 (ja) * 1992-02-12 1999-11-29 日立電線株式会社 プラズマｃｖｄ法による光導波路用ガラス膜および光導波路の製造方法
JP2900732B2 (ja) * 1992-11-24 1999-06-02 三菱電機株式会社 光導波路の製造方法
JPH06183751A (ja) * 1992-12-21 1994-07-05 Nippon Telegr & Teleph Corp <Ntt> 光導波膜の製造方法
JPH06289243A (ja) * 1993-04-06 1994-10-18 Hitachi Cable Ltd 光導波路用ガラス膜の形成方法
JP2739806B2 (ja) * 1993-06-08 1998-04-15 日本電気株式会社 光導波路の製造方法
JPH0777620A (ja) * 1993-09-08 1995-03-20 Tokai Rubber Ind Ltd 石英系光導波路およびその製造方法

Also Published As

Publication number Publication date
JPH09133827A (ja) 1997-05-20
JP3001406B2 (ja) 2000-01-24
EP0803589B1 (de) 2000-05-31
DE69608664T2 (de) 2001-02-08
EP0803589A1 (de) 1997-10-29

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