DE69607493T2 - Polarisationsmodenselektiver Halbleiterlaser, Modulationsverfahren und optisches Kommunikationssystem unter Verwendung dieses Lasers - Google Patents
Polarisationsmodenselektiver Halbleiterlaser, Modulationsverfahren und optisches Kommunikationssystem unter Verwendung dieses LasersInfo
- Publication number
- DE69607493T2 DE69607493T2 DE69607493T DE69607493T DE69607493T2 DE 69607493 T2 DE69607493 T2 DE 69607493T2 DE 69607493 T DE69607493 T DE 69607493T DE 69607493 T DE69607493 T DE 69607493T DE 69607493 T2 DE69607493 T2 DE 69607493T2
- Authority
- DE
- Germany
- Prior art keywords
- laser
- communication system
- optical communication
- modulation method
- polarization mode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/14—Semiconductor lasers with special structural design for lasing in a specific polarisation mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06233—Controlling other output parameters than intensity or frequency
- H01S5/06236—Controlling other output parameters than intensity or frequency controlling the polarisation, e.g. TM/TE polarisation switching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
- H01S5/1035—Forward coupled structures [DFC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation
- H01S5/3404—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation influencing the polarisation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP01554295A JP3287443B2 (ja) | 1995-01-04 | 1995-01-04 | 偏波変調可能な半導体レーザおよびこれを用いた光通信方式 |
JP01554095A JP3246703B2 (ja) | 1995-01-04 | 1995-01-04 | 偏波変調可能な半導体レーザおよびこれを用いた光通信方式 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69607493D1 DE69607493D1 (de) | 2000-05-11 |
DE69607493T2 true DE69607493T2 (de) | 2001-04-05 |
Family
ID=26351714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69607493T Expired - Fee Related DE69607493T2 (de) | 1995-01-04 | 1996-01-03 | Polarisationsmodenselektiver Halbleiterlaser, Modulationsverfahren und optisches Kommunikationssystem unter Verwendung dieses Lasers |
Country Status (3)
Country | Link |
---|---|
US (1) | US5648978A (de) |
EP (1) | EP0721240B1 (de) |
DE (1) | DE69607493T2 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3323725B2 (ja) * | 1995-12-08 | 2002-09-09 | キヤノン株式会社 | 偏波変調レーザ、その駆動方法及びそれを用いた光通信システム |
US6031860A (en) * | 1996-08-22 | 2000-02-29 | Canon Kabushiki Kaisha | Optical device capable of switching output intensity of light of predetermined polarized wave, optical transmitter using the device, network using the transmitter, and method of driving optical device |
US6310707B1 (en) * | 1996-10-25 | 2001-10-30 | Seiko Epson Corporation | Optical wireless data communication system, and transmitter and receiver used therefor |
US5784399A (en) * | 1996-12-19 | 1998-07-21 | Xerox Corporation | Polarization mode selection by distributed Bragg reflector in a quantum well laser |
US6963598B1 (en) | 2000-05-23 | 2005-11-08 | Finisar Corporation | System and method for VCSEL polarization control |
US7627018B1 (en) * | 2000-05-26 | 2009-12-01 | Opticomp Corporation | Polarization control using diffraction gratings in VCSEL waveguide grating couplers |
US6728290B1 (en) * | 2000-09-13 | 2004-04-27 | The Board Of Trustees Of The University Of Illinois | Current biased dual DBR grating semiconductor laser |
US7065124B2 (en) * | 2000-11-28 | 2006-06-20 | Finlsar Corporation | Electron affinity engineered VCSELs |
US6905900B1 (en) | 2000-11-28 | 2005-06-14 | Finisar Corporation | Versatile method and system for single mode VCSELs |
US6990135B2 (en) * | 2002-10-28 | 2006-01-24 | Finisar Corporation | Distributed bragg reflector for optoelectronic device |
US6836501B2 (en) * | 2000-12-29 | 2004-12-28 | Finisar Corporation | Resonant reflector for increased wavelength and polarization control |
TWI227799B (en) * | 2000-12-29 | 2005-02-11 | Honeywell Int Inc | Resonant reflector for increased wavelength and polarization control |
US7653093B2 (en) * | 2001-09-10 | 2010-01-26 | Imec | Widely tunable twin guide laser structure |
KR100453814B1 (ko) * | 2002-02-07 | 2004-10-20 | 한국전자통신연구원 | 이종 회절격자를 가지는 반도체 광소자 및 그 제조 방법 |
US6965626B2 (en) * | 2002-09-03 | 2005-11-15 | Finisar Corporation | Single mode VCSEL |
US6813293B2 (en) * | 2002-11-21 | 2004-11-02 | Finisar Corporation | Long wavelength VCSEL with tunnel junction, and implant |
KR100526999B1 (ko) * | 2002-12-13 | 2005-11-08 | 한국전자통신연구원 | 다영역 dfb 레이저 다이오드 |
KR100519921B1 (ko) * | 2002-12-17 | 2005-10-10 | 한국전자통신연구원 | 초고주파 펄스 광원소자 |
US20040222363A1 (en) * | 2003-05-07 | 2004-11-11 | Honeywell International Inc. | Connectorized optical component misalignment detection system |
US7298942B2 (en) | 2003-06-06 | 2007-11-20 | Finisar Corporation | Pluggable optical optic system having a lens fiber stop |
US7433381B2 (en) | 2003-06-25 | 2008-10-07 | Finisar Corporation | InP based long wavelength VCSEL |
US7075962B2 (en) | 2003-06-27 | 2006-07-11 | Finisar Corporation | VCSEL having thermal management |
US7277461B2 (en) * | 2003-06-27 | 2007-10-02 | Finisar Corporation | Dielectric VCSEL gain guide |
US7054345B2 (en) | 2003-06-27 | 2006-05-30 | Finisar Corporation | Enhanced lateral oxidation |
US20060056762A1 (en) * | 2003-07-02 | 2006-03-16 | Honeywell International Inc. | Lens optical coupler |
US7210857B2 (en) * | 2003-07-16 | 2007-05-01 | Finisar Corporation | Optical coupling system |
US20050013542A1 (en) * | 2003-07-16 | 2005-01-20 | Honeywell International Inc. | Coupler having reduction of reflections to light source |
US6887801B2 (en) * | 2003-07-18 | 2005-05-03 | Finisar Corporation | Edge bead control method and apparatus |
US7031363B2 (en) * | 2003-10-29 | 2006-04-18 | Finisar Corporation | Long wavelength VCSEL device processing |
US7920612B2 (en) * | 2004-08-31 | 2011-04-05 | Finisar Corporation | Light emitting semiconductor device having an electrical confinement barrier near the active region |
US7829912B2 (en) * | 2006-07-31 | 2010-11-09 | Finisar Corporation | Efficient carrier injection in a semiconductor device |
US7596165B2 (en) * | 2004-08-31 | 2009-09-29 | Finisar Corporation | Distributed Bragg Reflector for optoelectronic device |
US8031752B1 (en) | 2007-04-16 | 2011-10-04 | Finisar Corporation | VCSEL optimized for high speed data |
EP2138882A3 (de) * | 2008-06-24 | 2012-02-22 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Optische Vorrichtung zur Lichterzeugung durch Lumineszenz, die zu einem optischen Wellenleiter gekoppelt ist. |
JP2011119434A (ja) * | 2009-12-03 | 2011-06-16 | Renesas Electronics Corp | 半導体レーザ素子及びその製造方法 |
KR101845514B1 (ko) * | 2010-12-17 | 2018-04-04 | 삼성전자주식회사 | 소형 광 변조기 및 이를 포함하는 광 송신기 |
US9310561B1 (en) * | 2013-11-27 | 2016-04-12 | Aurrion, Inc. | Multiport photonic device with asymmetric waveguides |
US9618698B2 (en) * | 2014-11-06 | 2017-04-11 | Huawei Technologies Co., Ltd. | Optical waveguide crossings |
CN106451076B (zh) * | 2016-10-09 | 2019-11-29 | 中国科学院半导体研究所 | 四波长输出半导体激光器及其制备方法 |
JP7286389B2 (ja) * | 2019-04-15 | 2023-06-05 | キヤノン株式会社 | 無線通信装置、無線通信システムおよび通信方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4054363A (en) * | 1975-12-15 | 1977-10-18 | Tokyo Institute Of Technology | Multi-hetero-structure waveguide type optical integrated circuitry |
JPS62144426A (ja) * | 1985-12-19 | 1987-06-27 | Matsushita Electric Ind Co Ltd | 光伝送装置 |
JPS6455889A (en) * | 1987-08-27 | 1989-03-02 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPH02159781A (ja) * | 1988-12-14 | 1990-06-19 | Toshiba Corp | 光通信装置 |
US5220573A (en) * | 1989-03-10 | 1993-06-15 | Canon Kabushiki Kaisha | Optical apparatus using wavelength selective photocoupler |
FR2650399B1 (fr) * | 1989-07-28 | 1991-10-11 | Philips Electronique Lab | Dispositif semiconducteur incluant un coupleur directionnel pour les composantes te, tm |
US5117469A (en) * | 1991-02-01 | 1992-05-26 | Bell Communications Research, Inc. | Polarization-dependent and polarization-diversified opto-electronic devices using a strained quantum well |
US5497390A (en) * | 1992-01-31 | 1996-03-05 | Nippon Telegraph And Telephone Corporation | Polarization mode switching semiconductor laser apparatus |
JPH0720329A (ja) * | 1993-06-23 | 1995-01-24 | Canon Inc | 光合分波器 |
JP3226065B2 (ja) * | 1993-06-28 | 2001-11-05 | キヤノン株式会社 | 単一波長半導体レーザ |
-
1995
- 1995-12-28 US US08/579,730 patent/US5648978A/en not_active Expired - Fee Related
-
1996
- 1996-01-03 EP EP96100050A patent/EP0721240B1/de not_active Expired - Lifetime
- 1996-01-03 DE DE69607493T patent/DE69607493T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69607493D1 (de) | 2000-05-11 |
US5648978A (en) | 1997-07-15 |
EP0721240A1 (de) | 1996-07-10 |
EP0721240B1 (de) | 2000-04-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication related to discontinuation of the patent is to be deleted | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |