DE69606669D1 - Vorrichtung zum abrichten eines polierkissen - Google Patents
Vorrichtung zum abrichten eines polierkissenInfo
- Publication number
- DE69606669D1 DE69606669D1 DE69606669T DE69606669T DE69606669D1 DE 69606669 D1 DE69606669 D1 DE 69606669D1 DE 69606669 T DE69606669 T DE 69606669T DE 69606669 T DE69606669 T DE 69606669T DE 69606669 D1 DE69606669 D1 DE 69606669D1
- Authority
- DE
- Germany
- Prior art keywords
- dressing
- polishing cushion
- polishing
- cushion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56495P | 1995-06-26 | 1995-06-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69606669D1 true DE69606669D1 (de) | 2000-03-23 |
DE69606669T2 DE69606669T2 (de) | 2000-08-17 |
Family
ID=21692057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69606669T Expired - Fee Related DE69606669T2 (de) | 1995-06-26 | 1996-06-25 | Vorrichtung zum abrichten eines polierkissen |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0750968B1 (de) |
JP (1) | JPH0911120A (de) |
KR (1) | KR970003594A (de) |
DE (1) | DE69606669T2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100456803B1 (ko) * | 1996-02-05 | 2005-05-09 | 가부시키 가이샤 에바라 세이사꾸쇼 | 폴리싱장치 |
KR100684196B1 (ko) * | 1999-10-29 | 2007-02-20 | 삼성전자주식회사 | 반도체 웨이퍼의 평탄화 설비 |
DE10322496B4 (de) * | 2003-05-18 | 2006-08-24 | Susanne Schiegerl | Vorrichtung zur automatischen Reinigung und Konditionierung von bei Polierprozessen eingesetzten Poliertüchern |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4322920A (en) * | 1979-10-29 | 1982-04-06 | Wells Raymond E | Rotary floor conditioning machine attachment |
JPS642858A (en) * | 1987-03-02 | 1989-01-06 | Rodeele Nitta Kk | Material and method for seasoning polishing pad |
JPH05208361A (ja) * | 1992-01-31 | 1993-08-20 | Fuji Electric Co Ltd | 鏡面仕上げ用パッドのドレッシング装置 |
US5216843A (en) * | 1992-09-24 | 1993-06-08 | Intel Corporation | Polishing pad conditioning apparatus for wafer planarization process |
US5456627A (en) * | 1993-12-20 | 1995-10-10 | Westech Systems, Inc. | Conditioner for a polishing pad and method therefor |
US5486131A (en) * | 1994-01-04 | 1996-01-23 | Speedfam Corporation | Device for conditioning polishing pads |
JP3109558B2 (ja) * | 1994-11-24 | 2000-11-20 | 住友金属工業株式会社 | ウエハ保持具 |
-
1996
- 1996-06-24 JP JP8162797A patent/JPH0911120A/ja active Pending
- 1996-06-25 EP EP96304660A patent/EP0750968B1/de not_active Expired - Lifetime
- 1996-06-25 DE DE69606669T patent/DE69606669T2/de not_active Expired - Fee Related
- 1996-06-25 KR KR1019960023455A patent/KR970003594A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JPH0911120A (ja) | 1997-01-14 |
EP0750968B1 (de) | 2000-02-16 |
KR970003594A (ko) | 1997-01-28 |
DE69606669T2 (de) | 2000-08-17 |
EP0750968A1 (de) | 1997-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |