DE69425590D1 - Verfahren und Gerät zur Plasmabehandlung von Werkstücken - Google Patents

Verfahren und Gerät zur Plasmabehandlung von Werkstücken

Info

Publication number
DE69425590D1
DE69425590D1 DE69425590T DE69425590T DE69425590D1 DE 69425590 D1 DE69425590 D1 DE 69425590D1 DE 69425590 T DE69425590 T DE 69425590T DE 69425590 T DE69425590 T DE 69425590T DE 69425590 D1 DE69425590 D1 DE 69425590D1
Authority
DE
Germany
Prior art keywords
workpieces
plasma treatment
plasma
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69425590T
Other languages
English (en)
Other versions
DE69425590T2 (de
Inventor
Hiroji Hanawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of DE69425590D1 publication Critical patent/DE69425590D1/de
Application granted granted Critical
Publication of DE69425590T2 publication Critical patent/DE69425590T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
DE69425590T 1993-10-25 1994-10-05 Verfahren und Gerät zur Plasmabehandlung von Werkstücken Expired - Fee Related DE69425590T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/141,803 US5449432A (en) 1993-10-25 1993-10-25 Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication

Publications (2)

Publication Number Publication Date
DE69425590D1 true DE69425590D1 (de) 2000-09-21
DE69425590T2 DE69425590T2 (de) 2001-01-04

Family

ID=22497335

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69425590T Expired - Fee Related DE69425590T2 (de) 1993-10-25 1994-10-05 Verfahren und Gerät zur Plasmabehandlung von Werkstücken
DE69409459T Expired - Fee Related DE69409459T2 (de) 1993-10-25 1994-10-05 Verfahren und Gerät zur Plasmabearbeitung von Werkstücken

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69409459T Expired - Fee Related DE69409459T2 (de) 1993-10-25 1994-10-05 Verfahren und Gerät zur Plasmabearbeitung von Werkstücken

Country Status (4)

Country Link
US (1) US5449432A (de)
EP (2) EP0817237B1 (de)
JP (1) JPH07183097A (de)
DE (2) DE69425590T2 (de)

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US6548956B2 (en) 1994-12-13 2003-04-15 The Trustees Of Princeton University Transparent contacts for organic devices
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Also Published As

Publication number Publication date
EP0817237A2 (de) 1998-01-07
US5449432A (en) 1995-09-12
DE69409459T2 (de) 1998-09-24
JPH07183097A (ja) 1995-07-21
DE69409459D1 (de) 1998-05-14
EP0817237A3 (de) 1998-02-04
DE69425590T2 (de) 2001-01-04
EP0650183A1 (de) 1995-04-26
EP0817237B1 (de) 2000-08-16
EP0650183B1 (de) 1998-04-08

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Legal Events

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8339 Ceased/non-payment of the annual fee