DE69421844D1 - Verfahren zur Kontrolle der Schichtdicke und/oder des Brechungsindexes - Google Patents

Verfahren zur Kontrolle der Schichtdicke und/oder des Brechungsindexes

Info

Publication number
DE69421844D1
DE69421844D1 DE69421844T DE69421844T DE69421844D1 DE 69421844 D1 DE69421844 D1 DE 69421844D1 DE 69421844 T DE69421844 T DE 69421844T DE 69421844 T DE69421844 T DE 69421844T DE 69421844 D1 DE69421844 D1 DE 69421844D1
Authority
DE
Germany
Prior art keywords
checking
refractive index
layer thickness
thickness
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69421844T
Other languages
English (en)
Other versions
DE69421844T2 (de
Inventor
Kuniaki Nagayama
Eiki Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5097794A external-priority patent/JP2851987B2/ja
Priority claimed from JP5152247A external-priority patent/JP2790410B2/ja
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Publication of DE69421844D1 publication Critical patent/DE69421844D1/de
Application granted granted Critical
Publication of DE69421844T2 publication Critical patent/DE69421844T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N2021/4126—Index of thin films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69421844T 1993-04-23 1994-04-25 Verfahren zur Kontrolle der Schichtdicke und/oder des Brechungsindexes Expired - Fee Related DE69421844T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5097794A JP2851987B2 (ja) 1993-04-23 1993-04-23 膜厚・屈折率の色差観察法
JP5152247A JP2790410B2 (ja) 1993-06-23 1993-06-23 膜厚・屈折率の高感度色差観察法

Publications (2)

Publication Number Publication Date
DE69421844D1 true DE69421844D1 (de) 2000-01-05
DE69421844T2 DE69421844T2 (de) 2000-06-29

Family

ID=26438938

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69421844T Expired - Fee Related DE69421844T2 (de) 1993-04-23 1994-04-25 Verfahren zur Kontrolle der Schichtdicke und/oder des Brechungsindexes

Country Status (3)

Country Link
US (1) US5610392A (de)
EP (1) EP0622624B1 (de)
DE (1) DE69421844T2 (de)

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US6278519B1 (en) 1998-01-29 2001-08-21 Therma-Wave, Inc. Apparatus for analyzing multi-layer thin film stacks on semiconductors
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6236459B1 (en) 1998-11-05 2001-05-22 University Of Miami Thin film measuring device and method
US6256097B1 (en) * 1999-01-08 2001-07-03 Rudolph Technologies, Inc. Ellipsometer and ellipsometry method
AU6381500A (en) * 1999-07-27 2001-02-13 Colorado School Of Mines Parallel detecting, spectroscopic ellipsometers/polarimeters
US6812047B1 (en) * 2000-03-08 2004-11-02 Boxer Cross, Inc. Evaluating a geometric or material property of a multilayered structure
US6781692B1 (en) * 2000-08-28 2004-08-24 Therma-Wave, Inc. Method of monitoring the fabrication of thin film layers forming a DWDM filter
DE10045210A1 (de) * 2000-09-13 2002-05-02 Infineon Technologies Ag Verfahren und Vorrichtung zur Erfassung von auf einem Wafer aufgebrachten Schichten
US7280230B2 (en) * 2001-12-19 2007-10-09 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems
JP2004219261A (ja) * 2003-01-15 2004-08-05 Fuji Photo Film Co Ltd 薄膜の解析方法
US7515253B2 (en) 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
KR100913484B1 (ko) * 2008-02-19 2009-08-25 에스엔유 프리시젼 주식회사 암시야 검사장치
KR101114362B1 (ko) * 2009-03-09 2012-02-14 주식회사 쓰리비 시스템 결점검사를 위한 검사장치
WO2012140693A1 (ja) * 2011-04-12 2012-10-18 株式会社ニレコ 膜厚測定装置及び膜厚測定方法
CN104412079B (zh) 2012-05-09 2018-03-27 希捷科技有限公司 表面特征映射
US9212900B2 (en) 2012-08-11 2015-12-15 Seagate Technology Llc Surface features characterization
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9377394B2 (en) 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) * 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9274064B2 (en) 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
WO2015155349A1 (en) * 2014-04-11 2015-10-15 Danmarks Tekniske Universitet Method of and system for identification or estimation of a refractive index of a liquid
CN104122209B (zh) * 2014-07-25 2017-02-15 南京信息工程大学 微晶硅薄膜生长过程的可视化观测系统及测量方法
CN105486408B (zh) * 2015-11-26 2017-10-27 天津大学 基于彩色CCD的三波长Stokes矢量偏振测量方法
WO2017207681A2 (de) * 2016-06-02 2017-12-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Konfigurierbares retroreflex-sensorsystem zur verbesserten charakterisierung der eigenschaften einer probe, entsprechendes verfahren und entsprechende verwendung
CN107807095B (zh) * 2017-10-11 2020-10-20 华南师范大学 基于半导体硅纳米颗粒的动态颜色调控装置及方法
US10761032B1 (en) * 2019-02-26 2020-09-01 Bwxt Nuclear Operations Group, Inc. Apparatus and method for inspection of a film on a substrate
CN110823807B (zh) * 2019-10-29 2022-11-04 广东鑫瑞新材料科技有限公司 一种磁控基膜的色相在线检测装置及其检测方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4207467A (en) * 1978-09-05 1980-06-10 Laser Precision Corp. Film measuring apparatus and method
SE416681B (sv) * 1979-04-17 1981-01-26 Johan Emanuel Stenberg Sett att jemfora tva ytors reflexionsegenskaper
US4381151A (en) * 1980-10-23 1983-04-26 The United States Of America As Represented By The Secretary Of The Air Force Hand-holdable contamination tester
DE3173047D1 (en) * 1981-04-04 1986-01-09 Ibm Deutschland Device for the determination of the polarisation rate in a light-wave field and use of this device to interferometric and holographic measurements
JPS6052706A (ja) * 1983-08-31 1985-03-26 Nippon Kokan Kk <Nkk> 膜厚測定装置
JPS60122333A (ja) * 1983-12-07 1985-06-29 Univ Tohoku 偏光解析装置
US4695162A (en) * 1984-05-24 1987-09-22 Victor Company Of Japan, Ltd. Film thickness measuring apparatus
US5329357A (en) * 1986-03-06 1994-07-12 Sopra-Societe De Production Et De Recherches Appliquees Spectroscopic ellipsometry apparatus including an optical fiber
FR2628211B1 (fr) * 1988-03-04 1993-05-14 Vareille Aime Analyseur par ellipsometrie, procede d'analyse ellipsometrique d'un echantillon et application a la mesure de variation d'epaisseur des couches minces
DE3936541C2 (de) * 1988-11-02 1998-05-20 Ricoh Kk Verfahren zum Messen von mindestens zwei unbekannten physikalischen Größen einer einlagigen Dünnschicht oder der obersten Lage einer mehrlagigen Dünnschicht-Struktur
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
JPH04294227A (ja) * 1991-03-22 1992-10-19 Shimadzu Corp エリプソメータ
JPH0579978A (ja) * 1991-09-19 1993-03-30 Olympus Optical Co Ltd 薄膜観測装置

Also Published As

Publication number Publication date
EP0622624A1 (de) 1994-11-02
US5610392A (en) 1997-03-11
DE69421844T2 (de) 2000-06-29
EP0622624B1 (de) 1999-12-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee