DE69404483D1 - Permanentmagnet-Vorrichtung zur Verwendung in Magnetron-Plasma-Prozessen - Google Patents
Permanentmagnet-Vorrichtung zur Verwendung in Magnetron-Plasma-ProzessenInfo
- Publication number
- DE69404483D1 DE69404483D1 DE69404483T DE69404483T DE69404483D1 DE 69404483 D1 DE69404483 D1 DE 69404483D1 DE 69404483 T DE69404483 T DE 69404483T DE 69404483 T DE69404483 T DE 69404483T DE 69404483 D1 DE69404483 D1 DE 69404483D1
- Authority
- DE
- Germany
- Prior art keywords
- permanent magnet
- magnet device
- plasma processes
- magnetron plasma
- magnetron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5017979A JP2899190B2 (ja) | 1993-01-08 | 1993-01-08 | マグネトロンプラズマ用永久磁石磁気回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69404483D1 true DE69404483D1 (de) | 1997-09-04 |
DE69404483T2 DE69404483T2 (de) | 1997-12-04 |
Family
ID=11958847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69404483T Expired - Fee Related DE69404483T2 (de) | 1993-01-08 | 1994-01-10 | Permanentmagnet-Vorrichtung zur Verwendung in Magnetron-Plasma-Prozessen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5512872A (de) |
EP (1) | EP0606097B1 (de) |
JP (1) | JP2899190B2 (de) |
DE (1) | DE69404483T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5659276A (en) * | 1995-07-12 | 1997-08-19 | Shin-Etsu Chemical Co., Ltd. | Magnetic field generator for magnetron plasma |
DE19614599A1 (de) * | 1996-04-13 | 1997-10-16 | Singulus Technologies Gmbh | Vorrichtung zur Kathodenzerstäubung |
US5863399A (en) * | 1996-04-13 | 1999-01-26 | Singulus Technologies Gmbh | Device for cathode sputtering |
GB9718947D0 (en) * | 1997-09-05 | 1997-11-12 | Nordiko Ltd | Vacuum sputtering apparatus |
US6892970B2 (en) | 2002-12-18 | 2005-05-17 | Robert Bosch Gmbh | Fuel injector having segmented metal core |
EP1710829A1 (de) * | 2005-04-05 | 2006-10-11 | Applied Films GmbH & Co. KG | Magnetanordnung für ein Planar-Magnetron |
KR100793356B1 (ko) * | 2005-12-13 | 2008-01-11 | 삼성에스디아이 주식회사 | 스퍼터링 장치 |
JP4617279B2 (ja) * | 2006-08-10 | 2011-01-19 | 信越化学工業株式会社 | 磁気回路および磁場印加方法 |
JP5145342B2 (ja) * | 2007-08-24 | 2013-02-13 | 株式会社アルバック | 透明導電膜の形成方法 |
EP2197044A4 (de) * | 2007-09-19 | 2012-06-27 | Ulvac Inc | Solarbatterie-herstellungsverfahren |
US20100193352A1 (en) * | 2007-09-19 | 2010-08-05 | Ulvac, Inc. | Method for manufacturing solar cell |
WO2009046325A1 (en) | 2007-10-04 | 2009-04-09 | Hussmann Corporation | Permanent magnet device |
US8209988B2 (en) * | 2008-09-24 | 2012-07-03 | Husssmann Corporation | Magnetic refrigeration device |
TWI384510B (zh) * | 2010-11-12 | 2013-02-01 | Ind Tech Res Inst | 均勻磁場產生設備及其磁場產生單元 |
KR20140003570A (ko) | 2011-01-24 | 2014-01-09 | 히타치 긴조쿠 가부시키가이샤 | 마그네트론 스퍼터링용 자장 발생 장치 |
KR20140109427A (ko) | 2012-01-30 | 2014-09-15 | 미쓰비시덴키 가부시키가이샤 | 자기회로 |
US20140124359A1 (en) * | 2012-11-02 | 2014-05-08 | Intermolecular, Inc. | New Magnet Design Which Improves Erosion Profile for PVD Systems |
RU2528536C1 (ru) * | 2013-01-09 | 2014-09-20 | Открытое акционерное общество "Научно-исследовательский институт полупроводникового машиностроения" | Магнитный блок распылительной системы |
US10410889B2 (en) | 2014-07-25 | 2019-09-10 | Applied Materials, Inc. | Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors |
WO2018101444A1 (ja) * | 2016-11-30 | 2018-06-07 | 国立研究開発法人産業技術総合研究所 | マグネトロンスパッタリング装置、及び、磁場形成装置 |
CN111192807A (zh) * | 2018-11-15 | 2020-05-22 | 北京中科信电子装备有限公司 | 一种新型中束流平行透镜磁铁 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3781592A (en) * | 1972-06-08 | 1973-12-25 | Raytheon Co | Radial magnetized magnet |
GB1580574A (en) * | 1976-06-21 | 1980-12-03 | Kumakura S | Annular magnet assembly |
US4283647A (en) * | 1979-08-30 | 1981-08-11 | The Singer Company | Annular segment permanent magnet single air gap electric motor |
JPS57188679A (en) * | 1981-05-18 | 1982-11-19 | Kokusai Electric Co Ltd | Sputtering source for thin film forming device |
CA1266199A (en) * | 1985-01-28 | 1990-02-27 | Waldemar H. Greiner | Damper construction |
US4622122A (en) * | 1986-02-24 | 1986-11-11 | Oerlikon Buhrle U.S.A. Inc. | Planar magnetron cathode target assembly |
US4717876A (en) * | 1986-08-13 | 1988-01-05 | Numar | NMR magnet system for well logging |
JPH0726203B2 (ja) * | 1987-05-11 | 1995-03-22 | 松下電器産業株式会社 | マグネトロンスパッタリング装置 |
JPH0813174B2 (ja) * | 1990-08-29 | 1996-02-07 | 松下電器産業株式会社 | 永久磁石付回転機の回転子 |
-
1993
- 1993-01-08 JP JP5017979A patent/JP2899190B2/ja not_active Expired - Fee Related
-
1994
- 1994-01-10 EP EP94100245A patent/EP0606097B1/de not_active Expired - Lifetime
- 1994-01-10 DE DE69404483T patent/DE69404483T2/de not_active Expired - Fee Related
- 1994-01-10 US US08/179,551 patent/US5512872A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2899190B2 (ja) | 1999-06-02 |
US5512872A (en) | 1996-04-30 |
JPH06207271A (ja) | 1994-07-26 |
EP0606097A1 (de) | 1994-07-13 |
EP0606097B1 (de) | 1997-07-30 |
DE69404483T2 (de) | 1997-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |