DE69404145D1 - Zusammensetzungen von stoffen - Google Patents

Zusammensetzungen von stoffen

Info

Publication number
DE69404145D1
DE69404145D1 DE69404145T DE69404145T DE69404145D1 DE 69404145 D1 DE69404145 D1 DE 69404145D1 DE 69404145 T DE69404145 T DE 69404145T DE 69404145 T DE69404145 T DE 69404145T DE 69404145 D1 DE69404145 D1 DE 69404145D1
Authority
DE
Germany
Prior art keywords
substances
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69404145T
Other languages
English (en)
Other versions
DE69404145T2 (de
Inventor
Pushpito Ghosh
Ian Weddell
John Yates
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Zeneca Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeneca Ltd filed Critical Zeneca Ltd
Publication of DE69404145D1 publication Critical patent/DE69404145D1/de
Application granted granted Critical
Publication of DE69404145T2 publication Critical patent/DE69404145T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
DE69404145T 1993-04-08 1994-04-06 Zusammensetzungen von stoffen Expired - Fee Related DE69404145T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB939307479A GB9307479D0 (en) 1993-04-08 1993-04-08 Compositions of matter
PCT/GB1994/000730 WO1994024170A1 (en) 1993-04-08 1994-04-06 Compositions of matter

Publications (2)

Publication Number Publication Date
DE69404145D1 true DE69404145D1 (de) 1997-08-14
DE69404145T2 DE69404145T2 (de) 1998-01-22

Family

ID=10733645

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69404145T Expired - Fee Related DE69404145T2 (de) 1993-04-08 1994-04-06 Zusammensetzungen von stoffen

Country Status (6)

Country Link
US (1) US5712322A (de)
EP (1) EP0697025B1 (de)
JP (1) JP3364686B2 (de)
DE (1) DE69404145T2 (de)
GB (1) GB9307479D0 (de)
WO (1) WO1994024170A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2783829B1 (fr) * 1998-09-29 2005-12-09 Corning Sa Preparation de pieces organiques de qualite optique et notamment de lentilles organiques
JP2004250673A (ja) * 2003-01-28 2004-09-09 National Institute For Materials Science ゲル化コロイド結晶前駆体とゲル化コロイド結晶、及びゲル化コロイド結晶の作製方法とその作製装置
US9365659B2 (en) 2014-01-29 2016-06-14 Excelsior Nanotech Corporation System and method for optimizing the efficiency of photo-polymerization

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL217612A (de) * 1956-06-06
JPS60197609A (ja) * 1984-03-16 1985-10-07 Kuraray Co Ltd 歯科用組成物
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4828583A (en) * 1987-04-02 1989-05-09 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
EP0336417A3 (de) * 1988-04-07 1991-09-11 Dentsply International, Inc. Phosphonat-Initiatoren für lichtvernetzbare Zusammensetzungen
GB9123914D0 (en) * 1991-11-11 1992-01-02 Ici Plc Polymerisable compositions

Also Published As

Publication number Publication date
DE69404145T2 (de) 1998-01-22
EP0697025A1 (de) 1996-02-21
GB9307479D0 (en) 1993-06-02
EP0697025B1 (de) 1997-07-09
US5712322A (en) 1998-01-27
JP3364686B2 (ja) 2003-01-08
JPH08509006A (ja) 1996-09-24
WO1994024170A1 (en) 1994-10-27

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CIBA SPECIALTY CHEMICALS HOLDING INC., BASEL, CH

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee