DE69402126D1 - Anthracenderivate - Google Patents

Anthracenderivate

Info

Publication number
DE69402126D1
DE69402126D1 DE69402126T DE69402126T DE69402126D1 DE 69402126 D1 DE69402126 D1 DE 69402126D1 DE 69402126 T DE69402126 T DE 69402126T DE 69402126 T DE69402126 T DE 69402126T DE 69402126 D1 DE69402126 D1 DE 69402126D1
Authority
DE
Germany
Prior art keywords
anthracene derivatives
anthracene
derivatives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69402126T
Other languages
English (en)
Other versions
DE69402126T2 (de
Inventor
Fumiyoshi Urano
Keiji Oono
Hiroshi Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd filed Critical Wako Pure Chemical Industries Ltd
Publication of DE69402126D1 publication Critical patent/DE69402126D1/de
Application granted granted Critical
Publication of DE69402126T2 publication Critical patent/DE69402126T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/84—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
    • C07C69/88—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with esterified carboxyl groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24—Anthracenes; Hydrogenated anthracenes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69402126T 1993-07-20 1994-07-13 Anthracenderivate Expired - Fee Related DE69402126T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20036493 1993-07-20

Publications (2)

Publication Number Publication Date
DE69402126D1 true DE69402126D1 (de) 1997-04-24
DE69402126T2 DE69402126T2 (de) 1997-09-18

Family

ID=16423080

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69402126T Expired - Fee Related DE69402126T2 (de) 1993-07-20 1994-07-13 Anthracenderivate

Country Status (4)

Country Link
US (1) US5498748A (de)
EP (1) EP0635480B1 (de)
KR (1) KR100255985B1 (de)
DE (1) DE69402126T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
JP3053072B2 (ja) * 1996-09-10 2000-06-19 東京応化工業株式会社 レジスト積層体及びそれを用いたパターン形成方法
US5976770A (en) * 1998-01-15 1999-11-02 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US6190839B1 (en) 1998-01-15 2001-02-20 Shipley Company, L.L.C. High conformality antireflective coating compositions
US6410209B1 (en) 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
US6316165B1 (en) 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
KR100804873B1 (ko) * 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 포토리소그래피용 ｓｏｇ 반사방지 코팅
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CN1606713B (zh) * 2001-11-15 2011-07-06 霍尼韦尔国际公司 用于照相平版印刷术的旋涂抗反射涂料
KR100949343B1 (ko) * 2002-02-19 2010-03-26 닛산 가가쿠 고교 가부시키 가이샤 반사방지막 형성 조성물
JP2006500769A (ja) * 2002-09-20 2006-01-05 ハネウェル・インターナショナル・インコーポレーテッド 低ｋ材料用の中間層接着促進剤
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20060255315A1 (en) * 2004-11-19 2006-11-16 Yellowaga Deborah L Selective removal chemistries for semiconductor applications, methods of production and uses thereof
CA2679955A1 (en) * 2006-10-13 2008-05-29 Reliance Life Sciences Pvt. Ltd. Novel chemotherapeutic agents against inflammation and cancer
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
EP2019091A1 (de) * 2007-06-25 2009-01-28 Fundació Privada Institut d'Investigació Biomédica de Girona - Dr. Josep Trueta Neue polyhydroxilierte Verbindungen als Fettsäurensynthasehemmer
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
TWI806945B (zh) 2017-12-22 2023-07-01 日商日產化學股份有限公司 具有二醇結構之保護膜形成組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0612452B2 (ja) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
US4822718A (en) * 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
JPS59135748A (ja) * 1983-01-24 1984-08-04 Hitachi Ltd 多層配線用層間絶縁膜を有する半導体装置
US4843097A (en) * 1984-06-13 1989-06-27 Groupement D'interet Economique Dit: Centre International De Recherches Dermatologiques C.I.R.D. 10-aryl-1,8-dihydroxy-9-anthrones and their esters, process for preparing same, and use of same in human and veterinary medicine and in cosmetics
FR2591222B1 (fr) * 1985-12-11 1988-07-22 Cird Mono, di et tri-esters de dihydroxy-1,8 phenyl-10 anthrone-9 ou anthranol-9, leur procede de preparation et leur utilisation en medecine humaine ou veterinaire et en cosmetique
JPH04298505A (ja) * 1991-02-28 1992-10-22 Ipposha Oil Ind Co Ltd 高分子の光安定化方法およびプラスチック用紫外線吸収剤
JPH0547656A (ja) * 1991-08-08 1993-02-26 Mitsubishi Electric Corp レジストパターンの形成方法および該方法に用いられる反射防止膜形成用有機シラン化合物

Also Published As

Publication number Publication date
KR100255985B1 (ko) 2000-06-01
US5498748A (en) 1996-03-12
DE69402126T2 (de) 1997-09-18
EP0635480A1 (de) 1995-01-25
EP0635480B1 (de) 1997-03-19
KR950004377A (ko) 1995-02-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee