DE69332460D1 - Gebrauchsverfahren von strahlungsempfindlichen Materialien - Google Patents

Gebrauchsverfahren von strahlungsempfindlichen Materialien

Info

Publication number
DE69332460D1
DE69332460D1 DE69332460T DE69332460T DE69332460D1 DE 69332460 D1 DE69332460 D1 DE 69332460D1 DE 69332460 T DE69332460 T DE 69332460T DE 69332460 T DE69332460 T DE 69332460T DE 69332460 D1 DE69332460 D1 DE 69332460D1
Authority
DE
Germany
Prior art keywords
radiation sensitive
sensitive materials
materials
radiation
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69332460T
Other languages
English (en)
Other versions
DE69332460T2 (de
Inventor
Ajey Madhav Joshi
Timothy William Weidman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Publication of DE69332460D1 publication Critical patent/DE69332460D1/de
Application granted granted Critical
Publication of DE69332460T2 publication Critical patent/DE69332460T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69332460T 1992-04-29 1993-04-20 Gebrauchsverfahren von strahlungsempfindlichen Materialien Expired - Lifetime DE69332460T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/875,851 US5439780A (en) 1992-04-29 1992-04-29 Energy sensitive materials and methods for their use

Publications (2)

Publication Number Publication Date
DE69332460D1 true DE69332460D1 (de) 2002-12-12
DE69332460T2 DE69332460T2 (de) 2003-07-10

Family

ID=25366471

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69332460T Expired - Lifetime DE69332460T2 (de) 1992-04-29 1993-04-20 Gebrauchsverfahren von strahlungsempfindlichen Materialien

Country Status (7)

Country Link
US (1) US5439780A (de)
EP (1) EP0568235B1 (de)
JP (1) JP3371010B2 (de)
KR (2) KR100299730B1 (de)
CA (1) CA2085698C (de)
DE (1) DE69332460T2 (de)
TW (1) TW232053B (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
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US5635338A (en) * 1992-04-29 1997-06-03 Lucent Technologies Inc. Energy sensitive materials and methods for their use
US6013418A (en) * 1992-04-29 2000-01-11 Lucent Technologies Inc. Method for developing images in energy sensitive materials
US5874367A (en) 1992-07-04 1999-02-23 Trikon Technologies Limited Method of treating a semi-conductor wafer
US5858880A (en) * 1994-05-14 1999-01-12 Trikon Equipment Limited Method of treating a semi-conductor wafer
DE19630705A1 (de) 1995-08-30 1997-03-20 Deutsche Telekom Ag Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik
US5925494A (en) * 1996-02-16 1999-07-20 Massachusetts Institute Of Technology Vapor deposition of polymer films for photolithography
US6020447A (en) * 1996-03-29 2000-02-01 Massachusetts Institute Of Technology Sonichemical synthesis of silicon carbide precursors and methods for preparation thereof
KR100440233B1 (ko) 1996-08-24 2004-07-15 트리콘 이큅먼츠 리미티드 반도체 기판 처리방법
US5885751A (en) * 1996-11-08 1999-03-23 Applied Materials, Inc. Method and apparatus for depositing deep UV photoresist films
JP3411559B2 (ja) * 1997-07-28 2003-06-03 マサチューセッツ・インスティチュート・オブ・テクノロジー シリコーン膜の熱分解化学蒸着法
US6204168B1 (en) 1998-02-02 2001-03-20 Applied Materials, Inc. Damascene structure fabricated using a layer of silicon-based photoresist material
EP0942330A1 (de) 1998-03-11 1999-09-15 Applied Materials, Inc. Verfahren zur Abscheidung und zum Entwickeln eines mittels Plasmapolymerisation erzeugten Organosilikon-Resistfilmes
US6127263A (en) 1998-07-10 2000-10-03 Applied Materials, Inc. Misalignment tolerant techniques for dual damascene fabrication
US6245662B1 (en) 1998-07-23 2001-06-12 Applied Materials, Inc. Method of producing an interconnect structure for an integrated circuit
TW437040B (en) * 1998-08-12 2001-05-28 Applied Materials Inc Interconnect line formed by dual damascene using dielectric layers having dissimilar etching characteristics
US20020039809A1 (en) * 1998-09-03 2002-04-04 Bradley J. Howard Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same
EP1033744A3 (de) * 1999-02-26 2009-07-15 Applied Materials, Inc. Verbessertes trocken-photolithographisches Verfahren zur Bestrahlung im tiefen UV-Bereich
US6509138B2 (en) 2000-01-12 2003-01-21 Semiconductor Research Corporation Solventless, resistless direct dielectric patterning
US6420189B1 (en) 2001-04-27 2002-07-16 Advanced Micro Devices, Inc. Superconducting damascene interconnected for integrated circuit
US6482656B1 (en) 2001-06-04 2002-11-19 Advanced Micro Devices, Inc. Method of electrochemical formation of high Tc superconducting damascene interconnect for integrated circuit
US6495443B1 (en) 2001-06-05 2002-12-17 Advanced Micro Devices, Inc. Method of re-working copper damascene wafers
JP2003031639A (ja) * 2001-07-17 2003-01-31 Canon Inc 基板処理装置、基板の搬送方法及び露光装置
JP2003045947A (ja) * 2001-07-27 2003-02-14 Canon Inc 基板処理装置及び露光装置
US6989428B1 (en) * 2002-03-22 2006-01-24 University Of Massachusetts Methods of preparing polysilynes
WO2003082763A2 (en) * 2002-03-25 2003-10-09 University Of Massachusetts High molecular weight polymers
US6740579B2 (en) * 2002-06-18 2004-05-25 Intel Corporation Method of making a semiconductor device that includes a dual damascene interconnect
KR101155841B1 (ko) * 2003-03-03 2012-06-20 램 리써치 코포레이션 이중 도핑된 게이트 애플리케이션에서 프로파일 제어 및ｎ／ｐ 로딩을 개선하는 방법
US7141505B2 (en) * 2003-06-27 2006-11-28 Lam Research Corporation Method for bilayer resist plasma etch
US7271983B2 (en) * 2004-09-16 2007-09-18 Quantum Corporation Magnetic head with mini-outriggers and method of manufacture
US7622246B2 (en) * 2006-09-22 2009-11-24 Massachusetts Institute Of Technology Contrast enhancing layers
JP5878281B2 (ja) 2006-11-03 2016-03-08 ハーキュリーズ・インコーポレーテッドＨｅｒｃｕｌｅｓ Ｉｎｃｏｒｐｏｒａｔｅｄ グリオキサールで処理した分散性カチオン性ポリガラクトマンナンポリマー
US8158338B2 (en) 2008-07-08 2012-04-17 Massachusetts Institute Of Technology Resist sensitizer
WO2010005892A1 (en) * 2008-07-08 2010-01-14 Massachusetts Institute Of Technology Resist composition and lithographic process using said composition

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129345A (en) * 1979-03-29 1980-10-07 Ulvac Corp Electron beam plate making method by vapor phase film formation and vapor phase development
JPS5799639A (en) * 1980-12-12 1982-06-21 Fujitsu Ltd Treatment of negative type resist
JPS57202537A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Resist composition for dry development
US4476216A (en) * 1981-08-03 1984-10-09 Amdahl Corporation Method for high resolution lithography
US4357369A (en) * 1981-11-10 1982-11-02 Rca Corporation Method of plasma etching a substrate
US4459338A (en) * 1982-03-19 1984-07-10 The United States Of America As Represented By The United States Department Of Energy Method of deposition of silicon carbide layers on substrates and product
JPS60114575A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
US4537942A (en) * 1984-02-10 1985-08-27 Minnesota Mining And Manufacturing Company Polyhydridosilanes and their conversion to pyropolymers
US4801468A (en) * 1985-02-25 1989-01-31 Canon Kabushiki Kaisha Process for forming deposited film
JPS62160981A (ja) * 1986-01-08 1987-07-16 Mitsubishi Heavy Ind Ltd 石油タンカ−の改造法
US4719273A (en) * 1985-09-04 1988-01-12 Massachusetts Institute Of Technology Method for forming new preceramic polymers containing silicon
US4781942A (en) * 1985-12-19 1988-11-01 Hughes Aircraft Company Process for the photochemical vapor deposition of siloxane polymers
DE3772267D1 (de) * 1986-06-12 1991-09-26 Matsushita Electric Ind Co Ltd Bilderzeugungsverfahren.
US4720532A (en) * 1986-08-22 1988-01-19 Massachusetts Institute Of Technology Organopolysilazane precursors to silicon nitride-rich mixed SiC/Si3 N4
EP0283311B1 (de) * 1987-03-18 2001-08-01 Kabushiki Kaisha Toshiba Verfahren zur Herstellung von Dünnschichten
WO1989007285A1 (en) * 1988-01-29 1989-08-10 Massachusetts Institute Of Technology Integrated circuit micro-fabrication using dry lithographic processes
CA1334911C (en) * 1989-02-15 1995-03-28 David M. Dobuzinsky Process for the vapor deposition of polysilanes
US4921321A (en) * 1989-04-27 1990-05-01 American Telephone And Telegraph Company Silicon network polymers
US5126006A (en) * 1990-10-30 1992-06-30 International Business Machines Corp. Plural level chip masking

Also Published As

Publication number Publication date
CA2085698A1 (en) 1993-10-30
EP0568235A1 (de) 1993-11-03
JP3371010B2 (ja) 2003-01-27
KR100299730B1 (ko) 2001-11-22
EP0568235B1 (de) 2002-11-06
US5439780A (en) 1995-08-08
CA2085698C (en) 1999-06-08
KR100330448B1 (ko) 2002-04-03
DE69332460T2 (de) 2003-07-10
JPH0683074A (ja) 1994-03-25
KR930022149A (ko) 1993-11-23
TW232053B (de) 1994-10-11

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Legal Events

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