DE69330704D1 - Festkörper-Farbbildaufnahmevorrichtung - Google Patents

Festkörper-Farbbildaufnahmevorrichtung

Info

Publication number
DE69330704D1
DE69330704D1 DE69330704T DE69330704T DE69330704D1 DE 69330704 D1 DE69330704 D1 DE 69330704D1 DE 69330704 T DE69330704 T DE 69330704T DE 69330704 T DE69330704 T DE 69330704T DE 69330704 D1 DE69330704 D1 DE 69330704D1
Authority
DE
Germany
Prior art keywords
image pickup
solid state
color image
pickup device
state color
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69330704T
Other languages
English (en)
Other versions
DE69330704T2 (de
Inventor
Koji Shimomura
Yoshikazu Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Application granted granted Critical
Publication of DE69330704D1 publication Critical patent/DE69330704D1/de
Publication of DE69330704T2 publication Critical patent/DE69330704T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/148—Charge coupled imagers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14685—Process for coatings or optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14621—Colour filter arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device
    • H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers

Landscapes

  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Color Television Image Signal Generators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69330704T 1992-10-06 1993-10-06 Festkörper-Farbbildaufnahmevorrichtung Expired - Lifetime DE69330704T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP26709892 1992-10-06
JP26709992 1992-10-06

Publications (2)

Publication Number Publication Date
DE69330704D1 true DE69330704D1 (de) 2001-10-11
DE69330704T2 DE69330704T2 (de) 2002-05-29

Family

ID=26547715

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69330704T Expired - Lifetime DE69330704T2 (de) 1992-10-06 1993-10-06 Festkörper-Farbbildaufnahmevorrichtung

Country Status (5)

Country Link
US (2) US5404005A (de)
EP (1) EP0593197B1 (de)
JP (2) JP2863422B2 (de)
KR (1) KR970008453B1 (de)
DE (1) DE69330704T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2863422B2 (ja) * 1992-10-06 1999-03-03 松下電子工業株式会社 固体撮像装置およびその製造方法
US5766980A (en) * 1994-03-25 1998-06-16 Matsushita Electronics Corporation Method of manufacturing a solid state imaging device
US5534443A (en) * 1994-03-25 1996-07-09 Matsushita Electronics Corporation Method of manufacturing a solid state imaging device
US5708264A (en) * 1995-11-07 1998-01-13 Eastman Kodak Company Planar color filter array for CCDs from dyed and mordant layers
US5677202A (en) * 1995-11-20 1997-10-14 Eastman Kodak Company Method for making planar color filter array for image sensors with embedded color filter arrays
JPH1126737A (ja) * 1997-06-30 1999-01-29 Victor Co Of Japan Ltd 固体撮像素子
KR100310102B1 (ko) * 1998-03-05 2001-12-17 윤종용 고체 컬러 이미지 소자 및 그의 제조 방법
TW396645B (en) * 1998-06-16 2000-07-01 United Microelectronics Corp Manufacturing method of CMOS sensor devices
US6297071B1 (en) * 1998-07-22 2001-10-02 Eastman Kodak Company Method of making planar image sensor color filter arrays
US6383894B1 (en) * 2000-03-31 2002-05-07 Intel Corporation Method of forming scribe line planarization layer
KR100390823B1 (ko) * 2000-12-30 2003-07-10 주식회사 하이닉스반도체 서로 다른 색의 픽셀 내에 각기 다른 깊이의 포토다이오드를 구비하는 이미지 센서 제조 방법
KR20030002881A (ko) * 2001-06-30 2003-01-09 주식회사 하이닉스반도체 이미지센서
KR100462757B1 (ko) * 2002-03-14 2004-12-20 동부전자 주식회사 이미지 센서용 반도체 소자 제조 방법
TWI283335B (en) * 2002-08-20 2007-07-01 Kyowa Yuka Kk A composition with photo-sensibility of visible light
US6861280B2 (en) * 2002-10-25 2005-03-01 Omnivision International Holding Ltd Image sensor having micro-lenses with integrated color filter and method of making
TW594200B (en) * 2003-03-18 2004-06-21 Chi Mei Optoelectronics Corp Liquid crystal display panel and method for manufacturing the same
JP3737089B2 (ja) * 2003-05-27 2006-01-18 松下電器産業株式会社 固体撮像装置製造方法および固体撮像装置
US7507598B2 (en) * 2003-06-06 2009-03-24 Taiwan Semiconductor Manufacturing Co., Ltd. Image sensor fabrication method and structure
TWI222178B (en) * 2003-11-12 2004-10-11 United Microelectronics Corp Manufacturing method of image sensor device
JP4822683B2 (ja) * 2004-10-08 2011-11-24 パナソニック株式会社 固体撮像装置およびその製造方法
US7078779B2 (en) * 2004-10-15 2006-07-18 Taiwan Semiconductor Manufacturing Co., Ltd Enhanced color image sensor device and method of making the same
US8139131B2 (en) * 2005-01-18 2012-03-20 Panasonic Corporation Solid state imaging device and fabrication method thereof, and camera incorporating the solid state imaging device
KR101165751B1 (ko) * 2005-07-14 2012-07-18 삼성전자주식회사 액정표시장치와 그 제조방법
JP4457142B2 (ja) * 2007-10-17 2010-04-28 シャープ株式会社 固体撮像素子、カメラモジュールおよび電子情報機器
US7816641B2 (en) * 2007-12-28 2010-10-19 Candela Microsystems (S) Pte. Ltd. Light guide array for an image sensor
JP5510053B2 (ja) * 2010-05-14 2014-06-04 凸版印刷株式会社 リニアセンサ用カラーフィルタの製造方法
JP6433208B2 (ja) * 2014-02-20 2018-12-05 キヤノン株式会社 固体撮像装置の製造方法
JP6346826B2 (ja) * 2014-08-06 2018-06-20 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
KR102175480B1 (ko) * 2016-09-30 2020-11-06 후지필름 가부시키가이샤 구조체, 컬러 필터, 고체 촬상 소자, 화상 표시 장치, 구조체의 제조 방법 및 유기물층 형성용 조성물

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5999763A (ja) * 1982-11-30 1984-06-08 Toshiba Corp 固体撮像装置
US4667092A (en) * 1982-12-28 1987-05-19 Nec Corporation Solid-state image device with resin lens and resin contact layer
JPS61290408A (ja) * 1985-06-18 1986-12-20 Fuji Xerox Co Ltd カラ−密着型イメ−ジセンサおよびその製造方法
CA1293879C (en) * 1986-06-20 1992-01-07 Laurel Jean Pace Color filter arrays
US4827118A (en) * 1986-07-10 1989-05-02 Minolta Camera Kabushiki Kaisha Light-sensitive device having color filter and manufacturing method thereof
JPH02153353A (ja) * 1988-07-25 1990-06-13 Matsushita Electric Ind Co Ltd 着色光重合組成物およびカラーフィルタ
US4991936A (en) * 1988-10-18 1991-02-12 Eastman Kodak Company Thermally-transferred color filter array element
DE68922470T2 (de) * 1988-11-26 1995-09-07 Toppan Printing Co Ltd Farbfilter für eine Vielfarben-Flüssigkristallanzeigetafel.
JPH02244101A (ja) * 1989-03-17 1990-09-28 Matsushita Electron Corp カラー固体撮像装置の製造方法
JPH0485322A (ja) * 1990-07-27 1992-03-18 Chisso Corp 熱硬化性樹脂組成物
KR920013734A (ko) * 1990-12-31 1992-07-29 김광호 칼라필터의 제조방법
KR930003687B1 (ko) * 1990-12-31 1993-05-08 삼성전자 주식회사 칼라필터의 제조방법
JPH04334056A (ja) * 1991-05-09 1992-11-20 Toshiba Corp 固体撮像装置の製造方法
JP2863422B2 (ja) * 1992-10-06 1999-03-03 松下電子工業株式会社 固体撮像装置およびその製造方法

Also Published As

Publication number Publication date
JPH06224399A (ja) 1994-08-12
KR970008453B1 (ko) 1997-05-24
EP0593197B1 (de) 2001-09-05
EP0593197A1 (de) 1994-04-20
JPH11154742A (ja) 1999-06-08
JP2863422B2 (ja) 1999-03-03
DE69330704T2 (de) 2002-05-29
US5747790A (en) 1998-05-05
US5404005A (en) 1995-04-04
KR940010708A (ko) 1994-05-26

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA,

8327 Change in the person/name/address of the patent owner

Owner name: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., OSAKA, J

8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP