DE69327126D1 - Schutzlack-Überzugszusammensetzung - Google Patents

Schutzlack-Überzugszusammensetzung

Info

Publication number
DE69327126D1
DE69327126D1 DE69327126T DE69327126T DE69327126D1 DE 69327126 D1 DE69327126 D1 DE 69327126D1 DE 69327126 T DE69327126 T DE 69327126T DE 69327126 T DE69327126 T DE 69327126T DE 69327126 D1 DE69327126 D1 DE 69327126D1
Authority
DE
Germany
Prior art keywords
coating composition
lacquer coating
protective lacquer
protective
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69327126T
Other languages
English (en)
Other versions
DE69327126T2 (de
Inventor
Makoto Murata
Toshiyuki Ota
Yoshiji Yumoto
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE69327126D1 publication Critical patent/DE69327126D1/de
Application granted granted Critical
Publication of DE69327126T2 publication Critical patent/DE69327126T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
DE69327126T 1992-03-23 1993-03-23 Schutzlack-Überzugszusammensetzung Expired - Lifetime DE69327126T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9495692 1992-03-23

Publications (2)

Publication Number Publication Date
DE69327126D1 true DE69327126D1 (de) 2000-01-05
DE69327126T2 DE69327126T2 (de) 2000-06-21

Family

ID=14124389

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69327126T Expired - Lifetime DE69327126T2 (de) 1992-03-23 1993-03-23 Schutzlack-Überzugszusammensetzung

Country Status (3)

Country Link
EP (1) EP0562819B1 (de)
KR (1) KR100341563B1 (de)
DE (1) DE69327126T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW502133B (en) 1999-06-10 2002-09-11 Wako Pure Chem Ind Ltd Resist composition, agent and method for reducing substrate dependence thereof
TWI228203B (en) 2000-03-22 2005-02-21 Shinetsu Chemical Co Chemical amplification positive resist material and method for forming pattern
JP4347110B2 (ja) 2003-10-22 2009-10-21 東京応化工業株式会社 電子線又はｅｕｖ用ポジ型レジスト組成物
KR102316645B1 (ko) * 2016-03-31 2021-10-25 가부시키가이샤 아데카 감광성 조성물 및 신규 화합물

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8413395D0 (en) * 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
DE3752371T2 (de) * 1986-12-23 2004-04-15 Shipley Co. Inc., Marlborough Fotoresistzusammensetzungen und ihre Bestandteile
JP2540199B2 (ja) * 1988-02-25 1996-10-02 アメリカン テレフォン アンド テレグラフ カムパニー デバイスの製造方法
NO891062L (no) * 1988-03-31 1989-10-02 Thiokol Morton Inc Positiv fotofoelsom sammensetning.
JPH0693115B2 (ja) * 1988-10-18 1994-11-16 日本合成ゴム株式会社 ネガ型感放射線性樹脂組成物
JP2661671B2 (ja) * 1989-03-20 1997-10-08 株式会社日立製作所 パタン形成材料とそれを用いたパタン形成方法
JP2660352B2 (ja) * 1989-09-20 1997-10-08 日本ゼオン株式会社 レジスト組成物
DE69125634T2 (de) * 1990-01-30 1998-01-02 Wako Pure Chem Ind Ltd Chemisch verstärktes Photolack-Material
JPH0480758A (ja) * 1990-07-23 1992-03-13 Fuji Photo Film Co Ltd 感光性組成物
JPH04328747A (ja) * 1991-03-27 1992-11-17 Internatl Business Mach Corp <Ibm> 均一にコートされたフォトレジスト組成物
US5332650A (en) * 1991-09-06 1994-07-26 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition
JPH1145649A (ja) * 1997-07-28 1999-02-16 Fujitsu Takamizawa Component Kk 進行波型超音波継電器

Also Published As

Publication number Publication date
KR930020227A (ko) 1993-10-19
EP0562819A3 (de) 1993-11-03
EP0562819A2 (de) 1993-09-29
KR100341563B1 (ko) 2002-10-25
DE69327126T2 (de) 2000-06-21
EP0562819B1 (de) 1999-12-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition