DE69321994D1 - Anlage für die Herstellung von Reinigungswasser - Google Patents
Anlage für die Herstellung von ReinigungswasserInfo
- Publication number
- DE69321994D1 DE69321994D1 DE69321994T DE69321994T DE69321994D1 DE 69321994 D1 DE69321994 D1 DE 69321994D1 DE 69321994 T DE69321994 T DE 69321994T DE 69321994 T DE69321994 T DE 69321994T DE 69321994 D1 DE69321994 D1 DE 69321994D1
- Authority
- DE
- Germany
- Prior art keywords
- plant
- production
- cleaning water
- cleaning
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0031—Degasification of liquids by filtration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3227—Units with two or more lamps
Landscapes
- Chemical & Material Sciences (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Water Treatments (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Sorption (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Treatment Of Water By Ion Exchange (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4160091A JP2652301B2 (ja) | 1992-05-28 | 1992-05-28 | 洗浄水製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69321994D1 true DE69321994D1 (de) | 1998-12-17 |
DE69321994T2 DE69321994T2 (de) | 1999-06-24 |
Family
ID=15707667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69321994T Expired - Fee Related DE69321994T2 (de) | 1992-05-28 | 1993-05-28 | Anlage für die Herstellung von Reinigungswasser |
Country Status (5)
Country | Link |
---|---|
US (1) | US5614088A (de) |
EP (1) | EP0572035B1 (de) |
JP (1) | JP2652301B2 (de) |
KR (1) | KR100254098B1 (de) |
DE (1) | DE69321994T2 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970008315A (ko) * | 1995-07-26 | 1997-02-24 | 김광호 | 반도체장치 |
JPH11290848A (ja) * | 1998-04-08 | 1999-10-26 | Chiyoda Kohan Co Ltd | 濾過方法及び装置 |
DE19900805C2 (de) * | 1999-01-12 | 2002-06-13 | Infineon Technologies Ag | Verfahren und Vorrichtung zur Erzeugung von Reinstwasser |
JP4565364B2 (ja) * | 1999-08-02 | 2010-10-20 | 栗田工業株式会社 | 超純水製造供給装置の抗菌方法及び抗菌装置 |
US6328881B1 (en) | 2000-03-08 | 2001-12-11 | Barnstead Thermolyne Corporation | Water purification system and method including dispensed volume sensing and control |
USRE40310E1 (en) | 2000-03-08 | 2008-05-13 | Barnstead Thermolyne Corporation | Water purification system and method including dispensed volume sensing and control |
JP3966501B2 (ja) | 2002-03-18 | 2007-08-29 | オルガノ株式会社 | 超純水製造装置 |
JP4736339B2 (ja) * | 2004-03-29 | 2011-07-27 | 栗田工業株式会社 | 送液手段および送液方法 |
JP4742509B2 (ja) * | 2004-03-31 | 2011-08-10 | 栗田工業株式会社 | 純水供給システム |
JP4860915B2 (ja) * | 2004-12-17 | 2012-01-25 | パナソニック株式会社 | 送液手段および送液方法 |
FR2896792B1 (fr) | 2006-01-27 | 2008-07-18 | Millipore Corp | Systeme et procede de purification d'eau |
FR2896793B1 (fr) | 2006-01-27 | 2008-08-08 | Millipore Corp | Systeme et procede de purification d'eau |
JP5072062B2 (ja) * | 2006-03-13 | 2012-11-14 | 栗田工業株式会社 | 水素ガス溶解洗浄水の製造方法、製造装置及び洗浄装置 |
JP2009154158A (ja) * | 2009-04-03 | 2009-07-16 | Kurita Water Ind Ltd | 純水供給システム |
US8552719B2 (en) * | 2009-08-03 | 2013-10-08 | Microfier, Inc. | Method and apparatus for the purification and analytical evaluation of highly purified liquids |
JP2010115652A (ja) * | 2010-01-08 | 2010-05-27 | Kurita Water Ind Ltd | 純水供給システム |
DE102010043662B4 (de) * | 2010-11-09 | 2012-06-14 | Michael Eumann | Brauereiabwasseraufbereitungsverfahren sowie Brauereiabwasseraufbereitungsvorrichtung |
JP5874223B2 (ja) * | 2011-07-08 | 2016-03-02 | 栗田工業株式会社 | オゾン水供給装置及びオゾン水供給方法 |
US9607864B2 (en) * | 2012-05-23 | 2017-03-28 | Stmicroelectronics, Inc. | Dual medium filter for ion and particle filtering during semiconductor processing |
CN105753202B (zh) * | 2016-05-03 | 2018-03-23 | 海南立昇净水科技实业有限公司 | 一种纯净水机的控制方法及其控制系统 |
JP6981331B2 (ja) * | 2018-03-23 | 2021-12-15 | 栗田工業株式会社 | 超純水供給装置 |
CN111320236A (zh) * | 2018-12-14 | 2020-06-23 | 福建钦榕环保科技有限公司 | 一种气水混合均匀的带状软式超滤膜 |
EP3946766A1 (de) * | 2019-04-05 | 2022-02-09 | Ecolab USA Inc. | Clean-in-place mit ultraweichem wasser |
CN111037764A (zh) * | 2019-12-23 | 2020-04-21 | 宜兴市欧清环保科技有限公司 | 大循环冷却液循环系统 |
EP4423018A1 (de) * | 2021-10-26 | 2024-09-04 | Regeneron Pharmaceuticals, Inc. | Systeme und verfahren zur erzeugung von laborwasser und verteilung von laborwasser bei verschiedenen temperaturen |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3774763A (en) * | 1970-10-15 | 1973-11-27 | Culligan Int Co | Water purification system |
US3870033A (en) * | 1973-11-30 | 1975-03-11 | Aqua Media | Ultra pure water process and apparatus |
US4280912A (en) * | 1978-05-22 | 1981-07-28 | Darco Water Systems, Inc. | Water purification unit and method |
US4179373A (en) * | 1978-09-14 | 1979-12-18 | Consolidated Foods Corporation | Shutoff and bypass valve |
US4470911A (en) * | 1983-10-11 | 1984-09-11 | Autotrol Corporation | Microcomputer controlled demand/scheduled water softener with variable capacity |
JPS60166040A (ja) * | 1984-02-08 | 1985-08-29 | Hitachi Ltd | イオン交換樹脂の調整法 |
US4548716A (en) * | 1984-07-25 | 1985-10-22 | Lucas Boeve | Method of producing ultrapure, pyrogen-free water |
US4595498A (en) * | 1984-12-27 | 1986-06-17 | Thomson Components-Mostek Corporation | Water-polishing loop |
JPS61181589A (ja) * | 1985-02-06 | 1986-08-14 | Nippon Paint Co Ltd | 脱イオン純水製造装置 |
KR920003170B1 (ko) * | 1986-06-17 | 1992-04-23 | 미쯔이도오아쯔가가꾸 가부시기가이샤 | 초순수(超純水)의 제조, 사용방법 및 이를 위한 장치 |
JPS63108724A (ja) * | 1986-10-27 | 1988-05-13 | Japan Organo Co Ltd | 半導体洗浄用超純水の製造方法 |
JPS6476726A (en) * | 1987-09-17 | 1989-03-22 | Hitachi Ltd | Manufacture of semiconductor |
JPS63305917A (ja) * | 1987-06-05 | 1988-12-13 | Hitachi Ltd | 超純水製造方法及びその製造装置 |
US4784763A (en) * | 1987-07-13 | 1988-11-15 | Labconco Corporation | Water purification machine |
JPS6438186A (en) * | 1987-07-31 | 1989-02-08 | Organo Kk | Controlling method for ultrapure water producing device |
US4808187A (en) * | 1987-10-05 | 1989-02-28 | Iowa State University Research Foundation, Inc. | Tactile stimulus receptor for a hand prosthesis |
US4808287A (en) * | 1987-12-21 | 1989-02-28 | Hark Ernst F | Water purification process |
JP2661946B2 (ja) * | 1988-03-11 | 1997-10-08 | 忠弘 大見 | 超純水供配管装置 |
JPH01307487A (ja) * | 1988-06-02 | 1989-12-12 | Kurita Water Ind Ltd | 超純水供給端末殺菌装置 |
JPH0649187B2 (ja) * | 1988-06-29 | 1994-06-29 | 忠弘 大見 | 超純水供給配管装置 |
US5024766A (en) * | 1988-11-09 | 1991-06-18 | Shahzad Mahmud | Point of use deionized water purification unit |
JP2768732B2 (ja) * | 1989-05-01 | 1998-06-25 | 神鋼パンテック株式会社 | 加熱脱気超純水装置 |
JPH0647105B2 (ja) * | 1989-12-19 | 1994-06-22 | 株式会社荏原総合研究所 | 純水又は超純水の精製方法及び装置 |
US5082557A (en) * | 1990-04-02 | 1992-01-21 | Rainsoft Water Conditioning Co. | Control head for water purifier |
JPH0790219B2 (ja) * | 1990-08-01 | 1995-10-04 | 日本錬水株式会社 | 純水製造装置及び製造方法 |
US5068030A (en) * | 1990-11-09 | 1991-11-26 | Oxford Science Industrial Co., Ltd. | Water filtering sterilizing and heating apparatus |
US5128043A (en) * | 1991-02-13 | 1992-07-07 | Wildermuth Glen W | Method and apparatus for purifying liquids |
-
1992
- 1992-05-28 JP JP4160091A patent/JP2652301B2/ja not_active Expired - Fee Related
-
1993
- 1993-05-27 KR KR1019930009294A patent/KR100254098B1/ko not_active IP Right Cessation
- 1993-05-28 DE DE69321994T patent/DE69321994T2/de not_active Expired - Fee Related
- 1993-05-28 EP EP93108699A patent/EP0572035B1/de not_active Expired - Lifetime
-
1996
- 1996-06-11 US US08/664,312 patent/US5614088A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05329470A (ja) | 1993-12-14 |
DE69321994T2 (de) | 1999-06-24 |
EP0572035B1 (de) | 1998-11-11 |
EP0572035A2 (de) | 1993-12-01 |
EP0572035A3 (en) | 1993-12-29 |
KR100254098B1 (ko) | 2000-04-15 |
JP2652301B2 (ja) | 1997-09-10 |
US5614088A (en) | 1997-03-25 |
KR940005500A (ko) | 1994-03-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |