DE69320856T2 - Verfahren zur elektrochemischen Feinbearbeitung - Google Patents

Verfahren zur elektrochemischen Feinbearbeitung

Info

Publication number
DE69320856T2
DE69320856T2 DE69320856T DE69320856T DE69320856T2 DE 69320856 T2 DE69320856 T2 DE 69320856T2 DE 69320856 T DE69320856 T DE 69320856T DE 69320856 T DE69320856 T DE 69320856T DE 69320856 T2 DE69320856 T2 DE 69320856T2
Authority
DE
Germany
Prior art keywords
article
processed
pattern
counter electrode
electrochemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320856T
Other languages
German (de)
English (en)
Other versions
DE69320856D1 (de
Inventor
Akito C/O Seiko Instruments Inc. Koto-Ku Tokyo Ando
Fumiharu C/O Seiko Instruments Inc Koto-Ku Tokyo Iwasaki
Toshihiko C/O Seiko Instruments Inc. Koto-Ku Tokyo Sakuhara
Masataka C/O Seiko Instruments Inc Koto-Ku Tokyo Shinogi
Masayuki C/O Seiko Instruments Inc Koto-Ku Tokyo Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7473392A external-priority patent/JPH05271998A/ja
Priority claimed from JP4078031A external-priority patent/JP3041740B2/ja
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Application granted granted Critical
Publication of DE69320856D1 publication Critical patent/DE69320856D1/de
Publication of DE69320856T2 publication Critical patent/DE69320856T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H9/00—Machining specially adapted for treating particular metal objects or for obtaining special effects or results on metal objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
DE69320856T 1992-03-30 1993-03-22 Verfahren zur elektrochemischen Feinbearbeitung Expired - Fee Related DE69320856T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7473392A JPH05271998A (ja) 1992-03-30 1992-03-30 微細加工装置
JP4078031A JP3041740B2 (ja) 1992-03-31 1992-03-31 微細加工方法

Publications (2)

Publication Number Publication Date
DE69320856D1 DE69320856D1 (de) 1998-10-15
DE69320856T2 true DE69320856T2 (de) 1999-02-04

Family

ID=26415914

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320856T Expired - Fee Related DE69320856T2 (de) 1992-03-30 1993-03-22 Verfahren zur elektrochemischen Feinbearbeitung

Country Status (3)

Country Link
US (1) US5366613A (enExample)
EP (1) EP0563744B1 (enExample)
DE (1) DE69320856T2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641391A (en) * 1995-05-15 1997-06-24 Hunter; Ian W. Three dimensional microfabrication by localized electrodeposition and etching
JPH09330864A (ja) * 1996-06-10 1997-12-22 Ge Yokogawa Medical Syst Ltd 複合圧電物質製造方法及び複合圧電物質製造用マスク
DE938597T1 (de) 1996-09-06 2000-03-09 Obducat Ab Verfahren für das anisotrope ätzen von strukturen in leitende materialien
US5865978A (en) * 1997-05-09 1999-02-02 Cohen; Adam E. Near-field photolithographic masks and photolithography; nanoscale patterning techniques; apparatus and method therefor
IL120866A0 (en) * 1997-05-20 1997-09-30 Micro Components Systems Ltd Process for producing an aluminum substrate
IL127256A (en) 1998-11-25 2002-09-12 Micro Components Ltd Device for electronic packaging, a process for manufacturing thereof, and a pin jig fixture for use in the process
GB0416600D0 (en) * 2004-07-24 2004-08-25 Univ Newcastle A process for manufacturing micro- and nano-devices
US20080257867A1 (en) * 2004-08-26 2008-10-23 Ajay P Malshe Apparatus and Method for Nano-Scale Electric Discharge Machining
US20060207890A1 (en) 2005-03-15 2006-09-21 Norbert Staud Electrochemical etching
US7569490B2 (en) 2005-03-15 2009-08-04 Wd Media, Inc. Electrochemical etching
CN109292731A (zh) * 2018-09-11 2019-02-01 西南交通大学 基于电化学摩擦诱导的微纳加工方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2492214A (en) * 1945-10-25 1949-12-27 Douglass C Fonda Method of marking tungsten carbide
CH352541A (fr) * 1956-10-24 1961-02-28 Spring Comte Yolande Procédé de gravure électrolytique
US3035990A (en) * 1958-11-05 1962-05-22 Collins Radio Co Chemical blanking of aluminum sheet metal
US3325384A (en) * 1963-11-13 1967-06-13 Buckbee Mears Co Shaped cathode for electrolytic etching
FR2559960B1 (fr) * 1984-02-20 1987-03-06 Solems Sa Procede de formation de circuits electriques en couche mince et produits obtenus
GB2206541A (en) * 1987-07-02 1989-01-11 Psi Star Inc Manufacturing printed circuit boards
US5149404A (en) * 1990-12-14 1992-09-22 At&T Bell Laboratories Fine line scribing of conductive material

Also Published As

Publication number Publication date
EP0563744B1 (en) 1998-09-09
EP0563744A3 (enExample) 1994-01-19
US5366613A (en) 1994-11-22
DE69320856D1 (de) 1998-10-15
EP0563744A2 (en) 1993-10-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: WIESE KONNERTH FISCHER PATENTANWAELTE PARTNERSCHAF

8328 Change in the person/name/address of the agent

Representative=s name: SCHROETER LEHMANN FISCHER & NEUGEBAUER, 81479 MUEN

8339 Ceased/non-payment of the annual fee