DE69305758D1 - Akustische Oberflächenwellenanordnung - Google Patents

Akustische Oberflächenwellenanordnung

Info

Publication number
DE69305758D1
DE69305758D1 DE69305758T DE69305758T DE69305758D1 DE 69305758 D1 DE69305758 D1 DE 69305758D1 DE 69305758 T DE69305758 T DE 69305758T DE 69305758 T DE69305758 T DE 69305758T DE 69305758 D1 DE69305758 D1 DE 69305758D1
Authority
DE
Germany
Prior art keywords
acoustic wave
surface acoustic
wave arrangement
arrangement
wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69305758T
Other languages
English (en)
Other versions
DE69305758T2 (de
Inventor
Hideaki Nakahata
Shinichi Shikata
Akihiro Hachigo
Naoji Fujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69305758D1 publication Critical patent/DE69305758D1/de
Publication of DE69305758T2 publication Critical patent/DE69305758T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02582—Characteristics of substrate, e.g. cutting angles of diamond substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE69305758T 1992-02-21 1993-02-17 Akustische Oberflächenwellenanordnung Expired - Lifetime DE69305758T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03475492A JP3225495B2 (ja) 1992-02-21 1992-02-21 表面弾性波素子及びその製造方法

Publications (2)

Publication Number Publication Date
DE69305758D1 true DE69305758D1 (de) 1996-12-12
DE69305758T2 DE69305758T2 (de) 1997-03-13

Family

ID=12423111

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69305758T Expired - Lifetime DE69305758T2 (de) 1992-02-21 1993-02-17 Akustische Oberflächenwellenanordnung

Country Status (4)

Country Link
US (1) US5294858A (de)
EP (1) EP0556811B1 (de)
JP (1) JP3225495B2 (de)
DE (1) DE69305758T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3205976B2 (ja) * 1992-09-14 2001-09-04 住友電気工業株式会社 表面弾性波素子
TW241397B (de) * 1993-01-14 1995-02-21 Murata Manufacturing Co
JP3163606B2 (ja) * 1993-01-29 2001-05-08 住友電気工業株式会社 表面弾性波素子
FR2714200B1 (fr) * 1993-11-25 1996-12-27 Fujitsu Ltd Dispositif à onde acoustique de surface et son procédé de fabrication.
JP3318920B2 (ja) * 1994-05-10 2002-08-26 住友電気工業株式会社 表面弾性波素子
JP3282645B2 (ja) * 1994-06-16 2002-05-20 住友電気工業株式会社 表面弾性波素子
US5576589A (en) * 1994-10-13 1996-11-19 Kobe Steel Usa, Inc. Diamond surface acoustic wave devices
WO1996024198A1 (fr) * 1995-02-01 1996-08-08 Hitachi, Ltd. Dispositif de communication a etalement de spectre et systeme de communication
US5783896A (en) * 1995-08-08 1998-07-21 Sumitomo Electric Industries, Ltd. Diamond-Zn0 surface acoustic wave device
US5959389A (en) * 1995-08-08 1999-09-28 Sumitomo Electronic Industries, Ltd. Diamond-ZnO surface acoustic wave device
JP3205981B2 (ja) * 1995-09-29 2001-09-04 住友電気工業株式会社 表面弾性波素子
US5880552A (en) * 1997-05-27 1999-03-09 The United States Of America As Represented By The Secretary Of The Navy Diamond or diamond like carbon coated chemical sensors and a method of making same
US6697418B1 (en) * 2000-04-26 2004-02-24 Hitachi, Ltd. Spread spectrum communication device and communication system
EP1225694A4 (de) * 1999-10-15 2005-08-03 Seiko Epson Corp Akusitische oberflächenwellenanordnung
JP2003101360A (ja) * 2001-09-19 2003-04-04 Murata Mfg Co Ltd 弾性表面波素子の電極パターン形成方法
US6797643B2 (en) * 2002-10-23 2004-09-28 Applied Materials Inc. Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power
US6932092B2 (en) * 2002-11-22 2005-08-23 Applied Materials, Inc. Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy
WO2011067893A1 (ja) * 2009-12-04 2011-06-09 パナソニック株式会社 基板およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6420714A (en) * 1987-07-16 1989-01-24 Murata Manufacturing Co Surface acoustic wave device
US4952832A (en) * 1989-10-24 1990-08-28 Sumitomo Electric Industries, Ltd. Surface acoustic wave device
JP2885349B2 (ja) * 1989-12-26 1999-04-19 住友電気工業株式会社 表面弾性波素子

Also Published As

Publication number Publication date
US5294858A (en) 1994-03-15
EP0556811B1 (de) 1996-11-06
EP0556811A1 (de) 1993-08-25
DE69305758T2 (de) 1997-03-13
JP3225495B2 (ja) 2001-11-05
JPH05235683A (ja) 1993-09-10

Similar Documents

Publication Publication Date Title
DE69317026D1 (de) Akustisches Oberflächenwellen Bauelement
DE69217309D1 (de) Akustische Oberflächenwellenanordnung
DE69133231D1 (de) Akustische Oberflächenwellenanordnung
DE69424737D1 (de) Akustisches Oberflächenwellenfilter
DE69403281D1 (de) Akustisches Oberflächenwellenfilter
DE69513904D1 (de) Akustische Oberflächenwellenanordnung
DE69408048D1 (de) Akustisches Oberflächenwellenfilter
DE69412424D1 (de) Akustisches Oberflächenwellenfilter
DE69233400D1 (de) Akustisches Oberflächenwellenfilter
DE69613170D1 (de) Akustische Oberflächenwellenanordnungen
DE69029080D1 (de) Akustische Oberflächenwellenanordnung
DE69516106D1 (de) Akustische Oberflächenwellenanordnung
DE69735746D1 (de) Akustische Oberflächenwellenanordnung
DE69332837D1 (de) Akustische Oberflächenwellenanordnung
DE69614463D1 (de) Akustische Oberflächenwellenanordnung
DE69028003D1 (de) Akustische Oberflächenwellenanordnung
DE69716238D1 (de) Akustische oberflächenwellenanordnung
DE69305758D1 (de) Akustische Oberflächenwellenanordnung
DE69522066D1 (de) Akustische Oberflächenwellenanordnung
DE69321860D1 (de) Akustische Oberflächenwellenanordnung
DE69611771D1 (de) Akustische Oberflächenwellenanordnung
DE69617286D1 (de) Akustische Oberflächenwellenanordnung
DE69521650D1 (de) Oberflächenwellenanordnung
DE69211462D1 (de) Akustische Oberflächenwellenanordnung
DE69723957D1 (de) Akustische oberflächenwellenanordnung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: GROSSE, BOCKHORNI, SCHUMACHER, 81476 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: SEIKO EPSON CORP., TOKIO/TOKYO, JP

8328 Change in the person/name/address of the agent

Representative=s name: GROSSE, SCHUMACHER, KNAUER, VON HIRSCHHAUSEN, 8033

R071 Expiry of right

Ref document number: 556811

Country of ref document: EP