DE69227982D1 - Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen - Google Patents

Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen

Info

Publication number
DE69227982D1
DE69227982D1 DE69227982T DE69227982T DE69227982D1 DE 69227982 D1 DE69227982 D1 DE 69227982D1 DE 69227982 T DE69227982 T DE 69227982T DE 69227982 T DE69227982 T DE 69227982T DE 69227982 D1 DE69227982 D1 DE 69227982D1
Authority
DE
Germany
Prior art keywords
carboxyl groups
dry film
containing carboxyl
film compositions
plasticizers containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69227982T
Other languages
English (en)
Other versions
DE69227982T2 (de
Inventor
Richard Thomas Mayes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Imaging Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MacDermid Imaging Technology Inc filed Critical MacDermid Imaging Technology Inc
Application granted granted Critical
Publication of DE69227982D1 publication Critical patent/DE69227982D1/de
Publication of DE69227982T2 publication Critical patent/DE69227982T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/671Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
DE69227982T 1991-11-01 1992-11-01 Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen Expired - Lifetime DE69227982T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78666491A 1991-11-01 1991-11-01

Publications (2)

Publication Number Publication Date
DE69227982D1 true DE69227982D1 (de) 1999-02-04
DE69227982T2 DE69227982T2 (de) 1999-05-12

Family

ID=25139255

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227982T Expired - Lifetime DE69227982T2 (de) 1991-11-01 1992-11-01 Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen

Country Status (5)

Country Link
US (1) US5415972A (de)
EP (1) EP0545081B1 (de)
JP (1) JPH0687939A (de)
CA (1) CA2081931A1 (de)
DE (1) DE69227982T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2822303B2 (ja) * 1993-10-15 1998-11-11 関西ペイント株式会社 水性塗料用樹脂組成物
EP0697448B1 (de) * 1994-08-12 1999-01-13 Kansai Paint Co., Ltd. Zweikomponentenzusammensetzung für Hydrofarbe
TW513614B (en) * 1997-12-18 2002-12-11 Nippon Synthetic Chem Ind Photosensitive resin composition
US5952154A (en) * 1998-05-29 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility
USD418143S (en) * 1998-10-30 1999-12-28 Thaw Jeffrey B Satellite dish cover
JP2000137325A (ja) * 1998-11-04 2000-05-16 Kansai Paint Co Ltd 有機溶剤型感光性レジスト組成物及びレジストパターン形成方法
US6217667B1 (en) * 1999-09-24 2001-04-17 Semitool, Inc. Method for cleaning copper surfaces
CN1306338C (zh) * 2000-09-11 2007-03-21 昭和电工株式会社 感光组合物、固化制品以及利用它的印刷电路板
JP2003096388A (ja) 2001-09-26 2003-04-03 Kansai Paint Co Ltd 水性塗料用樹脂組成物
JP2003212954A (ja) 2002-01-21 2003-07-30 Showa Denko Kk リン含有ウレタン(メタ)アクリレート化合物および感光性組成物
JP2004151691A (ja) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc 改良フォトレジスト
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
JP2007101863A (ja) * 2005-10-04 2007-04-19 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2007121742A (ja) * 2005-10-28 2007-05-17 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及び積層体
KR101571045B1 (ko) 2008-12-26 2015-11-24 삼성디스플레이 주식회사 X선 검출기용 박막 트랜지스터 어레이 기판 및 그 제조 방법
US8877408B2 (en) 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
JPS59204837A (ja) * 1983-05-09 1984-11-20 Asahi Chem Ind Co Ltd 光重合性積層体及びそれを用いたレジスト像形成方法
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
US4753860A (en) * 1985-06-20 1988-06-28 M&T Chemicals Inc. UV curable compositions for making improved solder mask coatings
US4837126A (en) * 1985-06-07 1989-06-06 W. R. Grace & Co. Polymer composition for photoresist application
US4849321A (en) * 1985-06-20 1989-07-18 M&T Chemicals Inc. UV curable compositions for making improved solder mask coatings
US4686171A (en) * 1986-02-14 1987-08-11 Hercules Incorporated Photopolymerizable films containing plasticizer silica combinations
US5102774A (en) * 1986-12-08 1992-04-07 Armstrong World Industries, Inc. Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions
GB8702732D0 (en) * 1987-02-06 1987-03-11 Hercules Inc Photopolymerisable composition
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions

Also Published As

Publication number Publication date
CA2081931A1 (en) 1993-05-02
DE69227982T2 (de) 1999-05-12
EP0545081B1 (de) 1998-12-23
US5415972A (en) 1995-05-16
JPH0687939A (ja) 1994-03-29
EP0545081A1 (de) 1993-06-09

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