DE69227442D1 - Magnetische elektronenlinse und Elektronenmikroskop unter Verwendung derselbe. - Google Patents

Magnetische elektronenlinse und Elektronenmikroskop unter Verwendung derselbe.

Info

Publication number
DE69227442D1
DE69227442D1 DE69227442T DE69227442T DE69227442D1 DE 69227442 D1 DE69227442 D1 DE 69227442D1 DE 69227442 T DE69227442 T DE 69227442T DE 69227442 T DE69227442 T DE 69227442T DE 69227442 D1 DE69227442 D1 DE 69227442D1
Authority
DE
Germany
Prior art keywords
electron
same
magnetic
lens
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69227442T
Other languages
English (en)
Other versions
DE69227442T2 (de
Inventor
Shigeyuki Hosoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69227442D1 publication Critical patent/DE69227442D1/de
Application granted granted Critical
Publication of DE69227442T2 publication Critical patent/DE69227442T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H01J37/1416—Electromagnetic lenses with superconducting coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69227442T 1991-08-30 1992-08-26 Magnetische elektronenlinse und Elektronenmikroskop unter Verwendung derselbe. Expired - Lifetime DE69227442T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22009391 1991-08-30
PCT/JP1992/001076 WO1993005529A1 (en) 1991-08-30 1992-08-26 Magnetic electron lens and electron microscope using same

Publications (2)

Publication Number Publication Date
DE69227442D1 true DE69227442D1 (de) 1998-12-03
DE69227442T2 DE69227442T2 (de) 1999-07-01

Family

ID=16745818

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227442T Expired - Lifetime DE69227442T2 (de) 1991-08-30 1992-08-26 Magnetische elektronenlinse und Elektronenmikroskop unter Verwendung derselbe.

Country Status (4)

Country Link
US (1) US5393983A (de)
EP (1) EP0555492B1 (de)
DE (1) DE69227442T2 (de)
WO (1) WO1993005529A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6608308B1 (en) * 1999-05-26 2003-08-19 Nikon Corporation Electrostatic lens systems for secondary-electron mapping-projection apparatus, and mapping-projection apparatus and methods comprising same
US7947964B2 (en) * 2006-11-21 2011-05-24 Hitachi High-Technologies Corporation Charged particle beam orbit corrector and charged particle beam apparatus
JP5677081B2 (ja) * 2010-12-28 2015-02-25 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900808A (en) * 1966-09-21 1975-08-19 Helmut Zerbst Magnetic lens assemblies for corpuscular ray devices which operate under vacuum
GB1234509A (de) * 1968-05-31 1971-06-03
DE2059781C3 (de) * 1970-12-04 1979-08-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Linsenanordnung
DE2307822C3 (de) * 1973-02-16 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Supraleitendes Linsensystem für Korpuskularstrahlung

Also Published As

Publication number Publication date
EP0555492B1 (de) 1998-10-28
DE69227442T2 (de) 1999-07-01
WO1993005529A1 (en) 1993-03-18
EP0555492A4 (de) 1994-03-02
US5393983A (en) 1995-02-28
EP0555492A1 (de) 1993-08-18

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