DE69224956T2 - Film aus "cluster"-artigem Kohlenstoff mit einer elektrischen Leitfähigkeit und Verfahren zu seiner Herstellung - Google Patents

Film aus "cluster"-artigem Kohlenstoff mit einer elektrischen Leitfähigkeit und Verfahren zu seiner Herstellung

Info

Publication number
DE69224956T2
DE69224956T2 DE69224956T DE69224956T DE69224956T2 DE 69224956 T2 DE69224956 T2 DE 69224956T2 DE 69224956 T DE69224956 T DE 69224956T DE 69224956 T DE69224956 T DE 69224956T DE 69224956 T2 DE69224956 T2 DE 69224956T2
Authority
DE
Germany
Prior art keywords
cluster
production
electrical conductivity
film made
type carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69224956T
Other languages
English (en)
Other versions
DE69224956D1 (de
Inventor
Yoshinobu Ueba
Nobuyuki Okuda
Kengo Ohkura
Hirokazu Kugai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69224956D1 publication Critical patent/DE69224956D1/de
Application granted granted Critical
Publication of DE69224956T2 publication Critical patent/DE69224956T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/002—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/20—Doping by irradiation with electromagnetic waves or by particle radiation
    • C30B31/22—Doping by irradiation with electromagnetic waves or by particle radiation by ion-implantation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S423/00—Chemistry of inorganic compounds
    • Y10S423/39—Fullerene, e.g. c60, c70 derivative and related process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S423/00—Chemistry of inorganic compounds
    • Y10S423/40—Fullerene composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
DE69224956T 1991-10-25 1992-10-20 Film aus "cluster"-artigem Kohlenstoff mit einer elektrischen Leitfähigkeit und Verfahren zu seiner Herstellung Expired - Fee Related DE69224956T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27979491 1991-10-25

Publications (2)

Publication Number Publication Date
DE69224956D1 DE69224956D1 (de) 1998-05-07
DE69224956T2 true DE69224956T2 (de) 1998-12-10

Family

ID=17616004

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69224956T Expired - Fee Related DE69224956T2 (de) 1991-10-25 1992-10-20 Film aus "cluster"-artigem Kohlenstoff mit einer elektrischen Leitfähigkeit und Verfahren zu seiner Herstellung

Country Status (3)

Country Link
US (1) US5380595A (de)
EP (1) EP0538797B1 (de)
DE (1) DE69224956T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5698497A (en) * 1991-03-18 1997-12-16 Lucent Technologies Inc. Superconductivity in carbonaceous compounds and devices using such compounds
EP0570720A1 (de) * 1992-05-20 1993-11-24 Sumitomo Electric Industries, Ltd. Leitendes oder superleitendes stabilisiertes Kohlenstoff-Cluster-Material sowie Herstellung und Verwendung
JP3336682B2 (ja) * 1992-07-02 2002-10-21 住友電気工業株式会社 硬質炭素膜
US5558903A (en) * 1993-06-10 1996-09-24 The Ohio State University Method for coating fullerene materials for tribology
DE4344764A1 (de) * 1993-12-28 1995-06-29 Abb Research Ltd Hochspannungsanlage
US5393572A (en) * 1994-07-11 1995-02-28 Southwest Research Institute Ion beam assisted method of producing a diamond like carbon coating
WO1997004147A1 (en) * 1995-07-24 1997-02-06 International Business Machines Corp. Epitaxially layered structure
AU2690997A (en) * 1996-03-14 1997-10-01 Forschungsverbund Berlin E.V. Process for preparing endohedral fullerenes or fullerene derivatives
US5876790A (en) * 1996-12-31 1999-03-02 Ormat Industries Ltd. Vacuum evaporation method for producing textured C60 films
US6303016B1 (en) 1998-04-14 2001-10-16 Tda Research, Inc. Isolation of small-bandgap fullerenes and endohedral metallofullerenes
US6472705B1 (en) 1998-11-18 2002-10-29 International Business Machines Corporation Molecular memory & logic
US6277438B1 (en) 1999-05-03 2001-08-21 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Protective fullerene (C60) packaging system for microelectromechanical systems applications
US6790242B2 (en) 2000-12-29 2004-09-14 Lam Research Corporation Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
JP5406451B2 (ja) * 2005-09-05 2014-02-05 金子 博之 フラーレン類又はナノチューブ、及び、フラーレン類又はナノチューブの製造方法
US9685600B2 (en) 2015-02-18 2017-06-20 Savannah River Nuclear Solutions, Llc Enhanced superconductivity of fullerenes

Also Published As

Publication number Publication date
EP0538797A1 (de) 1993-04-28
EP0538797B1 (de) 1998-04-01
DE69224956D1 (de) 1998-05-07
US5380595A (en) 1995-01-10

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Free format text: UEBA, YOSHINOBU, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP OKUDA, NOBUYUKI,C/O OSAKA WORKSOF SUMITOM, KONOHANA-KU, OSAKA, JP OHKURA, KENGO, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP KUGAI, HIROKAZU, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP

Free format text: UEBA, YOSHINOBU, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP OKUDA, NOBUYUKI,C/O OSAKA WORKS OF SUMITOM, KONOHANA-KU, OSAKA, JP OHKURA, KENGO, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP KUGAI, HIROKAZU, C/O OSAKA WORKS OF SUMITOMO, KONOHANA-KU, OSAKA, JP

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee