DE69223826D1 - Gerät zur Entwicklung von Photoresists - Google Patents

Gerät zur Entwicklung von Photoresists

Info

Publication number
DE69223826D1
DE69223826D1 DE69223826T DE69223826T DE69223826D1 DE 69223826 D1 DE69223826 D1 DE 69223826D1 DE 69223826 T DE69223826 T DE 69223826T DE 69223826 T DE69223826 T DE 69223826T DE 69223826 D1 DE69223826 D1 DE 69223826D1
Authority
DE
Germany
Prior art keywords
developing photoresists
photoresists
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69223826T
Other languages
English (en)
Other versions
DE69223826T2 (de
Inventor
Toshiyuki Kashiwagi
Kohtaroh Kurokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE69223826D1 publication Critical patent/DE69223826D1/de
Publication of DE69223826T2 publication Critical patent/DE69223826T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Optical Recording Or Reproduction (AREA)
DE69223826T 1991-03-07 1992-03-05 Gerät zur Entwicklung von Photoresists Expired - Fee Related DE69223826T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3041810A JP3070113B2 (ja) 1991-03-07 1991-03-07 フォトレジストの現像処理装置

Publications (2)

Publication Number Publication Date
DE69223826D1 true DE69223826D1 (de) 1998-02-12
DE69223826T2 DE69223826T2 (de) 1998-08-06

Family

ID=12618671

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69223826T Expired - Fee Related DE69223826T2 (de) 1991-03-07 1992-03-05 Gerät zur Entwicklung von Photoresists

Country Status (4)

Country Link
US (1) US5218400A (de)
EP (1) EP0502533B1 (de)
JP (1) JP3070113B2 (de)
DE (1) DE69223826T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5821035A (en) * 1996-03-06 1998-10-13 Sony Corporation Resist developing apparatus and resist developing method
US6151290A (en) * 1998-02-05 2000-11-21 Sony Corporation Inexpensive safe light beam recorder
US6266125B1 (en) * 1998-05-25 2001-07-24 Tokyo Electron Limited Resist processing method and apparatus
JP2010123230A (ja) * 2008-11-21 2010-06-03 Sony Disc & Digital Solutions Inc 現像方法、及び現像装置
CN102262351B (zh) * 2010-05-25 2013-01-23 无锡华润上华半导体有限公司 光掩膜层及其形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5857843U (ja) * 1981-10-16 1983-04-19 パイオニア株式会社 フオトレジスト湿式現像装置
US4647172A (en) * 1985-05-17 1987-03-03 Gca Corporation Resist development method
JPH0721643B2 (ja) * 1986-03-13 1995-03-08 ウシオ電機株式会社 レジスト処理方法
KR960016175B1 (en) * 1987-08-28 1996-12-04 Tokyo Electron Ltd Exposing method and apparatus thereof
US4899195A (en) * 1988-01-29 1990-02-06 Ushio Denki Method of exposing a peripheral part of wafer
JPH02137852A (ja) * 1988-11-18 1990-05-28 Dainippon Screen Mfg Co Ltd フォトレジストの現像終点検出方法
US5028955A (en) * 1989-02-16 1991-07-02 Tokyo Electron Limited Exposure apparatus
JPH02254456A (ja) * 1989-03-29 1990-10-15 Orc Mfg Co Ltd フォトレジスト露光方法およびその装置

Also Published As

Publication number Publication date
EP0502533A1 (de) 1992-09-09
JPH04278235A (ja) 1992-10-02
US5218400A (en) 1993-06-08
EP0502533B1 (de) 1998-01-07
DE69223826T2 (de) 1998-08-06
JP3070113B2 (ja) 2000-07-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee