DE69211247T2 - Ellipsometer - Google Patents

Ellipsometer

Info

Publication number
DE69211247T2
DE69211247T2 DE69211247T DE69211247T DE69211247T2 DE 69211247 T2 DE69211247 T2 DE 69211247T2 DE 69211247 T DE69211247 T DE 69211247T DE 69211247 T DE69211247 T DE 69211247T DE 69211247 T2 DE69211247 T2 DE 69211247T2
Authority
DE
Germany
Prior art keywords
ellipsometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69211247T
Other languages
German (de)
English (en)
Other versions
DE69211247D1 (en
Inventor
Akira Kazama
Takahiko Oshige
Yoshiro Yamada
Takeo Yamada
Takeshi Yamazaki
Takamitsu Takayama
Shuichiro Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Publication of DE69211247D1 publication Critical patent/DE69211247D1/de
Application granted granted Critical
Publication of DE69211247T2 publication Critical patent/DE69211247T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69211247T 1991-01-30 1992-01-27 Ellipsometer Expired - Fee Related DE69211247T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2929691 1991-01-30
JP10040591 1991-04-05
JP29686891 1991-11-13
PCT/JP1992/000067 WO1992014119A1 (en) 1991-01-30 1992-01-27 Ellipsometer and method of controlling coating thickness by use of ellipsometer

Publications (2)

Publication Number Publication Date
DE69211247D1 DE69211247D1 (en) 1996-07-11
DE69211247T2 true DE69211247T2 (de) 1997-02-13

Family

ID=27286500

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69211247T Expired - Fee Related DE69211247T2 (de) 1991-01-30 1992-01-27 Ellipsometer

Country Status (5)

Country Link
US (1) US5438415A (ko)
EP (1) EP0527230B1 (ko)
KR (1) KR960010675B1 (ko)
DE (1) DE69211247T2 (ko)
WO (1) WO1992014119A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013200213B4 (de) 2012-01-25 2023-02-09 International Business Machines Corporation Abriebtestverfahren und -vorrichtungen zum testen von medienabrieb

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ES2076083B1 (es) * 1993-06-04 1996-06-01 Fuesca Sl Aparato y metodo de medida y control de la densidad de reticulacion de los tratamientos en caliente y frio del vidrio aligerado.
GB9326247D0 (en) * 1993-12-23 1994-02-23 British Petroleum Co Plc Method of determining thickness of coating
US5835220A (en) * 1995-10-27 1998-11-10 Nkk Corporation Method and apparatus for detecting surface flaws
US6134011A (en) 1997-09-22 2000-10-17 Hdi Instrumentation Optical measurement system using polarized light
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
DE19823944A1 (de) 1998-05-28 1999-12-02 Siemens Ag Leistungsdioden-Struktur
JPH11352054A (ja) * 1998-06-08 1999-12-24 Mitsubishi Heavy Ind Ltd エリプソメトリ装置
JP3644863B2 (ja) * 2000-01-24 2005-05-11 沖電気工業株式会社 膜厚分布測定方法
US7746471B1 (en) * 2000-03-21 2010-06-29 J.A Woollam Co., Inc. Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems
US6639673B1 (en) * 2000-04-14 2003-10-28 Commonwealth Scientific And Industrial Research Organisation Surface coating measurement instrument and apparatus for determination of coating thickness
US6721052B2 (en) * 2000-12-20 2004-04-13 Kla-Technologies Corporation Systems for measuring periodic structures
US6731386B2 (en) 2001-01-04 2004-05-04 Agere Systems Inc. Measurement technique for ultra-thin oxides
US6597463B1 (en) * 2001-06-13 2003-07-22 Advanced Micro Devices, Inc. System to determine suitability of sion arc surface for DUV resist patterning
US7006222B2 (en) * 2003-01-08 2006-02-28 Kla-Tencor Technologies Corporation Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI)
US7206066B2 (en) * 2004-03-19 2007-04-17 Kla-Tencor Technologies Corporation Reflectance surface analyzer
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
JP2007040930A (ja) * 2005-08-05 2007-02-15 Ebara Corp 膜厚測定方法及び基板処理装置
US20090002686A1 (en) * 2007-06-29 2009-01-01 The Material Works, Ltd. Sheet Metal Oxide Detector
KR100904685B1 (ko) * 2008-03-03 2009-06-24 이화여자대학교 산학협력단 마이크로미러를 이용한 다파장 측정 광학 모듈
US20140158578A1 (en) * 2012-12-06 2014-06-12 Jason Varan Folding apparatus for the containment and transport of bottles and method of use
CA3020967A1 (en) * 2013-03-15 2014-09-18 Sensory Analytics Method and system for real-time in-process measurement of coating thickness
US9381470B2 (en) * 2013-10-25 2016-07-05 Shanghai Honghao Enterprise Development CO., LTD Coating equipment for a composite membrane without a diffusion pump and its thickness gauge for both thick and thin coatings
US10840102B2 (en) * 2013-11-27 2020-11-17 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated system, integrated system operation method and film treatment method
US10709327B2 (en) * 2017-12-19 2020-07-14 Aizhong Zhang Thin film analysis apparatus and method for a curved surface
JP7074202B2 (ja) * 2019-03-08 2022-05-24 Ｊｆｅスチール株式会社 化成処理膜検査方法、化成処理膜検査装置、表面処理鋼板の製造方法、表面処理鋼板の品質管理方法及び表面処理鋼板の製造設備

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Publication number Priority date Publication date Assignee Title
US3696230A (en) * 1970-01-19 1972-10-03 Hughes Aircraft Co Laser lens cooling and cleaning system
US3626141A (en) * 1970-04-30 1971-12-07 Quantronix Corp Laser scribing apparatus
EP0062083B1 (de) * 1981-04-04 1985-11-27 Ibm Deutschland Gmbh Einrichtung zur Bestimmung des Polarisationszustandes eines Lichtwellenfeldes und Verwendungen der Einrichtung zu interferometrischen und holographischen Messungen
IT1176253B (it) * 1984-06-04 1987-08-18 Safilo Spa Montatura per occhiali con appoggio nasale deformabile
JPH0672807B2 (ja) * 1984-09-29 1994-09-14 株式会社島津製作所 旋光度測定装置
JPS61209338A (ja) * 1985-03-13 1986-09-17 Chino Works Ltd 光学的測定装置
US4652133A (en) * 1985-07-17 1987-03-24 Westinghouse Electric Corp. Vision system with environmental control
JPH07111327B2 (ja) * 1986-06-13 1995-11-29 日本鋼管株式会社 偏光解析装置
US4850711A (en) * 1986-06-13 1989-07-25 Nippon Kokan Kabushiki Kaisha Film thickness-measuring apparatus using linearly polarized light
JPS6336105A (ja) * 1986-07-30 1988-02-16 Nippon Kokan Kk <Nkk> 膜厚測定装置
JP2529562B2 (ja) * 1986-12-29 1996-08-28 日本分光工業株式会社 エリプソメ−タ
JPS6428509A (en) * 1987-07-23 1989-01-31 Nippon Kokan Kk Apparatus for measuring thickness of film
SU1518728A1 (ru) * 1987-11-30 1989-10-30 Научно-Исследовательский Институт Ядерных Проблем При Белорусском Государственном Университете Им.В.И.Ленина Способ определени параметров элипса пол ризации
EP0339845B1 (en) * 1988-04-29 1993-01-07 Hughes Aircraft Company System for automated real-time control of film deposition
JPH02116705A (ja) * 1988-10-27 1990-05-01 Kawasaki Steel Corp 塗装板材の塗布膜厚測定装置
US5073025A (en) * 1989-11-08 1991-12-17 Rockwell International Corporation Independent polarization state measurements sensor
US5102222A (en) * 1990-02-08 1992-04-07 Harmonic Lightwaves, Inc. Light wave polarization determination using a hybrid system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013200213B4 (de) 2012-01-25 2023-02-09 International Business Machines Corporation Abriebtestverfahren und -vorrichtungen zum testen von medienabrieb

Also Published As

Publication number Publication date
DE69211247D1 (en) 1996-07-11
EP0527230A4 (en) 1993-06-09
KR960010675B1 (ko) 1996-08-07
EP0527230B1 (en) 1996-06-05
WO1992014119A1 (en) 1992-08-20
KR930700817A (ko) 1993-03-16
EP0527230A1 (en) 1993-02-17
US5438415A (en) 1995-08-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee