DE69211247T2 - Ellipsometer - Google Patents
EllipsometerInfo
- Publication number
- DE69211247T2 DE69211247T2 DE69211247T DE69211247T DE69211247T2 DE 69211247 T2 DE69211247 T2 DE 69211247T2 DE 69211247 T DE69211247 T DE 69211247T DE 69211247 T DE69211247 T DE 69211247T DE 69211247 T2 DE69211247 T2 DE 69211247T2
- Authority
- DE
- Germany
- Prior art keywords
- ellipsometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2929691 | 1991-01-30 | ||
JP10040591 | 1991-04-05 | ||
JP29686891 | 1991-11-13 | ||
PCT/JP1992/000067 WO1992014119A1 (en) | 1991-01-30 | 1992-01-27 | Ellipsometer and method of controlling coating thickness by use of ellipsometer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69211247D1 DE69211247D1 (en) | 1996-07-11 |
DE69211247T2 true DE69211247T2 (de) | 1997-02-13 |
Family
ID=27286500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69211247T Expired - Fee Related DE69211247T2 (de) | 1991-01-30 | 1992-01-27 | Ellipsometer |
Country Status (5)
Country | Link |
---|---|
US (1) | US5438415A (de) |
EP (1) | EP0527230B1 (de) |
KR (1) | KR960010675B1 (de) |
DE (1) | DE69211247T2 (de) |
WO (1) | WO1992014119A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013200213B4 (de) | 2012-01-25 | 2023-02-09 | International Business Machines Corporation | Abriebtestverfahren und -vorrichtungen zum testen von medienabrieb |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2076083B1 (es) * | 1993-06-04 | 1996-06-01 | Fuesca Sl | Aparato y metodo de medida y control de la densidad de reticulacion de los tratamientos en caliente y frio del vidrio aligerado. |
GB9326247D0 (en) * | 1993-12-23 | 1994-02-23 | British Petroleum Co Plc | Method of determining thickness of coating |
US5835220A (en) * | 1995-10-27 | 1998-11-10 | Nkk Corporation | Method and apparatus for detecting surface flaws |
US6134011A (en) | 1997-09-22 | 2000-10-17 | Hdi Instrumentation | Optical measurement system using polarized light |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
DE19823944A1 (de) | 1998-05-28 | 1999-12-02 | Siemens Ag | Leistungsdioden-Struktur |
JPH11352054A (ja) * | 1998-06-08 | 1999-12-24 | Mitsubishi Heavy Ind Ltd | エリプソメトリ装置 |
JP3644863B2 (ja) * | 2000-01-24 | 2005-05-11 | 沖電気工業株式会社 | 膜厚分布測定方法 |
US7746471B1 (en) * | 2000-03-21 | 2010-06-29 | J.A Woollam Co., Inc. | Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems |
US6639673B1 (en) * | 2000-04-14 | 2003-10-28 | Commonwealth Scientific And Industrial Research Organisation | Surface coating measurement instrument and apparatus for determination of coating thickness |
US6721052B2 (en) * | 2000-12-20 | 2004-04-13 | Kla-Technologies Corporation | Systems for measuring periodic structures |
US6731386B2 (en) | 2001-01-04 | 2004-05-04 | Agere Systems Inc. | Measurement technique for ultra-thin oxides |
US6597463B1 (en) * | 2001-06-13 | 2003-07-22 | Advanced Micro Devices, Inc. | System to determine suitability of sion arc surface for DUV resist patterning |
US7006222B2 (en) * | 2003-01-08 | 2006-02-28 | Kla-Tencor Technologies Corporation | Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI) |
US7206066B2 (en) * | 2004-03-19 | 2007-04-17 | Kla-Tencor Technologies Corporation | Reflectance surface analyzer |
US7515253B2 (en) * | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
JP2007040930A (ja) * | 2005-08-05 | 2007-02-15 | Ebara Corp | 膜厚測定方法及び基板処理装置 |
US20090002686A1 (en) * | 2007-06-29 | 2009-01-01 | The Material Works, Ltd. | Sheet Metal Oxide Detector |
KR100904685B1 (ko) * | 2008-03-03 | 2009-06-24 | 이화여자대학교 산학협력단 | 마이크로미러를 이용한 다파장 측정 광학 모듈 |
US20140158578A1 (en) * | 2012-12-06 | 2014-06-12 | Jason Varan | Folding apparatus for the containment and transport of bottles and method of use |
CA3020967A1 (en) * | 2013-03-15 | 2014-09-18 | Sensory Analytics | Method and system for real-time in-process measurement of coating thickness |
US9381470B2 (en) * | 2013-10-25 | 2016-07-05 | Shanghai Honghao Enterprise Development CO., LTD | Coating equipment for a composite membrane without a diffusion pump and its thickness gauge for both thick and thin coatings |
US10840102B2 (en) * | 2013-11-27 | 2020-11-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated system, integrated system operation method and film treatment method |
US10709327B2 (en) * | 2017-12-19 | 2020-07-14 | Aizhong Zhang | Thin film analysis apparatus and method for a curved surface |
JP7074202B2 (ja) * | 2019-03-08 | 2022-05-24 | Jfeスチール株式会社 | 化成処理膜検査方法、化成処理膜検査装置、表面処理鋼板の製造方法、表面処理鋼板の品質管理方法及び表面処理鋼板の製造設備 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3696230A (en) * | 1970-01-19 | 1972-10-03 | Hughes Aircraft Co | Laser lens cooling and cleaning system |
US3626141A (en) * | 1970-04-30 | 1971-12-07 | Quantronix Corp | Laser scribing apparatus |
EP0062083B1 (de) * | 1981-04-04 | 1985-11-27 | Ibm Deutschland Gmbh | Einrichtung zur Bestimmung des Polarisationszustandes eines Lichtwellenfeldes und Verwendungen der Einrichtung zu interferometrischen und holographischen Messungen |
IT1176253B (it) * | 1984-06-04 | 1987-08-18 | Safilo Spa | Montatura per occhiali con appoggio nasale deformabile |
JPH0672807B2 (ja) * | 1984-09-29 | 1994-09-14 | 株式会社島津製作所 | 旋光度測定装置 |
JPS61209338A (ja) * | 1985-03-13 | 1986-09-17 | Chino Works Ltd | 光学的測定装置 |
US4652133A (en) * | 1985-07-17 | 1987-03-24 | Westinghouse Electric Corp. | Vision system with environmental control |
JPH07111327B2 (ja) * | 1986-06-13 | 1995-11-29 | 日本鋼管株式会社 | 偏光解析装置 |
US4850711A (en) * | 1986-06-13 | 1989-07-25 | Nippon Kokan Kabushiki Kaisha | Film thickness-measuring apparatus using linearly polarized light |
JPS6336105A (ja) * | 1986-07-30 | 1988-02-16 | Nippon Kokan Kk <Nkk> | 膜厚測定装置 |
JP2529562B2 (ja) * | 1986-12-29 | 1996-08-28 | 日本分光工業株式会社 | エリプソメ−タ |
JPS6428509A (en) * | 1987-07-23 | 1989-01-31 | Nippon Kokan Kk | Apparatus for measuring thickness of film |
SU1518728A1 (ru) * | 1987-11-30 | 1989-10-30 | Научно-Исследовательский Институт Ядерных Проблем При Белорусском Государственном Университете Им.В.И.Ленина | Способ определени параметров элипса пол ризации |
EP0339845B1 (de) * | 1988-04-29 | 1993-01-07 | Hughes Aircraft Company | System zur automatischen Kontrolle der Deposition einer Schicht in Real-Zeit |
JPH02116705A (ja) * | 1988-10-27 | 1990-05-01 | Kawasaki Steel Corp | 塗装板材の塗布膜厚測定装置 |
US5073025A (en) * | 1989-11-08 | 1991-12-17 | Rockwell International Corporation | Independent polarization state measurements sensor |
US5102222A (en) * | 1990-02-08 | 1992-04-07 | Harmonic Lightwaves, Inc. | Light wave polarization determination using a hybrid system |
-
1992
- 1992-01-27 DE DE69211247T patent/DE69211247T2/de not_active Expired - Fee Related
- 1992-01-27 US US07/927,410 patent/US5438415A/en not_active Expired - Lifetime
- 1992-01-27 EP EP92903726A patent/EP0527230B1/de not_active Expired - Lifetime
- 1992-01-27 WO PCT/JP1992/000067 patent/WO1992014119A1/ja active IP Right Grant
- 1992-01-27 KR KR1019920702388A patent/KR960010675B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013200213B4 (de) | 2012-01-25 | 2023-02-09 | International Business Machines Corporation | Abriebtestverfahren und -vorrichtungen zum testen von medienabrieb |
Also Published As
Publication number | Publication date |
---|---|
DE69211247D1 (en) | 1996-07-11 |
EP0527230A4 (en) | 1993-06-09 |
KR960010675B1 (ko) | 1996-08-07 |
EP0527230B1 (de) | 1996-06-05 |
WO1992014119A1 (en) | 1992-08-20 |
KR930700817A (ko) | 1993-03-16 |
EP0527230A1 (de) | 1993-02-17 |
US5438415A (en) | 1995-08-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |