DE69209270D1 - Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials - Google Patents

Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials

Info

Publication number
DE69209270D1
DE69209270D1 DE69209270T DE69209270T DE69209270D1 DE 69209270 D1 DE69209270 D1 DE 69209270D1 DE 69209270 T DE69209270 T DE 69209270T DE 69209270 T DE69209270 T DE 69209270T DE 69209270 D1 DE69209270 D1 DE 69209270D1
Authority
DE
Germany
Prior art keywords
radiation
process control
emitting material
emitting
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69209270T
Other languages
English (en)
Other versions
DE69209270T2 (de
Inventor
Tomohiro Marui
Kazuo Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3330958A external-priority patent/JPH05165534A/ja
Priority claimed from JP3352797A external-priority patent/JPH05164619A/ja
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Publication of DE69209270D1 publication Critical patent/DE69209270D1/de
Application granted granted Critical
Publication of DE69209270T2 publication Critical patent/DE69209270T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • G01N21/3518—Devices using gas filter correlation techniques; Devices using gas pressure modulation techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0658—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of emissivity or reradiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Radiation Pyrometers (AREA)
  • Control Of Metal Rolling (AREA)
DE69209270T 1991-12-13 1992-12-11 Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials Expired - Fee Related DE69209270T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3330958A JPH05165534A (ja) 1991-12-13 1991-12-13 プロセス制御方法及びその装置
JP3352797A JPH05164619A (ja) 1991-12-16 1991-12-16 輻射を用いた連続材料プロセス制御装置

Publications (2)

Publication Number Publication Date
DE69209270D1 true DE69209270D1 (de) 1996-04-25
DE69209270T2 DE69209270T2 (de) 1996-08-08

Family

ID=26573683

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69209270T Expired - Fee Related DE69209270T2 (de) 1991-12-13 1992-12-11 Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials

Country Status (5)

Country Link
US (1) US5481112A (de)
EP (1) EP0555544B1 (de)
KR (1) KR0137451B1 (de)
CA (1) CA2085143C (de)
DE (1) DE69209270T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5549756A (en) * 1994-02-02 1996-08-27 Applied Materials, Inc. Optical pyrometer for a thin film deposition system
US5868496A (en) * 1994-06-28 1999-02-09 Massachusetts Institute Of Technology Non-contact surface temperature, emissivity, and area estimation
US6352192B1 (en) * 2000-02-29 2002-03-05 Motorola, Inc. System and method to control solder reflow furnace with wafer surface characterization
DE102004061101B3 (de) * 2004-12-18 2006-01-19 Miele & Cie. Kg Verfahren zur Bestimmung des Emissionskoeffizienten ε2 einer zu beheizenden Fläche A2
DE102007013739B3 (de) * 2007-03-22 2008-09-04 Voestalpine Stahl Gmbh Verfahren zum flexiblen Walzen von beschichteten Stahlbändern
CN103069041B (zh) * 2010-08-23 2014-07-23 新日铁住金株式会社 镀锌钢板的热冲压方法
JP6255713B2 (ja) * 2013-05-14 2018-01-10 株式会社ジェイテクト 光学非破壊検査方法及び光学非破壊検査装置
FR3022621B1 (fr) * 2014-06-19 2022-04-29 Poncot Jean Claude Dispositif de mesure d'un ensemble de donnees spatiales d'epaisseur d(x,y) d'une couche mince et procede de mesure utilisant ledit dispositif
JP6959211B2 (ja) * 2018-11-09 2021-11-02 株式会社神戸製鋼所 酸化膜厚測定装置および該方法
JP6959212B2 (ja) * 2018-11-09 2021-11-02 株式会社神戸製鋼所 酸化膜厚測定装置および該方法
TWI822903B (zh) * 2018-12-12 2023-11-21 日商斯庫林集團股份有限公司 熱處理方法及熱處理裝置
CN114184569B (zh) * 2021-12-03 2023-08-29 渤海大学 一种发射率测量装置的校准方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3620814A (en) * 1968-08-09 1971-11-16 Bell Telephone Labor Inc Continuous measurement of the thickness of hot thin films
FR2508637A1 (fr) * 1981-06-25 1982-12-31 Paris X Nanterre Universite Perfectionnements apportes aux procedes de mesures a distance de l'emissivite et/ou de la temperature vraie d'un corps a surface relativment lisse
US4659234A (en) * 1984-06-18 1987-04-21 Aluminum Company Of America Emissivity error correcting method for radiation thermometer
JPS617445A (ja) * 1984-06-21 1986-01-14 Toshiba Corp 銅酸化被膜の酸化度判別装置
US4881823A (en) * 1988-03-29 1989-11-21 Purdue Research Foundation Radiation thermometry
US5249142A (en) * 1989-03-31 1993-09-28 Tokyo Electron Kyushu Limited Indirect temperature-measurement of films formed on semiconductor wafers
JP2890476B2 (ja) * 1989-05-31 1999-05-17 東陶機器株式会社 気泡発生浴槽の浴湯循環ポンプ駆動回路
US5166080A (en) * 1991-04-29 1992-11-24 Luxtron Corporation Techniques for measuring the thickness of a film formed on a substrate
DE4017440C2 (de) * 1990-05-30 1994-02-10 Fraunhofer Ges Forschung Verfahren zur Messung der Schichtdicke und des Brechungsindex einer dünnen Schicht auf einem Substrat und Vorrichtung zur Durchführung des Verfahrens
US5314249A (en) * 1991-11-19 1994-05-24 Kawasaki Steel Corporation Surface condition measurement apparatus

Also Published As

Publication number Publication date
US5481112A (en) 1996-01-02
EP0555544B1 (de) 1996-03-20
KR930014760A (ko) 1993-07-23
CA2085143C (en) 1997-03-04
EP0555544A1 (de) 1993-08-18
KR0137451B1 (ko) 1998-05-15
DE69209270T2 (de) 1996-08-08
CA2085143A1 (en) 1993-06-14

Similar Documents

Publication Publication Date Title
DE69306464D1 (de) Verfahren und Vorrichtung zum Behandeln eines bandförmigen Materials
DE3854541D1 (de) Verfahren und Vorrichtung zur Behandlung eines Materials durch Plasma.
DE69230079D1 (de) Verfahren und Vorrichtung zur Höhenregelung eines Werkzeuges
DE69129266D1 (de) Vorrichtung und Verfahren zur Hochauflösungsanalyse der Zusammenstellung eines Materials
DE69221998D1 (de) Vorrichtung und Verfahren zum Entfernen der Beschichtung eines beschichteten linearen Materials
DE69228216D1 (de) Verfahren und Vorrichtung zur Behandlung flüssiger Materialien
DE69632795T8 (de) Verfahren und Vorrichtung zur Ausgabe von kleinen Mengen eines flüssigen Materials
DE69208606D1 (de) Verfahren und Vorrichtung zur optischen Überwachung und Steuerung eines Werkstoffadens
DE69211092D1 (de) Vorrichtung und Verfahren zur Prüfung der mechanischen Beansprachbarkeit eines Materials
AT384415B (de) Verfahren und vorrichtung zur herstellung eines mesokohlenstoffhaltigen materials
DE69625601D1 (de) Verfahren und vorrichtung zur behandlung eines bettes von teilchenförmigem material
DE69228593D1 (de) Verfahren und Vorrichtung zur Emulationsteuerung eines Druckers
DE69120510D1 (de) Verfahren und Vorrichtung zur Behandlung eines photoempfindlichen Materials
DE69209270D1 (de) Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials
DE69317243D1 (de) Verfahren und Vorrichtung zur Steuerung eines Prozesses
ATA139491A (de) Verfahren und vorrichtung zur behandlung fibröser materialien mit einem gasförmigen reagenz
DE69009397D1 (de) Verfahren zum Aufbringen eines Films und Vorrichtung zur Ausführung desselben.
DE69129199D1 (de) Verfahren und oder Vorrichtung zur Beschichtung faserförmigen Materials
ATA237492A (de) Verfahren und vorrichtung zur regelung eines spritzgiessprozesses
DE59209217D1 (de) Verfahren und Vorrichtung zum Erwärmen eines Materials
DE59600288D1 (de) Verfahren und Vorrichtung zur Bearbeitung von Halbleitermaterial
DE69505576D1 (de) Verfahren und Vorrichtung zur Beschichtung eines plattförmigen Materials
DE69208931D1 (de) Verfahren und Vorrichtung zur Dichtung eines Kassettenbodens
DE69310854D1 (de) Verfahren zum Einbringen von einer Reibungsmaterialvorform und Vorrichtung zur dessen Anwendung
DE59505012D1 (de) Verfahren und vorrichtung zur führung eines prozesses

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee