DE69203082D1 - Verfahren zum Ausfällen eines organischen Harzes aus einer alkalische Lösung. - Google Patents
Verfahren zum Ausfällen eines organischen Harzes aus einer alkalische Lösung.Info
- Publication number
- DE69203082D1 DE69203082D1 DE69203082T DE69203082T DE69203082D1 DE 69203082 D1 DE69203082 D1 DE 69203082D1 DE 69203082 T DE69203082 T DE 69203082T DE 69203082 T DE69203082 T DE 69203082T DE 69203082 D1 DE69203082 D1 DE 69203082D1
- Authority
- DE
- Germany
- Prior art keywords
- precipitation
- alkaline solution
- organic resin
- resin
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S210/00—Liquid purification or separation
- Y10S210/902—Materials removed
- Y10S210/908—Organic
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/797,612 US5252225A (en) | 1991-11-25 | 1991-11-25 | Method for precipitating an organic resin from an alkaline solution thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69203082D1 true DE69203082D1 (de) | 1995-07-27 |
DE69203082T2 DE69203082T2 (de) | 1995-11-09 |
Family
ID=25171320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69203082T Expired - Fee Related DE69203082T2 (de) | 1991-11-25 | 1992-10-23 | Verfahren zum Ausfällen eines organischen Harzes aus einer alkalische Lösung. |
Country Status (7)
Country | Link |
---|---|
US (1) | US5252225A (de) |
EP (1) | EP0545537B1 (de) |
CA (1) | CA2081135C (de) |
DE (1) | DE69203082T2 (de) |
DK (1) | DK0545537T3 (de) |
ES (1) | ES2076695T3 (de) |
MX (1) | MX9206369A (de) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0195297B1 (de) * | 1985-03-06 | 1991-05-02 | Karl Clemens Käuffer | Verfahren und Vorrichtung zum Schliessen der Kreisläufe bei der Reinigung von Wasser und Abwasser |
US4760014A (en) * | 1986-08-01 | 1988-07-26 | Great Lakes Chemical Corporation | Method for treating mixtures containing photopolymeric resin and compositions therefor |
US4857206A (en) * | 1987-11-02 | 1989-08-15 | Tmc Corp. | Method for treating, spent dryfilm stripping and developing solutions |
US4999114A (en) * | 1987-11-02 | 1991-03-12 | Morton International | Method of treating spent dryfilm stripping and developing solutions with a chemical mixture |
US5182029A (en) * | 1991-11-26 | 1993-01-26 | International Business Machines Corporation | Aqueous photoresist waste treatment by acid/cupric chloride precipitation |
-
1991
- 1991-11-25 US US07/797,612 patent/US5252225A/en not_active Expired - Lifetime
-
1992
- 1992-10-22 CA CA002081135A patent/CA2081135C/en not_active Expired - Fee Related
- 1992-10-23 DE DE69203082T patent/DE69203082T2/de not_active Expired - Fee Related
- 1992-10-23 ES ES92309763T patent/ES2076695T3/es not_active Expired - Lifetime
- 1992-10-23 EP EP92309763A patent/EP0545537B1/de not_active Expired - Lifetime
- 1992-10-23 DK DK92309763.8T patent/DK0545537T3/da active
- 1992-11-05 MX MX9206369A patent/MX9206369A/es not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CA2081135C (en) | 1997-08-12 |
EP0545537B1 (de) | 1995-06-21 |
CA2081135A1 (en) | 1993-05-26 |
US5252225A (en) | 1993-10-12 |
EP0545537A1 (de) | 1993-06-09 |
DE69203082T2 (de) | 1995-11-09 |
ES2076695T3 (es) | 1995-11-01 |
MX9206369A (es) | 1993-05-01 |
DK0545537T3 (da) | 1995-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: ROHM AND HAAS CHEMICALS LLC, PHILADELPHIA, PA., US |
|
8339 | Ceased/non-payment of the annual fee |