DE69131777D1 - Photoempfindliche materialien - Google Patents

Photoempfindliche materialien

Info

Publication number
DE69131777D1
DE69131777D1 DE69131777T DE69131777T DE69131777D1 DE 69131777 D1 DE69131777 D1 DE 69131777D1 DE 69131777 T DE69131777 T DE 69131777T DE 69131777 T DE69131777 T DE 69131777T DE 69131777 D1 DE69131777 D1 DE 69131777D1
Authority
DE
Germany
Prior art keywords
sensitive materials
photo sensitive
photo
materials
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69131777T
Other languages
English (en)
Other versions
DE69131777T2 (de
Inventor
Dennis Vogel
John Stofko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69131777D1 publication Critical patent/DE69131777D1/de
Publication of DE69131777T2 publication Critical patent/DE69131777T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE69131777T 1990-11-26 1991-09-12 Photoempfindliche materialien Expired - Fee Related DE69131777T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/618,213 US5102771A (en) 1990-11-26 1990-11-26 Photosensitive materials
PCT/US1991/006543 WO1992009934A1 (en) 1990-11-26 1991-09-12 Photosensitive materials

Publications (2)

Publication Number Publication Date
DE69131777D1 true DE69131777D1 (de) 1999-12-16
DE69131777T2 DE69131777T2 (de) 2000-05-31

Family

ID=24476789

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69131777T Expired - Fee Related DE69131777T2 (de) 1990-11-26 1991-09-12 Photoempfindliche materialien

Country Status (7)

Country Link
US (1) US5102771A (de)
EP (1) EP0559660B1 (de)
JP (1) JP2669719B2 (de)
KR (1) KR960015642B1 (de)
CA (1) CA2094906A1 (de)
DE (1) DE69131777T2 (de)
WO (1) WO1992009934A1 (de)

Families Citing this family (68)

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US5225316A (en) * 1990-11-26 1993-07-06 Minnesota Mining And Manufacturing Company An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups
US5401607A (en) * 1991-04-17 1995-03-28 Polaroid Corporation Processes and compositions for photogeneration of acid
JPH05247386A (ja) * 1991-11-27 1993-09-24 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物、ポジ型感光性アニオン電着塗料、電着塗装浴、電着塗装法及びプリント回路板の製造法
US5587274A (en) * 1992-06-19 1996-12-24 Nippon Paint Co., Ltd. Resist composition
JP3202792B2 (ja) * 1992-06-19 2001-08-27 日本ペイント株式会社 レジスト組成物
US5334489A (en) * 1992-10-23 1994-08-02 Polaroid Corporation Process for generation of squaric acid and for imaging, and imaging medium for use therein
US5286612A (en) * 1992-10-23 1994-02-15 Polaroid Corporation Process for generation of free superacid and for imaging, and imaging medium for use therein
US5395734A (en) * 1992-11-30 1995-03-07 Minnesota Mining And Manufacturing Company Shoot and run printing materials
GB9322705D0 (en) * 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
KR0153807B1 (ko) * 1993-12-28 1998-11-16 세끼자와 다다시 방사선 감광재료 및 패턴형성방법
US6004720A (en) 1993-12-28 1999-12-21 Fujitsu Limited Radiation sensitive material and method for forming pattern
US5741630A (en) * 1994-04-25 1998-04-21 Polaroid Corporation Process for fixing an image, and medium for use therein
US5441850A (en) * 1994-04-25 1995-08-15 Polaroid Corporation Imaging medium and process for producing an image
US5506090A (en) * 1994-09-23 1996-04-09 Minnesota Mining And Manufacturing Company Process for making shoot and run printing plates
US5665522A (en) * 1995-05-02 1997-09-09 Minnesota Mining And Manufacturing Company Visible image dyes for positive-acting no-process printing plates
US5713287A (en) * 1995-05-11 1998-02-03 Creo Products Inc. Direct-to-Press imaging method using surface modification of a single layer coating
US5886119A (en) * 1995-08-08 1999-03-23 Olin Microelectronic Chemicals, Inc. Terpolymers containing organosilicon side chains
ATE247095T1 (de) * 1995-10-23 2003-08-15 Basf Ag Strahlungshärtung von dihydrofuranderivaten
DE19611349A1 (de) * 1996-03-22 1997-09-25 Basf Ag Polymerisate mit 2,3-Dihydrofurangruppen
EP0819986B1 (de) * 1996-07-19 2002-03-27 Agfa-Gevaert Bilderzeugendes Element zur Herstellung von lithographischen Druckplatten
US6090526A (en) * 1996-09-13 2000-07-18 Shipley Company, L.L.C. Polymers and photoresist compositions
JP4032444B2 (ja) * 1996-10-11 2008-01-16 株式会社日立製作所 光制御可能な超撥水表面を有する物品、並びにそれを用いた印刷機
EP0951661A1 (de) * 1996-11-27 1999-10-27 Polaroid Corporation Verfahren und zusammensetzung zur erzeugung einer saüre
US6090524A (en) * 1997-03-13 2000-07-18 Kodak Polychrome Graphics Llc Lithographic printing plates comprising a photothermal conversion material
US6110645A (en) * 1997-03-13 2000-08-29 Kodak Polychrome Graphics Llc Method of imaging lithographic printing plates with high intensity laser
US6136508A (en) * 1997-03-13 2000-10-24 Kodak Polychrome Graphics Llc Lithographic printing plates with a sol-gel layer
US5962188A (en) * 1997-06-24 1999-10-05 Kodak Polychrome Graphics Llc Direct write lithographic printing plates
US6014930A (en) * 1997-07-25 2000-01-18 Kodak Polychrome Graphics Llc Single layer direct write lithographic printing plates
US6207348B1 (en) 1997-10-14 2001-03-27 Kodak Polychrome Graphics Llc Dimensionally stable lithographic printing plates with a sol-gel layer
US6153352A (en) 1997-12-10 2000-11-28 Fuji Photo Film Co., Ltd. Planographic printing plate precursor and a method for producing a planographic printing plate
US5922512A (en) * 1998-01-29 1999-07-13 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive polymer and methods of imaging and printing
US6268113B1 (en) 1998-04-30 2001-07-31 Eastman Kodak Company Antireflection direct write lithographic printing plates
US5996499A (en) * 1998-05-26 1999-12-07 Creo Products Inc. On-site generation of processless thermal printing plates using reactive materials
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
US6413694B1 (en) 1998-09-18 2002-07-02 Kodak Polychrome Graphics Llc Processless imaging member containing heat sensitive sulfonate polymer and methods of use
US6190830B1 (en) 1998-09-29 2001-02-20 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing
US6190831B1 (en) 1998-09-29 2001-02-20 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive positively-charged polymers and methods of imaging and printing
KR20000047909A (ko) * 1998-12-10 2000-07-25 마티네즈 길러모 이타콘산 무수물 중합체 및 이를 함유하는 포토레지스트조성물
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US6399268B1 (en) 1999-04-16 2002-06-04 Kodak Polychrome Graphics Llc Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing
ATE269842T1 (de) * 1999-08-02 2004-07-15 Nippon Soda Co Photovernetzbare zusammensetzungen mit einer iodonium-salz-verbindung
US6159657A (en) 1999-08-31 2000-12-12 Eastman Kodak Company Thermal imaging composition and member containing sulfonated ir dye and methods of imaging and printing
US6410202B1 (en) 1999-08-31 2002-06-25 Eastman Kodak Company Thermal switchable composition and imaging member containing cationic IR dye and methods of imaging and printing
US6423469B1 (en) 1999-11-22 2002-07-23 Eastman Kodak Company Thermal switchable composition and imaging member containing oxonol IR dye and methods of imaging and printing
US6447978B1 (en) 1999-12-03 2002-09-10 Kodak Polychrome Graphics Llc Imaging member containing heat switchable polymer and method of use
JP3779122B2 (ja) * 2000-03-14 2006-05-24 松下電器産業株式会社 パターン形成材料及びパターン形成方法
US6458507B1 (en) 2000-03-20 2002-10-01 Kodak Polychrome Graphics Llc Planographic thermal imaging member and methods of use
US6365705B1 (en) 2000-10-30 2002-04-02 Eastman Kodak Company Spiro-ammonium ionomer carboxylates
EP1243433B1 (de) 2001-03-22 2004-05-26 Agfa-Gevaert Lithographisches Druckverfahren mit einer Einzelflüssigkeittinte
DE60214472T2 (de) 2001-06-11 2007-05-16 Fuji Photo Film Co., Ltd., Minami-Ashigara Flachdruckplattenvorläufer, Substrat dafür und hydrophiles Oberflächenmaterial
US6673514B2 (en) 2001-09-07 2004-01-06 Kodak Polychrome Graphics Llc Imagable articles and compositions, and their use
US6660449B2 (en) 2001-10-19 2003-12-09 Eastman Kodak Company Heat-sensitive compositions and imaging member containing carbon black and methods of imaging and printing
US7380500B2 (en) 2002-10-31 2008-06-03 Agfa-Gevaert Process for the offset printing of patterns via the fountain medium
EP1415826B1 (de) 2002-10-31 2008-10-01 Agfa-Gevaert Verfahren zum Bedrucken von Mustern mit Offsetdruck durch das Feuchtwasser
US6783228B2 (en) 2002-12-31 2004-08-31 Eastman Kodak Company Digital offset lithographic printing
US7147801B2 (en) * 2003-03-13 2006-12-12 Videojet Technologies Inc. Ink jet ink composition and method for security marking
US7060416B2 (en) * 2004-04-08 2006-06-13 Eastman Kodak Company Positive-working, thermally sensitive imageable element
US7897296B2 (en) * 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US7255056B2 (en) * 2005-03-04 2007-08-14 Lockheed Martin Corporation Stable, high-speed marine vessel
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
US8313885B2 (en) 2005-11-10 2012-11-20 Agfa Graphics Nv Lithographic printing plate precursor comprising bi-functional compounds
US7878644B2 (en) 2005-11-16 2011-02-01 Gerber Scientific International, Inc. Light cure of cationic ink on acidic substrates
ES2330147T3 (es) 2005-11-24 2009-12-04 Agfa Graphics Nv Metodo de fabricacion de una plancha de impresion litografica.
US7524590B2 (en) * 2005-12-07 2009-04-28 General Electric Company Methods for storing holographic data and articles having enhanced data storage lifetime derived therefrom
US20070147214A1 (en) * 2005-12-22 2007-06-28 General Electric Company Methods for storing holographic data and articles having enhanced data storage lifetime derived therefrom
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
EP3032334B1 (de) 2014-12-08 2017-10-18 Agfa Graphics Nv System zur Reduzierung von Ablationsrückständen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
DE3468112D1 (en) * 1983-09-30 1988-01-28 Toshiba Kk Photopolymerizable epoxy resin composition
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
DE3543646A1 (de) * 1985-12-11 1987-06-19 Basf Ag Ionische polymerisate
JPS62266537A (ja) * 1986-05-14 1987-11-19 Fuji Photo Film Co Ltd マイクロカプセル及びそれを使用した感光性記録材料
CA1305823C (en) * 1986-08-29 1992-07-28 Union Carbide Corporation Photocurable blends of cyclic ethers and cycloaliphatic epoxides
US5120629A (en) * 1990-04-10 1992-06-09 E. I. Du Pont De Nemours And Company Positive-working photosensitive electrostatic master

Also Published As

Publication number Publication date
DE69131777T2 (de) 2000-05-31
WO1992009934A1 (en) 1992-06-11
US5102771A (en) 1992-04-07
CA2094906A1 (en) 1992-05-27
KR930702705A (ko) 1993-09-09
EP0559660A1 (de) 1993-09-15
KR960015642B1 (ko) 1996-11-18
JP2669719B2 (ja) 1997-10-29
JPH06502260A (ja) 1994-03-10
EP0559660B1 (de) 1999-11-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee