DE69129878T2 - Bildaufbauschicht - Google Patents

Bildaufbauschicht

Info

Publication number
DE69129878T2
DE69129878T2 DE69129878T DE69129878T DE69129878T2 DE 69129878 T2 DE69129878 T2 DE 69129878T2 DE 69129878 T DE69129878 T DE 69129878T DE 69129878 T DE69129878 T DE 69129878T DE 69129878 T2 DE69129878 T2 DE 69129878T2
Authority
DE
Germany
Prior art keywords
layer
image build
build
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129878T
Other languages
English (en)
Other versions
DE69129878D1 (de
Inventor
Kouichi Kawamura
Kazuo Maemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69129878D1 publication Critical patent/DE69129878D1/de
Application granted granted Critical
Publication of DE69129878T2 publication Critical patent/DE69129878T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69129878T 1990-05-15 1991-05-07 Bildaufbauschicht Expired - Fee Related DE69129878T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2125149A JP2729850B2 (ja) 1990-05-15 1990-05-15 画像形成層

Publications (2)

Publication Number Publication Date
DE69129878D1 DE69129878D1 (de) 1998-09-03
DE69129878T2 true DE69129878T2 (de) 1998-12-10

Family

ID=14903083

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129878T Expired - Fee Related DE69129878T2 (de) 1990-05-15 1991-05-07 Bildaufbauschicht

Country Status (4)

Country Link
US (1) US5395733A (de)
EP (1) EP0458485B1 (de)
JP (1) JP2729850B2 (de)
DE (1) DE69129878T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2114521T3 (es) 1996-04-23 2000-01-16 Kodak Polychrome Graphics Co Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor.
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
BR9810668A (pt) 1997-07-05 2001-09-04 Kodak Polychrome Graphics Co Processos para formação de moldes e materiais sensìveis a radiação
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
JP4040217B2 (ja) * 1998-08-14 2008-01-30 富士フイルム株式会社 平版印刷版の製造方法および感光性樹脂組成物
KR100562968B1 (ko) * 2001-12-28 2006-03-23 다이세이 플라스 가부시끼가이샤 알루미늄합금과 수지의 복합체와 그 제조방법
JP5223365B2 (ja) * 2008-02-08 2013-06-26 東洋インキＳｃホールディングス株式会社 光重合開始剤、重合性組成物、および重合物の製造方法。
US9500948B2 (en) * 2013-05-31 2016-11-22 Orthogonal, Inc. Fluorinated photoresist with integrated sensitizer
CN106103585B (zh) 2013-11-13 2018-09-21 正交公司 支化的氟化光聚合物
KR20160118340A (ko) 2014-02-07 2016-10-11 올싸거널 인코포레이티드 교차-결합 가능한 플루오르화된 포토폴리머
KR102480950B1 (ko) 2014-12-24 2022-12-23 올싸거널 인코포레이티드 전자 장치의 포토리소그래피 패터닝

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3591661A (en) * 1969-07-23 1971-07-06 Du Pont Polymeric photosensitizers
US3748144A (en) * 1972-02-07 1973-07-24 Eastman Kodak Co Photographic compositions comprising light sensitive polymers
US4046577A (en) * 1975-06-09 1977-09-06 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromatic glyoxy groups
JPS5218790A (en) * 1975-08-01 1977-02-12 Sekisui Chem Co Ltd Process for preparing photo- polymerizable resins
US4348530A (en) * 1980-02-05 1982-09-07 Ciba-Geigy Corporation Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups
DE3789061T2 (de) * 1986-12-09 1994-06-09 Terumo Corp Ultraviolett absorbierendes polymer-material.
JPH07117749B2 (ja) * 1987-07-28 1995-12-18 富士写真フイルム株式会社 非光重合性の画像形成層
JP2561844B2 (ja) * 1987-11-10 1996-12-11 富士写真フイルム株式会社 光重合性組成物
JP2571409B2 (ja) * 1988-01-11 1997-01-16 富士写真フイルム株式会社 感光性組成物
DE3902115A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche polymere
US5227279A (en) * 1989-03-10 1993-07-13 Nippon Paint Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
JP2729850B2 (ja) 1998-03-18
DE69129878D1 (de) 1998-09-03
EP0458485A2 (de) 1991-11-27
EP0458485A3 (en) 1992-10-21
JPH0419748A (ja) 1992-01-23
US5395733A (en) 1995-03-07
EP0458485B1 (de) 1998-07-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee