DE69128224D1 - Gerät zum Nachweis fremder Teilchen - Google Patents

Gerät zum Nachweis fremder Teilchen

Info

Publication number
DE69128224D1
DE69128224D1 DE69128224T DE69128224T DE69128224D1 DE 69128224 D1 DE69128224 D1 DE 69128224D1 DE 69128224 T DE69128224 T DE 69128224T DE 69128224 T DE69128224 T DE 69128224T DE 69128224 D1 DE69128224 D1 DE 69128224D1
Authority
DE
Germany
Prior art keywords
detection
foreign particles
foreign
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69128224T
Other languages
English (en)
Other versions
DE69128224T2 (de
Inventor
Tsuneyuki Hagiwara
Fuminori Hayano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69128224D1 publication Critical patent/DE69128224D1/de
Publication of DE69128224T2 publication Critical patent/DE69128224T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE69128224T 1990-09-12 1991-09-11 Gerät zum Nachweis fremder Teilchen Expired - Fee Related DE69128224T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2242247A JPH04122042A (ja) 1990-09-12 1990-09-12 異物検査装置

Publications (2)

Publication Number Publication Date
DE69128224D1 true DE69128224D1 (de) 1998-01-02
DE69128224T2 DE69128224T2 (de) 1998-03-12

Family

ID=17086435

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128224T Expired - Fee Related DE69128224T2 (de) 1990-09-12 1991-09-11 Gerät zum Nachweis fremder Teilchen

Country Status (3)

Country Link
EP (1) EP0475748B1 (de)
JP (1) JPH04122042A (de)
DE (1) DE69128224T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4135958A1 (de) * 1991-10-31 1993-05-06 Leica Lasertechnik Gmbh, 6900 Heidelberg, De Verfahren und vorrichtung zur detektion kleinster teilchen auf strukturierten flaechen
JP2796906B2 (ja) * 1992-02-03 1998-09-10 日立電子エンジニアリング株式会社 異物検査装置
DE4343058A1 (de) * 1993-12-19 1995-06-22 Robert Prof Dr Ing Massen Multisensorielle Kamera für die Qualitätssicherung
US5838433A (en) * 1995-04-19 1998-11-17 Nikon Corporation Apparatus for detecting defects on a mask
WO1997046865A1 (en) 1996-06-04 1997-12-11 Tencor Instruments Optical scanning system for surface inspection
CN100595564C (zh) 2004-07-30 2010-03-24 百维吉伦特系统有限公司 病原体和粒子检测器系统和方法
CN101223560B (zh) 2005-07-15 2012-12-12 百维吉伦特系统有限公司 病原体和颗粒的检测器系统和方法
US8628976B2 (en) 2007-12-03 2014-01-14 Azbil BioVigilant, Inc. Method for the detection of biologic particle contamination

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154635A (ja) * 1984-01-25 1985-08-14 Hitachi Ltd パタ−ン欠陥検査装置
JPS61230048A (ja) * 1985-04-05 1986-10-14 Hitachi Ltd 異物検出方法
US4889998A (en) * 1987-01-29 1989-12-26 Nikon Corporation Apparatus with four light detectors for checking surface of mask with pellicle
US4952058A (en) * 1987-04-27 1990-08-28 Hitach, Ltd. Method and apparatus for detecting abnormal patterns
JPH01239437A (ja) * 1988-03-19 1989-09-25 Horiba Ltd 異物有無検査装置
JPH01259244A (ja) * 1988-04-11 1989-10-16 Hitachi Ltd 異物検出方式

Also Published As

Publication number Publication date
EP0475748B1 (de) 1997-11-19
JPH04122042A (ja) 1992-04-22
EP0475748A3 (en) 1992-09-23
DE69128224T2 (de) 1998-03-12
EP0475748A2 (de) 1992-03-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: WESER & KOLLEGEN, 81245 MUENCHEN

8339 Ceased/non-payment of the annual fee