DE69119365D1 - Verfahren zur Analyse von Metallverunreinigungen in dem oberflächigen Oxidfilm eines Halbleitersubstrats - Google Patents
Verfahren zur Analyse von Metallverunreinigungen in dem oberflächigen Oxidfilm eines HalbleitersubstratsInfo
- Publication number
- DE69119365D1 DE69119365D1 DE69119365T DE69119365T DE69119365D1 DE 69119365 D1 DE69119365 D1 DE 69119365D1 DE 69119365 T DE69119365 T DE 69119365T DE 69119365 T DE69119365 T DE 69119365T DE 69119365 D1 DE69119365 D1 DE 69119365D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor substrate
- oxide film
- metal impurities
- surface oxide
- analyzing metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/60—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrostatic variables, e.g. electrographic flaw testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/20—Metals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32176390 | 1990-11-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69119365D1 true DE69119365D1 (de) | 1996-06-13 |
DE69119365T2 DE69119365T2 (de) | 1996-11-07 |
Family
ID=18136172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69119365T Expired - Fee Related DE69119365T2 (de) | 1990-11-26 | 1991-11-26 | Verfahren zur Analyse von Metallverunreinigungen in dem oberflächigen Oxidfilm eines Halbleitersubstrats |
Country Status (7)
Country | Link |
---|---|
US (1) | US5298860A (de) |
EP (1) | EP0488149B1 (de) |
JP (1) | JP3044881B2 (de) |
KR (1) | KR0163596B1 (de) |
DE (1) | DE69119365T2 (de) |
SG (1) | SG45200A1 (de) |
TW (1) | TW312745B (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4305297C2 (de) * | 1993-02-20 | 1998-09-24 | Telefunken Microelectron | Strukturbeize für Halbleiter und deren Anwendung |
JPH07153808A (ja) * | 1993-09-24 | 1995-06-16 | Shin Etsu Handotai Co Ltd | 結合型基板の結合界面のボロン評価方法 |
JPH0888259A (ja) * | 1994-09-14 | 1996-04-02 | Komatsu Electron Metals Co Ltd | 半導体基板評価のための表面処理方法 |
JP2967398B2 (ja) | 1995-09-18 | 1999-10-25 | 信越半導体株式会社 | シリコンウエーハ内部の不純物分析方法 |
JPH10178077A (ja) * | 1996-12-17 | 1998-06-30 | Nec Corp | 半導体基板の定量汚染試料の作製方法 |
US5943552A (en) * | 1997-02-06 | 1999-08-24 | Seh America, Inc. | Schottky metal detection method |
JP3223869B2 (ja) * | 1997-11-17 | 2001-10-29 | 日本電気株式会社 | 不純物濃度の定量方法 |
US6603119B1 (en) * | 2000-05-09 | 2003-08-05 | Agere Systems Inc. | Calibration method for quantitative elemental analysis |
JP4761179B2 (ja) * | 2001-07-19 | 2011-08-31 | 信越半導体株式会社 | ウェーハ表面に吸着したボロン濃度の測定方法及び環境雰囲気中のボロンレベルの評価方法 |
US6664120B1 (en) * | 2001-12-17 | 2003-12-16 | Cypress Semiconductor Corp. | Method and structure for determining a concentration profile of an impurity within a semiconductor layer |
KR20030004173A (ko) * | 2002-10-31 | 2003-01-14 | (주)뉴크린-탑 | 속건성 목욕가운 |
US7319530B1 (en) * | 2004-03-29 | 2008-01-15 | National Semiconductor Corporation | System and method for measuring germanium concentration for manufacturing control of BiCMOS films |
JP2008533742A (ja) * | 2005-03-14 | 2008-08-21 | キューシー ソリューションズ, インコーポレイテッド | 半導体ウェハ計測の装置および方法 |
CN101131371B (zh) * | 2007-10-08 | 2010-06-02 | 苏州阿特斯阳光电力科技有限公司 | 一种精炼冶金硅的杂质含量检测分析方法 |
JP2009259960A (ja) * | 2008-04-15 | 2009-11-05 | Sumco Corp | 半導体基板の重金属検出方法 |
ITGE20110082A1 (it) * | 2011-07-28 | 2013-01-29 | Sirtres S R L | Piede di appoggio per stabilizzatori . |
US9553160B2 (en) | 2013-10-09 | 2017-01-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mechanisms for monitoring impurity in high-K dielectric film |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD283311A7 (de) * | 1981-11-24 | 1990-10-10 | Sieber,Nina,Dd | Verfahren zur herstellung von stabilen mos-anordnungen |
US4551674A (en) * | 1982-11-12 | 1985-11-05 | At&T Bell Laboratories | Noncontacting conductivity type determination and surface state spectroscopy of semiconductor materials |
US4598249A (en) * | 1984-02-29 | 1986-07-01 | Rca Corporation | Method using surface photovoltage (SPV) measurements for revealing heavy metal contamination of semiconductor material |
US4812756A (en) * | 1987-08-26 | 1989-03-14 | International Business Machines Corporation | Contactless technique for semicondutor wafer testing |
US4827212A (en) * | 1988-01-20 | 1989-05-02 | Semitest, Inc. | Noninvasive method and apparatus for characterization of semiconductors |
-
1991
- 1991-11-25 US US07/796,823 patent/US5298860A/en not_active Expired - Lifetime
- 1991-11-25 TW TW080109236A patent/TW312745B/zh active
- 1991-11-25 JP JP03309206A patent/JP3044881B2/ja not_active Expired - Fee Related
- 1991-11-26 EP EP91120154A patent/EP0488149B1/de not_active Expired - Lifetime
- 1991-11-26 DE DE69119365T patent/DE69119365T2/de not_active Expired - Fee Related
- 1991-11-26 SG SG1996001226A patent/SG45200A1/en unknown
- 1991-11-26 KR KR1019910021393A patent/KR0163596B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0488149B1 (de) | 1996-05-08 |
DE69119365T2 (de) | 1996-11-07 |
KR920010284A (ko) | 1992-06-26 |
JP3044881B2 (ja) | 2000-05-22 |
EP0488149A3 (en) | 1993-03-17 |
KR0163596B1 (ko) | 1999-05-01 |
EP0488149A2 (de) | 1992-06-03 |
JPH0541433A (ja) | 1993-02-19 |
SG45200A1 (en) | 1998-01-16 |
TW312745B (de) | 1997-08-11 |
US5298860A (en) | 1994-03-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |