DE69115234T2 - Verfahren und Vorrichtung zur Handhabung von Wafern. - Google Patents
Verfahren und Vorrichtung zur Handhabung von Wafern.Info
- Publication number
- DE69115234T2 DE69115234T2 DE69115234T DE69115234T DE69115234T2 DE 69115234 T2 DE69115234 T2 DE 69115234T2 DE 69115234 T DE69115234 T DE 69115234T DE 69115234 T DE69115234 T DE 69115234T DE 69115234 T2 DE69115234 T2 DE 69115234T2
- Authority
- DE
- Germany
- Prior art keywords
- handling wafers
- wafers
- handling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2414067A JPH0770504B2 (ja) | 1990-12-26 | 1990-12-26 | ウエーハのハンドリング方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69115234D1 DE69115234D1 (de) | 1996-01-18 |
DE69115234T2 true DE69115234T2 (de) | 1996-08-01 |
Family
ID=18522603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69115234T Expired - Fee Related DE69115234T2 (de) | 1990-12-26 | 1991-12-24 | Verfahren und Vorrichtung zur Handhabung von Wafern. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5226758A (de) |
EP (1) | EP0493117B1 (de) |
JP (1) | JPH0770504B2 (de) |
DE (1) | DE69115234T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5421889A (en) * | 1993-06-29 | 1995-06-06 | Tokyo Electron Limited | Method and apparatus for inverting samples in a process |
US5733175A (en) | 1994-04-25 | 1998-03-31 | Leach; Michael A. | Polishing a workpiece using equal velocity at all points overlapping a polisher |
US5607341A (en) | 1994-08-08 | 1997-03-04 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
US7169015B2 (en) | 1995-05-23 | 2007-01-30 | Nova Measuring Instruments Ltd. | Apparatus for optical inspection of wafers during processing |
IL113829A (en) | 1995-05-23 | 2000-12-06 | Nova Measuring Instr Ltd | Apparatus for optical inspection of wafers during polishing |
US6516509B1 (en) * | 1996-06-07 | 2003-02-11 | Canon Kabushiki Kaisha | Method of manufacturing a liquid jet head having a plurality of movable members |
US5765890A (en) * | 1996-10-03 | 1998-06-16 | Memc Electronic Materials, Inc. | Device for transferring a semiconductor wafer |
US5993148A (en) | 1997-07-22 | 1999-11-30 | Micron Technology, Inc. | Article transfer methods |
US5915910A (en) * | 1997-08-29 | 1999-06-29 | Daitron, Inc. | Semiconductor wafer transfer method and apparatus |
US6183186B1 (en) | 1997-08-29 | 2001-02-06 | Daitron, Inc. | Wafer handling system and method |
ATE242064T1 (de) | 1998-02-14 | 2003-06-15 | Lam Res Corp | Vorrichtung zum laden von halbleiterscheiben |
US6045299A (en) * | 1998-04-13 | 2000-04-04 | International Business Machines Corp. | Unidirectional gate between interconnecting fluid transport regions |
JP2000040679A (ja) * | 1998-07-24 | 2000-02-08 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
US6368183B1 (en) * | 1999-02-03 | 2002-04-09 | Speedfam-Ipec Corporation | Wafer cleaning apparatus and associated wafer processing methods |
US6318953B1 (en) * | 1999-07-12 | 2001-11-20 | Asyst Technologies, Inc. | SMIF-compatible open cassette enclosure |
US6413356B1 (en) * | 2000-05-02 | 2002-07-02 | Applied Materials, Inc. | Substrate loader for a semiconductor processing system |
JP5591562B2 (ja) * | 2010-03-10 | 2014-09-17 | 日本発條株式会社 | 位置決め装置 |
JP5591563B2 (ja) * | 2010-03-10 | 2014-09-17 | 日本発條株式会社 | 位置確認装置 |
JP6048400B2 (ja) * | 2011-03-30 | 2016-12-21 | 大日本印刷株式会社 | 超臨界乾燥装置及び超臨界乾燥方法 |
JP6602720B2 (ja) | 2016-04-04 | 2019-11-06 | グローバルウェーハズ・ジャパン株式会社 | 半導体基板の保護膜形成方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3630804A (en) * | 1968-08-19 | 1971-12-28 | Chemcut Corp | Etching apparatus |
JPS58171255A (ja) * | 1982-03-29 | 1983-10-07 | Toshiba Corp | 両面鏡面研摩装置 |
JPS609129A (ja) * | 1983-06-29 | 1985-01-18 | Fujitsu Ltd | ウエツト処理装置 |
JPH029319A (ja) * | 1988-06-28 | 1990-01-12 | Yamamoto Mfg Co Ltd | ロックファイバー成形物の処理方法および処理装置と処理物を用いた土壌培養剤 |
-
1990
- 1990-12-26 JP JP2414067A patent/JPH0770504B2/ja not_active Expired - Lifetime
-
1991
- 1991-12-23 US US07/812,621 patent/US5226758A/en not_active Expired - Fee Related
- 1991-12-24 EP EP91312028A patent/EP0493117B1/de not_active Expired - Lifetime
- 1991-12-24 DE DE69115234T patent/DE69115234T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH04225229A (ja) | 1992-08-14 |
EP0493117A2 (de) | 1992-07-01 |
DE69115234D1 (de) | 1996-01-18 |
EP0493117B1 (de) | 1995-12-06 |
JPH0770504B2 (ja) | 1995-07-31 |
EP0493117A3 (de) | 1994-02-16 |
US5226758A (en) | 1993-07-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |