DE69104000D1 - Vorrichtung zum Vakuum-Aufdampfen. - Google Patents

Vorrichtung zum Vakuum-Aufdampfen.

Info

Publication number
DE69104000D1
DE69104000D1 DE69104000T DE69104000T DE69104000D1 DE 69104000 D1 DE69104000 D1 DE 69104000D1 DE 69104000 T DE69104000 T DE 69104000T DE 69104000 T DE69104000 T DE 69104000T DE 69104000 D1 DE69104000 D1 DE 69104000D1
Authority
DE
Germany
Prior art keywords
vacuum evaporation
evaporation
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69104000T
Other languages
English (en)
Other versions
DE69104000T2 (de
Inventor
Yanagi Kenichi
Taguchi Toshio
Moriyama Yoshiteru
Sako Mitsuhiko
Aiko Takuya
Kamura Shinji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Publication of DE69104000D1 publication Critical patent/DE69104000D1/de
Application granted granted Critical
Publication of DE69104000T2 publication Critical patent/DE69104000T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
DE69104000T 1990-09-28 1991-06-19 Vorrichtung zum Vakuum-Aufdampfen. Expired - Fee Related DE69104000T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2257430A JPH0762239B2 (ja) 1990-09-28 1990-09-28 真空蒸着装置

Publications (2)

Publication Number Publication Date
DE69104000D1 true DE69104000D1 (de) 1994-10-20
DE69104000T2 DE69104000T2 (de) 1995-05-04

Family

ID=17306258

Family Applications (2)

Application Number Title Priority Date Filing Date
DE199191110103T Pending DE477474T1 (de) 1990-09-28 1991-06-19 Vorrichtung zum vakuum-aufdampfen.
DE69104000T Expired - Fee Related DE69104000T2 (de) 1990-09-28 1991-06-19 Vorrichtung zum Vakuum-Aufdampfen.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE199191110103T Pending DE477474T1 (de) 1990-09-28 1991-06-19 Vorrichtung zum vakuum-aufdampfen.

Country Status (7)

Country Link
US (1) US5169451A (de)
EP (1) EP0477474B1 (de)
JP (1) JPH0762239B2 (de)
KR (1) KR940001031B1 (de)
AU (1) AU631074B2 (de)
CA (1) CA2044976C (de)
DE (2) DE477474T1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4442733C2 (de) * 1994-12-01 2001-04-26 Ardenne Anlagentech Gmbh Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
WO1996035822A1 (fr) * 1995-05-10 1996-11-14 Centre De Recherches Metallurgiques - Centrum Voor Research In De Metallurgie Dispositif et installation pour revetir une bande d'acier
AUPO712097A0 (en) * 1997-05-30 1997-06-26 Lintek Pty Ltd Vacuum deposition system
DE10128091C1 (de) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
DE102004001884A1 (de) * 2004-01-14 2005-08-11 Applied Films Gmbh & Co. Kg Verdampfungseinrichtung für sublimierende Materialien
ATE376078T1 (de) * 2005-07-28 2007-11-15 Applied Materials Gmbh & Co Kg Bedampfervorrichtung
EP1967604A1 (de) * 2007-03-08 2008-09-10 Applied Materials, Inc. Verdampfungstiegel und Verdampfungsvorrichtung mit gerichteter Verdampfung
US8323408B2 (en) * 2007-12-10 2012-12-04 Solopower, Inc. Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
US8628617B2 (en) * 2008-12-03 2014-01-14 First Solar, Inc. System and method for top-down material deposition
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
DE102020119155A1 (de) * 2020-07-21 2022-01-27 Voestalpine Stahl Gmbh Verfahren zum Abscheiden von metallischen Werkstoffen

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938382A (ja) * 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
AU559722B2 (en) * 1984-02-08 1987-03-19 Mitsubishi Jukogyo Kabushiki Kaisha A combined plating apparatus for hot dip plating and vacuum deposition plating
US4676999A (en) * 1984-09-17 1987-06-30 Mitsubishi Jukogyo Kabushiki Kaisha Method for vacuum deposition plating steel strip
JPS6173875A (ja) * 1984-09-17 1986-04-16 Mitsubishi Heavy Ind Ltd 流路幅調整板付き真空蒸着装置
JPS6179755A (ja) * 1984-09-28 1986-04-23 Nisshin Steel Co Ltd 溶融めつき真空蒸着めつき兼用の連続めつき装置
JPS61204374A (ja) * 1985-03-08 1986-09-10 Hitachi Maxell Ltd 蒸着方法ならびに蒸着装置
JPH0745712B2 (ja) * 1988-01-18 1995-05-17 三菱重工業株式会社 真空蒸着装置
JPH01225768A (ja) * 1988-03-04 1989-09-08 Hitachi Maxell Ltd 両面同時蒸着装置
JPH024963A (ja) * 1988-06-23 1990-01-09 Kawasaki Steel Corp イオンプレーティング装置

Also Published As

Publication number Publication date
EP0477474B1 (de) 1994-09-14
AU631074B2 (en) 1992-11-12
DE477474T1 (de) 1992-09-03
CA2044976A1 (en) 1992-03-29
JPH04136169A (ja) 1992-05-11
JPH0762239B2 (ja) 1995-07-05
AU8348691A (en) 1992-04-16
KR920006535A (ko) 1992-04-27
CA2044976C (en) 1994-01-25
KR940001031B1 (ko) 1994-02-08
DE69104000T2 (de) 1995-05-04
EP0477474A1 (de) 1992-04-01
US5169451A (en) 1992-12-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee