DE69103144D1 - Durch laserplasmaabscheidung hergestelltes diamantartiges kohlenstoffmaterial. - Google Patents

Durch laserplasmaabscheidung hergestelltes diamantartiges kohlenstoffmaterial.

Info

Publication number
DE69103144D1
DE69103144D1 DE69103144T DE69103144T DE69103144D1 DE 69103144 D1 DE69103144 D1 DE 69103144D1 DE 69103144 T DE69103144 T DE 69103144T DE 69103144 T DE69103144 T DE 69103144T DE 69103144 D1 DE69103144 D1 DE 69103144D1
Authority
DE
Germany
Prior art keywords
diamond
carbon material
material produced
plasma deposition
laser plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69103144T
Other languages
English (en)
Other versions
DE69103144T2 (de
Inventor
Carl B Collins
Farzin Davanloo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
COLLINS, CARL B., RICHARDSON, TEX., US
Davanloo Farzin Dallas Tex Us
Original Assignee
University of Texas System
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Texas System filed Critical University of Texas System
Publication of DE69103144D1 publication Critical patent/DE69103144D1/de
Application granted granted Critical
Publication of DE69103144T2 publication Critical patent/DE69103144T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC
    • Y10S427/104—Utilizing low energy electromagnetic radiation, e.g. microwave, radio wave, IR, UV, visible, actinic laser

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Catching Or Destruction (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
DE69103144T 1990-05-09 1991-05-08 Durch laserplasmaabscheidung hergestelltes diamantartiges kohlenstoffmaterial. Expired - Lifetime DE69103144T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/521,694 US5098737A (en) 1988-04-18 1990-05-09 Amorphic diamond material produced by laser plasma deposition
PCT/US1991/003169 WO1991017282A1 (en) 1990-05-09 1991-05-08 Diamond-like carbon material produced by laser plasma deposition

Publications (2)

Publication Number Publication Date
DE69103144D1 true DE69103144D1 (de) 1994-09-01
DE69103144T2 DE69103144T2 (de) 1994-11-03

Family

ID=24077747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69103144T Expired - Lifetime DE69103144T2 (de) 1990-05-09 1991-05-08 Durch laserplasmaabscheidung hergestelltes diamantartiges kohlenstoffmaterial.

Country Status (6)

Country Link
US (1) US5098737A (de)
EP (1) EP0527915B1 (de)
JP (1) JP3203249B2 (de)
AU (1) AU7882391A (de)
DE (1) DE69103144T2 (de)
WO (1) WO1991017282A1 (de)

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US5620754A (en) * 1994-01-21 1997-04-15 Qqc, Inc. Method of treating and coating substrates
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AU4194896A (en) * 1994-10-18 1996-05-06 Edsi, Inc. Apparatus for depositing a layer of material on a substrate
US6296740B1 (en) 1995-04-24 2001-10-02 Si Diamond Technology, Inc. Pretreatment process for a surface texturing process
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US5747120A (en) * 1996-03-29 1998-05-05 Regents Of The University Of California Laser ablated hard coating for microtools
DE19704179A1 (de) * 1997-02-05 1998-08-06 Fraunhofer Ges Forschung Kühleinrichtung für Gase, insbesondere für Lasermedium in einem Entladungsraum
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WO2000031315A1 (en) * 1998-11-20 2000-06-02 Fernandez Felix E Apparatus and method for pulsed laser deposition of materials on wires and pipes
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US6280834B1 (en) 1999-05-03 2001-08-28 Guardian Industries Corporation Hydrophobic coating including DLC and/or FAS on substrate
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US6277480B1 (en) 1999-05-03 2001-08-21 Guardian Industries Corporation Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method
US6338901B1 (en) 1999-05-03 2002-01-15 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
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US6641395B2 (en) 2000-08-02 2003-11-04 Nobel Biocare Ab Endosseous implant drill
US20050260331A1 (en) * 2002-01-22 2005-11-24 Xingwu Wang Process for coating a substrate
US20040225213A1 (en) * 2002-01-22 2004-11-11 Xingwu Wang Magnetic resonance imaging coated assembly
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Also Published As

Publication number Publication date
EP0527915B1 (de) 1994-07-27
DE69103144T2 (de) 1994-11-03
WO1991017282A1 (en) 1991-11-14
EP0527915A1 (de) 1993-02-24
JP3203249B2 (ja) 2001-08-27
JPH05508685A (ja) 1993-12-02
AU7882391A (en) 1991-11-27
US5098737A (en) 1992-03-24

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8370 Indication of lapse of patent is to be deleted
8327 Change in the person/name/address of the patent owner

Owner name: COLLINS, CARL B., RICHARDSON, TEX., US

Owner name: DAVANLOO, FARZIN, DALLAS, TEX., US