DE69031064T2 - Verfahren zur Entfernung von Flussmittelresten von elektronischen Komponenten mittels der Verwendung von Mischungen, die Tetrahydrofurfurylalkohol und Amine enthalten. - Google Patents

Verfahren zur Entfernung von Flussmittelresten von elektronischen Komponenten mittels der Verwendung von Mischungen, die Tetrahydrofurfurylalkohol und Amine enthalten.

Info

Publication number
DE69031064T2
DE69031064T2 DE69031064T DE69031064T DE69031064T2 DE 69031064 T2 DE69031064 T2 DE 69031064T2 DE 69031064 T DE69031064 T DE 69031064T DE 69031064 T DE69031064 T DE 69031064T DE 69031064 T2 DE69031064 T2 DE 69031064T2
Authority
DE
Germany
Prior art keywords
amines
electronic components
mixtures containing
tetrahydrofurfuryl alcohol
flux residues
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69031064T
Other languages
English (en)
Other versions
DE69031064D1 (de
Inventor
Michael L Bixenman
George C Wolf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Delco Electronics LLC
Kyzen Corp
Original Assignee
Delco Electronics LLC
Kyzen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Delco Electronics LLC, Kyzen Corp filed Critical Delco Electronics LLC
Publication of DE69031064D1 publication Critical patent/DE69031064D1/de
Application granted granted Critical
Publication of DE69031064T2 publication Critical patent/DE69031064T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
DE69031064T 1989-09-29 1990-09-28 Verfahren zur Entfernung von Flussmittelresten von elektronischen Komponenten mittels der Verwendung von Mischungen, die Tetrahydrofurfurylalkohol und Amine enthalten. Expired - Lifetime DE69031064T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41401189A 1989-09-29 1989-09-29
US07/586,080 US5128057A (en) 1989-09-29 1990-09-21 Furfuryl alcohol mixtures for use as cleaning agents

Publications (2)

Publication Number Publication Date
DE69031064D1 DE69031064D1 (de) 1997-08-21
DE69031064T2 true DE69031064T2 (de) 1998-02-19

Family

ID=27022384

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69031064T Expired - Lifetime DE69031064T2 (de) 1989-09-29 1990-09-28 Verfahren zur Entfernung von Flussmittelresten von elektronischen Komponenten mittels der Verwendung von Mischungen, die Tetrahydrofurfurylalkohol und Amine enthalten.

Country Status (10)

Country Link
US (1) US5128057A (de)
EP (1) EP0426512B1 (de)
JP (1) JP2749439B2 (de)
CN (2) CN1036405C (de)
AU (1) AU636657B2 (de)
CA (1) CA2026335C (de)
DE (1) DE69031064T2 (de)
ES (1) ES2104594T3 (de)
HK (1) HK1002282A1 (de)
MX (1) MX173238B (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0826347B2 (ja) * 1990-08-31 1996-03-13 新日本理化株式会社 非塩素系洗浄剤組成物
JP2614980B2 (ja) * 1991-06-14 1997-05-28 ペトロファーム インコーポレイテッド ロジンハンダ付用フラックスをテルペン及び炭化水素で除去するための組成物及び方法
DE4124246A1 (de) * 1991-07-22 1993-01-28 Henkel Kgaa Reinigungsmittel fuer elektronische und elektrische baugruppen
EP0587917B1 (de) * 1992-08-07 1995-01-04 DR.O.K. WACK CHEMIE GmbH Reinigungsmittel
US5456853A (en) * 1993-04-23 1995-10-10 Rust-Oleum Corporation Paint stripping composition based on tetrahydrofurfuryl alcohol and oxygenated aliphatic solvents
US5431739A (en) * 1994-06-07 1995-07-11 Macdermid, Incorporated Process for cleaning and defluxing parts, specifically electronic circuit assemblies
US5514294A (en) * 1994-11-22 1996-05-07 Alliedsignal Inc. Limonene and tetrahydrofurfuryl alcohol cleaning agent
DE19532284A1 (de) * 1995-09-01 1997-03-06 Rolf Georg Verwendung von (C¶1¶ - C¶5¶) Alkylestern aliphatischer (C¶8¶ - C¶2¶¶2¶) Monocarbonsäuren für die Reinigung metallischer Gegenstände
US5932021A (en) * 1996-06-26 1999-08-03 Cala; Francis R. Aqueous cleaning composition for removing flux and method of use
US5958144A (en) * 1997-05-20 1999-09-28 Church & Dwight Flux-removing aqueous cleaning composition and method of use
JP2001520267A (ja) * 1997-10-14 2001-10-30 アドバンスド・ケミカル・システムズ・インターナショナル・インコーポレーテッド 半導体基板からの残留物をストリッピングするためのホウ酸アンモニウム含有組成物
US6130195A (en) * 1997-11-03 2000-10-10 Kyzen Corporation Cleaning compositions and methods for cleaning using cyclic ethers and alkoxy methyl butanols
US5988485A (en) * 1998-03-17 1999-11-23 Advanced Micro Devices, Inc. Flux cleaning for flip chip technology using environmentally friendly solvents
US6881711B1 (en) 2001-10-26 2005-04-19 Prestone Products Corporation Low VOC cleaning compositions for hard surfaces
US6716290B1 (en) 2002-12-04 2004-04-06 The United States Of America As Represented By The Secretary Of The Navy Method for removing soldering flux residue from a substrate
US20050045205A1 (en) * 2003-08-29 2005-03-03 Stach Steven R. Apparatus and method for cleaning printed circuit boards
US7354889B2 (en) * 2005-08-31 2008-04-08 Kimberly-Clark Worldwide, Inc. Method of removing medical adhesive with a remover comprising tetrahydrofurfuryl acetate
US7794531B2 (en) * 2007-01-08 2010-09-14 Enthone Inc. Organic solderability preservative comprising high boiling temperature alcohol
CN101177657B (zh) * 2007-10-18 2010-05-26 珠海顺泽电子实业有限公司 印刷线路板的去膜液添加剂及其生产方法
WO2010030505A1 (en) * 2008-09-10 2010-03-18 Austin American Technology Corporation Cleaning and testing ionic cleanliness of electronic assemblies
KR100950779B1 (ko) * 2009-08-25 2010-04-02 엘티씨 (주) Ｔｆｔ―ｌｃｄ 통합공정용 포토레지스트 박리제 조성물
US20160047741A1 (en) * 2014-08-18 2016-02-18 Kyzen Corporation Method and apparatus for monitoring and controlling a cleaning process
CN107312662A (zh) * 2017-07-03 2017-11-03 中山翰华锡业有限公司 一种焊锡残留物用环保水基清洗剂及其制备与使用方法
CN109137501A (zh) * 2018-08-03 2019-01-04 巢湖市渔郎渔具有限公司 一种等离子体提升渔网润湿性能的方法
CN111139140A (zh) * 2018-11-02 2020-05-12 依工特种材料（苏州）有限公司 一种水基型半导体清洗剂及其制备方法
CN112500938A (zh) * 2020-12-22 2021-03-16 苏州柏越纳米科技有限公司 半水基型半导体元器件清洗剂

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4207621A (en) * 1963-10-31 1980-06-10 The United States Of America As Represented By The Secretary Of The Navy Electrically steerable sonar system
FR1472583A (de) * 1963-12-04 1967-05-31
US4366002A (en) * 1980-10-15 1982-12-28 Amchem Products, Inc. Non-volatile hot stripper
US4664721A (en) * 1981-12-07 1987-05-12 Intercontinental Chemical Corporation Printing screen cleaning and reclaiming compositions
US4737195A (en) * 1983-11-18 1988-04-12 Amchem Products Activator-accelerator mixtures for alkaline paint stripper compositions
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US4568395A (en) * 1985-05-10 1986-02-04 Nabhani Abdol R Precleaner system and soldering flux
US4781804A (en) * 1988-03-02 1988-11-01 Delco Electronics Corporation Electrolytic organic mold flash removal
JP2566827B2 (ja) * 1989-07-31 1996-12-25 花王株式会社 洗浄剤組成物

Also Published As

Publication number Publication date
AU6363090A (en) 1991-04-11
EP0426512B1 (de) 1997-07-16
US5128057A (en) 1992-07-07
HK1002282A1 (en) 1998-08-14
ES2104594T3 (es) 1997-10-16
CA2026335A1 (en) 1991-03-30
AU636657B2 (en) 1993-05-06
DE69031064D1 (de) 1997-08-21
CN1036405C (zh) 1997-11-12
MX173238B (es) 1994-02-10
CN1052139A (zh) 1991-06-12
CA2026335C (en) 2001-07-17
JPH03243698A (ja) 1991-10-30
CN1072257C (zh) 2001-10-03
JP2749439B2 (ja) 1998-05-13
CN1157849A (zh) 1997-08-27
EP0426512A3 (en) 1991-10-09
EP0426512A2 (de) 1991-05-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: HEBING, N., DIPL.-PHYS., PAT.-ANW., 61231 BAD NAUH