DE69030078T2 - Fertigungsjustierung während Produktherstellung - Google Patents

Fertigungsjustierung während Produktherstellung

Info

Publication number
DE69030078T2
DE69030078T2 DE69030078T DE69030078T DE69030078T2 DE 69030078 T2 DE69030078 T2 DE 69030078T2 DE 69030078 T DE69030078 T DE 69030078T DE 69030078 T DE69030078 T DE 69030078T DE 69030078 T2 DE69030078 T2 DE 69030078T2
Authority
DE
Germany
Prior art keywords
manufacturing
during product
adjustment during
product manufacturing
manufacturing adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69030078T
Other languages
English (en)
Other versions
DE69030078D1 (de
Inventor
Kevin David Cummings
Robert Charles Frye
Edward Alois Rietman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Publication of DE69030078D1 publication Critical patent/DE69030078D1/de
Application granted granted Critical
Publication of DE69030078T2 publication Critical patent/DE69030078T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/06—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons
    • G06N3/063—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/06—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons
    • G06N3/063—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
    • G06N3/065—Analogue means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31769—Proximity effect correction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S706/00—Data processing: artificial intelligence
    • Y10S706/902—Application using ai with detail of the ai system
    • Y10S706/903—Control
    • Y10S706/904—Manufacturing or machine, e.g. agricultural machinery, machine tool
DE69030078T 1990-02-22 1990-12-05 Fertigungsjustierung während Produktherstellung Expired - Fee Related DE69030078T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48353090A 1990-02-22 1990-02-22

Publications (2)

Publication Number Publication Date
DE69030078D1 DE69030078D1 (de) 1997-04-10
DE69030078T2 true DE69030078T2 (de) 1997-08-07

Family

ID=23920430

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69030078T Expired - Fee Related DE69030078T2 (de) 1990-02-22 1990-12-05 Fertigungsjustierung während Produktherstellung

Country Status (4)

Country Link
US (1) US5283746A (de)
EP (1) EP0443249B1 (de)
JP (1) JP2959858B2 (de)
DE (1) DE69030078T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19940775A1 (de) * 1999-08-27 2001-03-01 Siemens Ag Verfahren und Vorrichtung zur Bestimmung der Qualität einer Verbindung zwischen Lichtwellenleitern

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0602855A1 (de) * 1992-12-14 1994-06-22 AT&T Corp. Kontrolle der technischen Eigenschaften einer Halbleiter-Scheibe mittels eines aktiven neuronalen Netzes in einem Plasma-Ätz-Prozess
DE4338615B4 (de) * 1993-11-11 2005-10-13 Siemens Ag Verfahren und Vorrichtung zur Führung eines Prozesses in einem geregelten System
DE4415811A1 (de) * 1994-05-05 1995-11-09 Thomson Brandt Gmbh Verfahren zum Entzerren von verzerrten Datensignalen
US5656399A (en) * 1996-01-22 1997-08-12 Lucent Technologies Inc. Process for making an x-ray mask
US5731986A (en) * 1996-05-06 1998-03-24 Winbond Electronics Corporation Method of downsizing graphic data of a mask pattern stored in a hierarchical graphic database
NL1010311C2 (nl) * 1998-06-16 1999-12-20 Dirk Ernest Maria Van Dyck Werkwijze en inrichting voor het corrigeren van nabijheidseffecten.
JP2003502771A (ja) 1999-06-22 2003-01-21 ブルックス オートメーション インコーポレイテッド マイクロエレクトロニクス製作に使用するラントゥーラン制御器
US6373071B1 (en) * 1999-06-30 2002-04-16 Applied Materials, Inc. Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography
KR100375559B1 (ko) * 2001-07-03 2003-03-10 삼성전자주식회사 공정장치의 제어방법
JP2003100603A (ja) * 2001-09-25 2003-04-04 Canon Inc 露光装置及びその制御方法並びにデバイスの製造方法
US7336849B2 (en) * 2004-05-13 2008-02-26 Destiny Technology Corporation Exposure correction method for digital images
JP4193760B2 (ja) * 2004-06-29 2008-12-10 日本電気株式会社 画像パターン補正方法、及びそれを適用した模擬画像生成方法、並びにパターン外観検査方法
JP2008122929A (ja) * 2006-10-20 2008-05-29 Toshiba Corp シミュレーションモデルの作成方法
KR20180136202A (ko) * 2017-06-14 2018-12-24 에스케이하이닉스 주식회사 컨볼루션 신경망 및 컨볼루션 신경망을 가진 신경망 시스템

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4479241A (en) * 1981-08-06 1984-10-23 Buckley Bruce S Self-organizing circuits for automatic pattern recognition and the like and systems embodying the same
US4989256A (en) * 1981-08-06 1991-01-29 Buckley Bruce S Self-organizing circuits
US4477729A (en) * 1982-10-01 1984-10-16 International Business Machines Corporation Continuously writing electron beam stitched pattern exposure system
US4858147A (en) * 1987-06-15 1989-08-15 Unisys Corporation Special purpose neurocomputer system for solving optimization problems
US4933872A (en) * 1988-11-15 1990-06-12 Eastman Kodak Company Method and system for wavefront reconstruction
US4912655A (en) * 1988-12-14 1990-03-27 Gte Laboratories Incorporated Adjusting neural networks
US4941122A (en) * 1989-01-12 1990-07-10 Recognition Equipment Incorp. Neural network image processing system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19940775A1 (de) * 1999-08-27 2001-03-01 Siemens Ag Verfahren und Vorrichtung zur Bestimmung der Qualität einer Verbindung zwischen Lichtwellenleitern

Also Published As

Publication number Publication date
EP0443249A2 (de) 1991-08-28
DE69030078D1 (de) 1997-04-10
EP0443249B1 (de) 1997-03-05
EP0443249A3 (en) 1992-02-26
JPH0697057A (ja) 1994-04-08
US5283746A (en) 1994-02-01
JP2959858B2 (ja) 1999-10-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee