DE69024557D1 - Lichtempfindliche Beschichtungslösung - Google Patents

Lichtempfindliche Beschichtungslösung

Info

Publication number
DE69024557D1
DE69024557D1 DE69024557T DE69024557T DE69024557D1 DE 69024557 D1 DE69024557 D1 DE 69024557D1 DE 69024557 T DE69024557 T DE 69024557T DE 69024557 T DE69024557 T DE 69024557T DE 69024557 D1 DE69024557 D1 DE 69024557D1
Authority
DE
Germany
Prior art keywords
coating solution
photosensitive coating
photosensitive
solution
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024557T
Other languages
English (en)
Other versions
DE69024557T2 (de
Inventor
Yutaka Adachi
Koji Fukazawa
Kunitaka Naito
Masaaki Tsuchiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp, Konica Minolta Inc filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE69024557D1 publication Critical patent/DE69024557D1/de
Publication of DE69024557T2 publication Critical patent/DE69024557T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE1990624557 1989-08-07 1990-08-07 Lichtempfindliche Beschichtungslösung Expired - Fee Related DE69024557T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP20293189 1989-08-07
JP9187890A JPH03170931A (ja) 1989-08-07 1990-04-06 感光性塗布液

Publications (2)

Publication Number Publication Date
DE69024557D1 true DE69024557D1 (de) 1996-02-15
DE69024557T2 DE69024557T2 (de) 1996-06-13

Family

ID=26433305

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990624557 Expired - Fee Related DE69024557T2 (de) 1989-08-07 1990-08-07 Lichtempfindliche Beschichtungslösung

Country Status (4)

Country Link
EP (1) EP0412765B1 (de)
JP (1) JPH03170931A (de)
CA (1) CA2022562A1 (de)
DE (1) DE69024557T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3938788A1 (de) * 1989-11-23 1991-05-29 Hoechst Ag Verfahren zur herstellung einer negativ arbeitenden lichtempfindlichen druckform
EP0843218B1 (de) * 1996-11-14 2008-01-16 FUJIFILM Corporation Photoempfindliche Zusammensetzung
EP1314552B1 (de) * 1998-04-06 2009-08-05 FUJIFILM Corporation Photoempfindliche Harzzusammensetzung
EP1235106B1 (de) * 2001-02-08 2011-12-07 FUJIFILM Corporation Vorläufer für eine lithographische Druckplatte
KR100877824B1 (ko) 2005-11-11 2009-01-12 한국생명공학연구원 Ｅ2ｅｐｆ ｕｃｐ-ｖｈｌ 상호작용 및 그 용도
TWI521300B (zh) * 2008-11-18 2016-02-11 Sumitomo Chemical Co Photosensitive resin composition and display device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
JPH06105351B2 (ja) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 感光性組成物

Also Published As

Publication number Publication date
JPH03170931A (ja) 1991-07-24
EP0412765A1 (de) 1991-02-13
DE69024557T2 (de) 1996-06-13
CA2022562A1 (en) 1991-02-08
EP0412765B1 (de) 1996-01-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUBISHI CHEMICAL CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee