DE69022016D1 - Fluoriniertes copolymer und verfahren zu seiner herstellung. - Google Patents

Fluoriniertes copolymer und verfahren zu seiner herstellung.

Info

Publication number
DE69022016D1
DE69022016D1 DE69022016T DE69022016T DE69022016D1 DE 69022016 D1 DE69022016 D1 DE 69022016D1 DE 69022016 T DE69022016 T DE 69022016T DE 69022016 T DE69022016 T DE 69022016T DE 69022016 D1 DE69022016 D1 DE 69022016D1
Authority
DE
Germany
Prior art keywords
production
fluorinated copolymer
fluorinated
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69022016T
Other languages
English (en)
Other versions
DE69022016T2 (de
Inventor
Motonobu Kubo
Hiroshi Inukai
Takahiro Kitahara
Kayoko - - - Sugioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Publication of DE69022016D1 publication Critical patent/DE69022016D1/de
Application granted granted Critical
Publication of DE69022016T2 publication Critical patent/DE69022016T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18—Monomers containing fluorine
    • C08F214/186—Monomers containing fluorine with non-fluorinated comonomers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69022016T 1989-07-07 1990-07-06 Fluoriniertes copolymer und verfahren zu seiner herstellung. Expired - Fee Related DE69022016T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP17676989 1989-07-07
JP17234690 1990-06-28
PCT/JP1990/000870 WO1991000880A1 (fr) 1989-07-07 1990-07-06 Copolymere fluore et son procede de production

Publications (2)

Publication Number Publication Date
DE69022016D1 true DE69022016D1 (de) 1995-10-05
DE69022016T2 DE69022016T2 (de) 1996-04-25

Family

ID=26494731

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69022016T Expired - Fee Related DE69022016T2 (de) 1989-07-07 1990-07-06 Fluoriniertes copolymer und verfahren zu seiner herstellung.

Country Status (4)

Country Link
US (1) US5177166A (de)
EP (1) EP0437619B1 (de)
DE (1) DE69022016T2 (de)
WO (1) WO1991000880A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4440201A1 (de) * 1994-11-10 1996-05-15 Bayer Ag Reaktive und verarbeitbare Fluorpolymere, ein Verfahren zu deren Herstellung, ein Verfahren zur Herstellung von vernetzten, bepfropften oder modifizierten Fluorpolymeren unter Einsatz der reaktiven und verarbeitbaren Fluorpolymere und deren Verwendung
US5962612A (en) * 1996-11-28 1999-10-05 Asahi Glass Company Ltd. Fluorine-containing copolymer having rings on its main chain
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
EP1131677B1 (de) 1998-09-23 2005-08-03 E.I. Dupont De Nemours And Company Photoresists, polymere und verfahren für die mikrolithographie
US6790587B1 (en) 1999-05-04 2004-09-14 E. I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
WO2001037047A2 (en) 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography
US6951705B2 (en) 2000-05-05 2005-10-04 E. I. Du Pont De Nemours And Company Polymers for photoresist compositions for microlithography
US6974657B2 (en) * 2000-10-18 2005-12-13 E. I. Du Pont De Nemours And Company Compositions for microlithography
US7045268B2 (en) * 2000-11-29 2006-05-16 E.I. Du Pont De Nemours And Company Polymers blends and their use in photoresist compositions for microlithography
DE10104267B4 (de) * 2001-01-30 2006-04-06 Infineon Technologies Ag Elektronisches Bauteil mit mindestens einer Isolationslage
KR20040018342A (ko) * 2001-03-30 2004-03-03 이 아이 듀폰 디 네모아 앤드 캄파니 미세석판인쇄를 위한 폴리시클릭 불소-함유 중합체 및포토레지스트
EP1246013A3 (de) * 2001-03-30 2003-11-19 E.I. Du Pont De Nemours And Company Photoresists, Polymere und Verfahren für die Mikrolithographie
KR100873251B1 (ko) * 2001-07-12 2008-12-11 다이킨 고교 가부시키가이샤 불소 함유 노르보르넨 유도체의 제조 방법
US20040013971A1 (en) * 2001-11-21 2004-01-22 Berger Larry L Antireflective layer for use in microlithography
US20040092686A1 (en) * 2002-03-27 2004-05-13 Feiring Andrew E Polycyclic fluorine-containing polymers and photoresists for microlithography
AU2003259729A1 (en) * 2002-08-09 2004-03-29 E. I. Du Pont De Nemours And Company Photoresists, fluoropolymers and processes for 157 nm microlithography
AU2003259727A1 (en) * 2002-08-09 2004-02-25 E. I. Du Pont De Nemours And Company Photoresists, fluorinated polymers and processes for 157 nm microlithography
JP5475761B2 (ja) * 2008-06-20 2014-04-16 スリーエム イノベイティブ プロパティズ カンパニー ポリマー鋳型
US9370876B2 (en) * 2008-06-20 2016-06-21 3M Innovative Properties Company Molded microstructured articles and method of making same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61115916A (ja) * 1984-11-12 1986-06-03 Mitsui Petrochem Ind Ltd 新重合体
JPS6229191A (ja) * 1985-07-30 1987-02-07 三井化学株式会社 高周波電気回路基板
JPS63210114A (ja) * 1987-02-26 1988-08-31 Mitsui Petrochem Ind Ltd 酸素透過体
JPH06229191A (ja) * 1993-02-02 1994-08-16 Sumitomo Metal Ind Ltd 非開削掘進機

Also Published As

Publication number Publication date
WO1991000880A1 (fr) 1991-01-24
EP0437619A4 (en) 1991-12-04
DE69022016T2 (de) 1996-04-25
EP0437619B1 (de) 1995-08-30
US5177166A (en) 1993-01-05
EP0437619A1 (de) 1991-07-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee