DE69022016D1 - Fluoriniertes copolymer und verfahren zu seiner herstellung. - Google Patents
Fluoriniertes copolymer und verfahren zu seiner herstellung.Info
- Publication number
- DE69022016D1 DE69022016D1 DE69022016T DE69022016T DE69022016D1 DE 69022016 D1 DE69022016 D1 DE 69022016D1 DE 69022016 T DE69022016 T DE 69022016T DE 69022016 T DE69022016 T DE 69022016T DE 69022016 D1 DE69022016 D1 DE 69022016D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- fluorinated copolymer
- fluorinated
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/186—Monomers containing fluorine with non-fluorinated comonomers
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17676989 | 1989-07-07 | ||
JP17234690 | 1990-06-28 | ||
PCT/JP1990/000870 WO1991000880A1 (en) | 1989-07-07 | 1990-07-06 | Fluorinated copolymer and method of producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69022016D1 true DE69022016D1 (de) | 1995-10-05 |
DE69022016T2 DE69022016T2 (de) | 1996-04-25 |
Family
ID=26494731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69022016T Expired - Fee Related DE69022016T2 (de) | 1989-07-07 | 1990-07-06 | Fluoriniertes copolymer und verfahren zu seiner herstellung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5177166A (de) |
EP (1) | EP0437619B1 (de) |
DE (1) | DE69022016T2 (de) |
WO (1) | WO1991000880A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4440201A1 (de) * | 1994-11-10 | 1996-05-15 | Bayer Ag | Reaktive und verarbeitbare Fluorpolymere, ein Verfahren zu deren Herstellung, ein Verfahren zur Herstellung von vernetzten, bepfropften oder modifizierten Fluorpolymeren unter Einsatz der reaktiven und verarbeitbaren Fluorpolymere und deren Verwendung |
US5962612A (en) * | 1996-11-28 | 1999-10-05 | Asahi Glass Company Ltd. | Fluorine-containing copolymer having rings on its main chain |
WO2000017712A1 (en) * | 1998-09-23 | 2000-03-30 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
US6790587B1 (en) | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
JP2004500596A (ja) | 1999-11-17 | 2004-01-08 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | ニトリル/フルオロアルコールポリマー含有フォトレジストおよび関連するミクロリソグラフィのための方法 |
US6951705B2 (en) | 2000-05-05 | 2005-10-04 | E. I. Du Pont De Nemours And Company | Polymers for photoresist compositions for microlithography |
US6974657B2 (en) * | 2000-10-18 | 2005-12-13 | E. I. Du Pont De Nemours And Company | Compositions for microlithography |
CN1498360A (zh) * | 2000-11-29 | 2004-05-19 | 纳幕尔杜邦公司 | 聚合物掺混物及其在用于微细光刻的光刻胶组合物中的应用 |
DE10104267B4 (de) * | 2001-01-30 | 2006-04-06 | Infineon Technologies Ag | Elektronisches Bauteil mit mindestens einer Isolationslage |
IL157040A0 (en) * | 2001-03-30 | 2004-02-08 | Du Pont | Polycyclic fluorine-containing polymers and photoresists for microlithography |
EP1246013A3 (de) * | 2001-03-30 | 2003-11-19 | E.I. Du Pont De Nemours And Company | Photoresists, Polymere und Verfahren für die Mikrolithographie |
KR100873251B1 (ko) * | 2001-07-12 | 2008-12-11 | 다이킨 고교 가부시키가이샤 | 불소 함유 노르보르넨 유도체의 제조 방법 |
US20040013971A1 (en) * | 2001-11-21 | 2004-01-22 | Berger Larry L | Antireflective layer for use in microlithography |
US20040092686A1 (en) * | 2002-03-27 | 2004-05-13 | Feiring Andrew E | Polycyclic fluorine-containing polymers and photoresists for microlithography |
AU2003259729A1 (en) * | 2002-08-09 | 2004-03-29 | E. I. Du Pont De Nemours And Company | Photoresists, fluoropolymers and processes for 157 nm microlithography |
US7264914B2 (en) * | 2002-08-09 | 2007-09-04 | E. I. Du Pont De Nemours And Company | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography |
KR20110033920A (ko) * | 2008-06-20 | 2011-04-01 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 중합체 주형 및 그로부터 제조된 용품 |
WO2009154849A1 (en) * | 2008-06-20 | 2009-12-23 | 3M Innovative Properties Company | Molded microstructured articles and method of making same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61115916A (ja) * | 1984-11-12 | 1986-06-03 | Mitsui Petrochem Ind Ltd | 新重合体 |
JPS6229191A (ja) * | 1985-07-30 | 1987-02-07 | 三井化学株式会社 | 高周波電気回路基板 |
JPS63210114A (ja) * | 1987-02-26 | 1988-08-31 | Mitsui Petrochem Ind Ltd | 酸素透過体 |
JPH06229191A (ja) * | 1993-02-02 | 1994-08-16 | Sumitomo Metal Ind Ltd | 非開削掘進機 |
-
1990
- 1990-07-06 WO PCT/JP1990/000870 patent/WO1991000880A1/ja active IP Right Grant
- 1990-07-06 US US07/651,386 patent/US5177166A/en not_active Expired - Lifetime
- 1990-07-06 EP EP90910179A patent/EP0437619B1/de not_active Expired - Lifetime
- 1990-07-06 DE DE69022016T patent/DE69022016T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO1991000880A1 (en) | 1991-01-24 |
US5177166A (en) | 1993-01-05 |
EP0437619A4 (en) | 1991-12-04 |
DE69022016T2 (de) | 1996-04-25 |
EP0437619B1 (de) | 1995-08-30 |
EP0437619A1 (de) | 1991-07-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |