DE68927767T2 - Bilderzeugungsverfahren - Google Patents

Bilderzeugungsverfahren

Info

Publication number
DE68927767T2
DE68927767T2 DE68927767T DE68927767T DE68927767T2 DE 68927767 T2 DE68927767 T2 DE 68927767T2 DE 68927767 T DE68927767 T DE 68927767T DE 68927767 T DE68927767 T DE 68927767T DE 68927767 T2 DE68927767 T2 DE 68927767T2
Authority
DE
Germany
Prior art keywords
imaging processes
imaging
processes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68927767T
Other languages
English (en)
Other versions
DE68927767D1 (de
Inventor
Nobumasa Sasa
Kunio Shimizu
Manabu Watanabe
Toshiyuki Urano
Shinya Mayama
Tetsuya Masuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Mitsubishi Chemical Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp, Konica Minolta Inc filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE68927767D1 publication Critical patent/DE68927767D1/de
Publication of DE68927767T2 publication Critical patent/DE68927767T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
DE68927767T 1988-11-15 1989-11-13 Bilderzeugungsverfahren Expired - Fee Related DE68927767T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28845788 1988-11-15
JP32871688 1988-12-26

Publications (2)

Publication Number Publication Date
DE68927767D1 DE68927767D1 (de) 1997-03-27
DE68927767T2 true DE68927767T2 (de) 1997-06-26

Family

ID=26557187

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927767T Expired - Fee Related DE68927767T2 (de) 1988-11-15 1989-11-13 Bilderzeugungsverfahren

Country Status (4)

Country Link
US (1) US4985337A (de)
EP (1) EP0369379B1 (de)
CA (1) CA2002950A1 (de)
DE (1) DE68927767T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69130003T2 (de) * 1990-05-25 1999-02-11 Mitsubishi Chem Corp Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters
US5609985A (en) * 1993-09-22 1997-03-11 Konica Corporation Color image-formable material and process for preparing the same
US6468712B1 (en) 2000-02-25 2002-10-22 Massachusetts Institute Of Technology Resist materials for 157-nm lithography
EP1275666A4 (de) * 2000-04-04 2007-10-24 Daikin Ind Ltd Neues fluorpolymer mit säureaktiver gruppe und chemisch verstärkte photoresistzusammensetzungen die dieses enthalten
IN2014MU00683A (de) * 2014-02-26 2015-09-25 M S Can Image Media Tech

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2095515A5 (de) * 1970-06-02 1972-02-11 Agfa Gevaert Nv
US3775113A (en) * 1972-02-09 1973-11-27 Minnesota Mining & Mfg Positive image transfer
DE2236941C3 (de) * 1972-07-27 1982-03-25 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
DE2941960A1 (de) * 1979-10-17 1981-04-30 Hoechst Ag, 6000 Frankfurt Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten
GB2075700A (en) * 1980-04-17 1981-11-18 Bicc Ltd Lithographic printing plates and light-sensitive compositions for use in them
JPS5997140A (ja) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd カラ−プル−フイングシ−トの製法
US4592946A (en) * 1983-08-22 1986-06-03 Dennison Manufacturing Company Thermal ink transfer recording
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4619952A (en) * 1984-08-02 1986-10-28 Ppg Industries, Inc. Resinous blends of epoxy and acrylic resins and the use thereof in electrodeposition
US4638020A (en) * 1984-11-23 1987-01-20 Ppg Industries, Inc. Aqueous composition comprising a phosphated epoxy and non-self dispersible resin
JPS61203449A (ja) * 1985-03-06 1986-09-09 Somar Corp 感光性組成物
JPS62247349A (ja) * 1986-04-21 1987-10-28 Konika Corp 着色画像形成材料および画像形成方法
US4741791A (en) * 1986-07-18 1988-05-03 Bemis Associates Inc. Flocked transfer material and method of making heat-transferable indicia therefrom

Also Published As

Publication number Publication date
EP0369379B1 (de) 1997-02-12
EP0369379A3 (de) 1991-06-05
CA2002950A1 (en) 1990-05-15
EP0369379A2 (de) 1990-05-23
US4985337A (en) 1991-01-15
DE68927767D1 (de) 1997-03-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONICA CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee