DE68919671T2 - Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung. - Google Patents

Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung.

Info

Publication number
DE68919671T2
DE68919671T2 DE68919671T DE68919671T DE68919671T2 DE 68919671 T2 DE68919671 T2 DE 68919671T2 DE 68919671 T DE68919671 T DE 68919671T DE 68919671 T DE68919671 T DE 68919671T DE 68919671 T2 DE68919671 T2 DE 68919671T2
Authority
DE
Germany
Prior art keywords
sec
voltage
anode
grid
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68919671T
Other languages
English (en)
Other versions
DE68919671D1 (de
Inventor
Francesco Lama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Braink AG
Original Assignee
Braink AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH19989A external-priority patent/CH676167A5/it
Priority claimed from CH384689A external-priority patent/CH676766A5/it
Application filed by Braink AG filed Critical Braink AG
Application granted granted Critical
Publication of DE68919671D1 publication Critical patent/DE68919671D1/de
Publication of DE68919671T2 publication Critical patent/DE68919671T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Particle Accelerators (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
DE68919671T 1989-01-24 1989-12-28 Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung. Expired - Fee Related DE68919671T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19989A CH676167A5 (en) 1989-01-24 1989-01-24 Cold cathode low generating and accelerating device
CH384689A CH676766A5 (en) 1989-10-25 1989-10-25 Cold cathode low generating and accelerating device

Publications (2)

Publication Number Publication Date
DE68919671D1 DE68919671D1 (de) 1995-01-12
DE68919671T2 true DE68919671T2 (de) 1995-04-06

Family

ID=25683852

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68919671T Expired - Fee Related DE68919671T2 (de) 1989-01-24 1989-12-28 Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung.

Country Status (5)

Country Link
US (1) US5130607A (de)
EP (1) EP0378970B1 (de)
AT (1) ATE114870T1 (de)
DE (1) DE68919671T2 (de)
ES (1) ES2064486T3 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007051444B4 (de) * 2007-10-25 2012-11-08 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Trockenätzen von kontinuierlich bewegten Materialien

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969470A (en) * 1996-11-08 1999-10-19 Veeco Instruments, Inc. Charged particle source
DE19654604A1 (de) * 1996-12-20 1998-07-02 Gregor Wartig Zellaktivator
US6359388B1 (en) 2000-08-28 2002-03-19 Guardian Industries Corp. Cold cathode ion beam deposition apparatus with segregated gas flow
US6988463B2 (en) * 2002-10-18 2006-01-24 Guardian Industries Corp. Ion beam source with gas introduced directly into deposition/vacuum chamber
US6812648B2 (en) 2002-10-21 2004-11-02 Guardian Industries Corp. Method of cleaning ion source, and corresponding apparatus/system
US8129910B2 (en) * 2009-06-23 2012-03-06 L-3 Communications Corporation Magnetically insulated cold-cathode electron gun
US8575565B2 (en) 2011-10-10 2013-11-05 Guardian Industries Corp. Ion source apparatus and methods of using the same
CN110775999B (zh) * 2019-11-29 2023-12-01 云南锡业锡化工材料有限责任公司 一种生产低铁二氧化锡的设备及其工艺

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955118A (en) * 1975-02-19 1976-05-04 Western Electric Company, Inc. Cold-cathode ion source
US4262056A (en) * 1978-09-15 1981-04-14 The United States Of America As Represented By The Secretary Of The Navy Ion-implanted multilayer optical interference filter
US4475063A (en) * 1981-06-22 1984-10-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Hollow cathode apparatus
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
US4690744A (en) * 1983-07-20 1987-09-01 Konishiroku Photo Industry Co., Ltd. Method of ion beam generation and an apparatus based on such method
US4710283A (en) * 1984-01-30 1987-12-01 Denton Vacuum Inc. Cold cathode ion beam source
NL8400344A (nl) * 1984-02-03 1985-09-02 Inst Fiz Tverdogo Tela Akademi Hoogfrequente bron van ionen van moeilijk smeltbare stoffen.
US4652795A (en) * 1985-03-14 1987-03-24 Denton Vacuum Inc. External plasma gun
WO1986006922A1 (en) * 1985-05-09 1986-11-20 The Commonwealth Of Australia Plasma generator
US4716340A (en) * 1985-12-10 1987-12-29 Denton Vacuum Inc Pre-ionization aided sputter gun
US4774437A (en) * 1986-02-28 1988-09-27 Varian Associates, Inc. Inverted re-entrant magnetron ion source
US4707637A (en) * 1986-03-24 1987-11-17 Hughes Aircraft Company Plasma-anode electron gun
US4737688A (en) * 1986-07-22 1988-04-12 Applied Electron Corporation Wide area source of multiply ionized atomic or molecular species
JP2537210B2 (ja) * 1986-09-18 1996-09-25 株式会社東芝 高密度プラズマの発生装置
US4733631B1 (en) * 1986-09-30 1993-03-09 Apparatus for coating substrate devices
US4808291A (en) * 1987-09-09 1989-02-28 Denton Vacuum Inc. Apparatus for coating compact disks
JPH01132033A (ja) * 1987-11-17 1989-05-24 Hitachi Ltd イオン源及び薄膜形成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007051444B4 (de) * 2007-10-25 2012-11-08 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Trockenätzen von kontinuierlich bewegten Materialien

Also Published As

Publication number Publication date
US5130607A (en) 1992-07-14
DE68919671D1 (de) 1995-01-12
EP0378970A2 (de) 1990-07-25
EP0378970B1 (de) 1994-11-30
EP0378970A3 (de) 1991-01-02
ES2064486T3 (es) 1995-02-01
ATE114870T1 (de) 1994-12-15

Similar Documents

Publication Publication Date Title
EP0300105A3 (de) Elektrostatischer Ionenbeschleuniger
JPS5568056A (en) X-ray tube
GB1211618A (en) Charged particle beam fabrication of microelectronic circuit patterns
WO1989004586A3 (en) Method and apparatus for generating particle beams
DE68919671D1 (de) Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung.
JPS5632655A (en) Electron beam device
JPS5516321A (en) Electrostatic radiant type electronic gun
JPS6410563A (en) Electric charging suppressor of ion implanter
GB982669A (en) Improvements in or relating to electron beam generators
JPS56156662A (en) Device for ion implantation
JPS53102677A (en) Ion beam radiating unit
CA2129403A1 (en) Ion Implanting Apparatus and Ion Implanting Method
JPS5698827A (en) Electron beam exposure device
KR950034512A (ko) 이온주입장치
GB935197A (en) Glow discharge pump apparatus
JPS5360178A (en) Target for focusing of electron beam
JPS6452064A (en) Film forming device
JPS5642946A (en) Scanning type electron microscope device
JPS5292473A (en) Main lens electric field forming method of inline type 3 beam electron gun
GB928168A (en) Improvements in or relating to mass filters including an electron impact source of ions
JPS56169771A (en) Device for preparing thin film by using ion beam
JPS5713178A (en) Method and device for surface treatment
SE9203508L (sv) Foerfarande foer styrning av en elektronstraale i en elektronaccelerator samt en elektronaccelertor
JPS52107897A (en) Ion microanalyzer equipped with primary ion beam separator
JPS6433842A (en) Ion implanter

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee