ATE114870T1 - Universelle kaltkathoden-ionenerzeugungs- und - beschleunigungsvorrichtung. - Google Patents

Universelle kaltkathoden-ionenerzeugungs- und - beschleunigungsvorrichtung.

Info

Publication number
ATE114870T1
ATE114870T1 AT89810989T AT89810989T ATE114870T1 AT E114870 T1 ATE114870 T1 AT E114870T1 AT 89810989 T AT89810989 T AT 89810989T AT 89810989 T AT89810989 T AT 89810989T AT E114870 T1 ATE114870 T1 AT E114870T1
Authority
AT
Austria
Prior art keywords
sec
voltage
anode
grid
low
Prior art date
Application number
AT89810989T
Other languages
English (en)
Inventor
Francesco Lama
Original Assignee
Braink Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH19989A external-priority patent/CH676167A5/it
Priority claimed from CH384689A external-priority patent/CH676766A5/it
Application filed by Braink Ag filed Critical Braink Ag
Application granted granted Critical
Publication of ATE114870T1 publication Critical patent/ATE114870T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Particle Accelerators (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
AT89810989T 1989-01-24 1989-12-28 Universelle kaltkathoden-ionenerzeugungs- und - beschleunigungsvorrichtung. ATE114870T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19989A CH676167A5 (en) 1989-01-24 1989-01-24 Cold cathode low generating and accelerating device
CH384689A CH676766A5 (en) 1989-10-25 1989-10-25 Cold cathode low generating and accelerating device

Publications (1)

Publication Number Publication Date
ATE114870T1 true ATE114870T1 (de) 1994-12-15

Family

ID=25683852

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89810989T ATE114870T1 (de) 1989-01-24 1989-12-28 Universelle kaltkathoden-ionenerzeugungs- und - beschleunigungsvorrichtung.

Country Status (5)

Country Link
US (1) US5130607A (de)
EP (1) EP0378970B1 (de)
AT (1) ATE114870T1 (de)
DE (1) DE68919671T2 (de)
ES (1) ES2064486T3 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969470A (en) * 1996-11-08 1999-10-19 Veeco Instruments, Inc. Charged particle source
DE19654604A1 (de) * 1996-12-20 1998-07-02 Gregor Wartig Zellaktivator
US6359388B1 (en) 2000-08-28 2002-03-19 Guardian Industries Corp. Cold cathode ion beam deposition apparatus with segregated gas flow
US6988463B2 (en) * 2002-10-18 2006-01-24 Guardian Industries Corp. Ion beam source with gas introduced directly into deposition/vacuum chamber
US6812648B2 (en) 2002-10-21 2004-11-02 Guardian Industries Corp. Method of cleaning ion source, and corresponding apparatus/system
DE102007051444B4 (de) * 2007-10-25 2012-11-08 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Trockenätzen von kontinuierlich bewegten Materialien
US8129910B2 (en) * 2009-06-23 2012-03-06 L-3 Communications Corporation Magnetically insulated cold-cathode electron gun
US8575565B2 (en) 2011-10-10 2013-11-05 Guardian Industries Corp. Ion source apparatus and methods of using the same
CN110775999B (zh) * 2019-11-29 2023-12-01 云南锡业锡化工材料有限责任公司 一种生产低铁二氧化锡的设备及其工艺

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955118A (en) * 1975-02-19 1976-05-04 Western Electric Company, Inc. Cold-cathode ion source
US4262056A (en) * 1978-09-15 1981-04-14 The United States Of America As Represented By The Secretary Of The Navy Ion-implanted multilayer optical interference filter
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
US4475063A (en) * 1981-06-22 1984-10-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Hollow cathode apparatus
US4690744A (en) * 1983-07-20 1987-09-01 Konishiroku Photo Industry Co., Ltd. Method of ion beam generation and an apparatus based on such method
US4710283A (en) * 1984-01-30 1987-12-01 Denton Vacuum Inc. Cold cathode ion beam source
NL8400344A (nl) * 1984-02-03 1985-09-02 Inst Fiz Tverdogo Tela Akademi Hoogfrequente bron van ionen van moeilijk smeltbare stoffen.
US4652795A (en) * 1985-03-14 1987-03-24 Denton Vacuum Inc. External plasma gun
US4739170A (en) * 1985-05-09 1988-04-19 The Commonwealth Of Australia Plasma generator
US4716340A (en) * 1985-12-10 1987-12-29 Denton Vacuum Inc Pre-ionization aided sputter gun
US4774437A (en) * 1986-02-28 1988-09-27 Varian Associates, Inc. Inverted re-entrant magnetron ion source
US4707637A (en) * 1986-03-24 1987-11-17 Hughes Aircraft Company Plasma-anode electron gun
US4737688A (en) * 1986-07-22 1988-04-12 Applied Electron Corporation Wide area source of multiply ionized atomic or molecular species
JP2537210B2 (ja) * 1986-09-18 1996-09-25 株式会社東芝 高密度プラズマの発生装置
US4733631B1 (en) * 1986-09-30 1993-03-09 Apparatus for coating substrate devices
US4808291A (en) * 1987-09-09 1989-02-28 Denton Vacuum Inc. Apparatus for coating compact disks
JPH01132033A (ja) * 1987-11-17 1989-05-24 Hitachi Ltd イオン源及び薄膜形成装置

Also Published As

Publication number Publication date
ES2064486T3 (es) 1995-02-01
DE68919671T2 (de) 1995-04-06
DE68919671D1 (de) 1995-01-12
EP0378970A2 (de) 1990-07-25
EP0378970A3 (de) 1991-01-02
EP0378970B1 (de) 1994-11-30
US5130607A (en) 1992-07-14

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee