DE68919179T2 - Einrichtung zur Regelung der Lichtmenge. - Google Patents

Einrichtung zur Regelung der Lichtmenge.

Info

Publication number
DE68919179T2
DE68919179T2 DE68919179T DE68919179T DE68919179T2 DE 68919179 T2 DE68919179 T2 DE 68919179T2 DE 68919179 T DE68919179 T DE 68919179T DE 68919179 T DE68919179 T DE 68919179T DE 68919179 T2 DE68919179 T2 DE 68919179T2
Authority
DE
Germany
Prior art keywords
regulating
light
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68919179T
Other languages
English (en)
Other versions
DE68919179D1 (de
Inventor
Naoto Abe
Koji Uda
Isamu Shimoda
Shunichi Uzawa
Noriyuki Nose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68919179D1 publication Critical patent/DE68919179D1/de
Publication of DE68919179T2 publication Critical patent/DE68919179T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068—Stabilisation of laser output parameters
    • H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/06835—Stabilising during pulse modulation or generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/06216—Pulse modulation or generation
DE68919179T 1988-09-02 1989-08-31 Einrichtung zur Regelung der Lichtmenge. Expired - Fee Related DE68919179T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63218523A JPH0267903A (ja) 1988-09-02 1988-09-02 光量調節装置

Publications (2)

Publication Number Publication Date
DE68919179D1 DE68919179D1 (de) 1994-12-08
DE68919179T2 true DE68919179T2 (de) 1995-03-30

Family

ID=16721267

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68919179T Expired - Fee Related DE68919179T2 (de) 1988-09-02 1989-08-31 Einrichtung zur Regelung der Lichtmenge.

Country Status (4)

Country Link
US (1) US5459573A (de)
EP (1) EP0357426B1 (de)
JP (1) JPH0267903A (de)
DE (1) DE68919179T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063196A (en) * 1998-10-30 2000-05-16 Applied Materials, Inc. Semiconductor processing chamber calibration tool
US7023587B2 (en) * 1999-11-12 2006-04-04 Nikon Corporation Image scanning apparatus, recording medium which stores image scanning programs, and data structure
JP2003304022A (ja) * 2002-04-12 2003-10-24 Sharp Corp 半導体レーザ装置
JP2008045926A (ja) * 2006-08-11 2008-02-28 Omron Corp 光学式変位センサおよびその制御方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1559810A (en) * 1975-11-05 1980-01-30 Nat Res Dev Device for measuring light received from an illuminated material
GB1559511A (en) * 1976-09-14 1980-01-23 Post Office Injection lasers
JPS54143109A (en) * 1978-04-28 1979-11-08 Hitachi Ltd Optical information device
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
JPS57139607A (en) * 1981-02-23 1982-08-28 Hitachi Ltd Position measuring equipment
JPS5882248A (ja) * 1981-11-12 1983-05-17 Canon Inc 自動整合装置
JPS5999721A (ja) * 1982-11-29 1984-06-08 Canon Inc マーク検出装置
FR2538923A1 (fr) * 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
US4634876A (en) * 1983-05-13 1987-01-06 Canon Kabushiki Kaisha Object position detecting apparatus using accumulation type sensor
US4653903A (en) * 1984-01-24 1987-03-31 Canon Kabushiki Kaisha Exposure apparatus
JPS60163110A (ja) * 1984-02-06 1985-08-26 Canon Inc 位置合わせ装置
JPS60216667A (ja) * 1984-04-11 1985-10-30 Sharp Corp 画像読取装置のｃｃｄセンサ出力回路
CA1210070A (en) * 1984-10-26 1986-08-19 Northern Telecom Limited Laser transmitter
US4685775A (en) * 1985-11-15 1987-08-11 Teradyne, Inc. Light beam positioning apparatus
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer
JPS63198387A (ja) * 1987-02-13 1988-08-17 Hitachi Ltd 半導体レ−ザアレイ装置
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH0810124B2 (ja) * 1987-07-03 1996-01-31 株式会社ニコン 露光装置
DE3743363A1 (de) * 1987-12-21 1989-07-06 Zeiss Carl Fa Verfahren und einrichtung zur regelung der emissionslichtmenge in einem optischen tastkopf
JP2546364B2 (ja) * 1988-02-16 1996-10-23 キヤノン株式会社 位置合わせ装置
US5008797A (en) * 1989-12-20 1991-04-16 Sundstrand Corporation Power converter utilizing line replaceable units

Also Published As

Publication number Publication date
US5459573A (en) 1995-10-17
EP0357426A3 (de) 1991-01-23
JPH0267903A (ja) 1990-03-07
EP0357426B1 (de) 1994-11-02
EP0357426A2 (de) 1990-03-07
DE68919179D1 (de) 1994-12-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee