DE68912900T2 - Verfahren und Gerät zur Inspektion von Schichten. - Google Patents

Verfahren und Gerät zur Inspektion von Schichten.

Info

Publication number
DE68912900T2
DE68912900T2 DE1989612900 DE68912900T DE68912900T2 DE 68912900 T2 DE68912900 T2 DE 68912900T2 DE 1989612900 DE1989612900 DE 1989612900 DE 68912900 T DE68912900 T DE 68912900T DE 68912900 T2 DE68912900 T2 DE 68912900T2
Authority
DE
Germany
Prior art keywords
inspecting
layers
inspecting layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989612900
Other languages
English (en)
Other versions
DE68912900D1 (de
Inventor
Shigeki Tateisi Inst Kobayashi
Hideaki Tateisi Inst Takahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP29692888A external-priority patent/JPH02141604A/ja
Priority claimed from JP1038993A external-priority patent/JP2782759B2/ja
Application filed by Omron Tateisi Electronics Co filed Critical Omron Tateisi Electronics Co
Application granted granted Critical
Publication of DE68912900D1 publication Critical patent/DE68912900D1/de
Publication of DE68912900T2 publication Critical patent/DE68912900T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
    • G01N2021/6439—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" with indicators, stains, dyes, tags, labels, marks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G01N2021/95646—Soldering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06193—Secundary in-situ sources, e.g. fluorescent particles
DE1989612900 1988-11-24 1989-11-24 Verfahren und Gerät zur Inspektion von Schichten. Expired - Fee Related DE68912900T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29692888A JPH02141604A (ja) 1988-11-24 1988-11-24 基板検査方法
JP1038993A JP2782759B2 (ja) 1989-02-17 1989-02-17 ハンダ付け外観検査装置

Publications (2)

Publication Number Publication Date
DE68912900D1 DE68912900D1 (de) 1994-03-17
DE68912900T2 true DE68912900T2 (de) 1994-09-15

Family

ID=26378304

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989612900 Expired - Fee Related DE68912900T2 (de) 1988-11-24 1989-11-24 Verfahren und Gerät zur Inspektion von Schichten.

Country Status (2)

Country Link
EP (1) EP0370527B1 (de)
DE (1) DE68912900T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02231510A (ja) * 1989-03-02 1990-09-13 Omron Tateisi Electron Co 基板検査装置
JP3072998B2 (ja) * 1990-04-18 2000-08-07 株式会社日立製作所 はんだ付け状態検査方法及びその装置
NO914574L (no) * 1991-11-22 1993-05-24 Elkem Technology Fremgangsmaate for detektering av pin-hull i strengestoeptemetallemne
EP0871027A3 (de) * 1997-04-07 1999-05-19 Hewlett-Packard Company Prüfung gedruckter Leiterplatten
EP1111375B1 (de) * 1999-12-22 2014-12-17 Novartis AG Prüfeinrichtung für Verpackungen
CN101799325B (zh) * 2010-01-14 2013-11-27 杭州远方光电信息股份有限公司 一种荧光材料激发测量装置
JP6687656B2 (ja) 2018-03-19 2020-04-28 ファナック株式会社 検査装置およびその検査方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180250A (ja) * 1986-02-05 1987-08-07 Omron Tateisi Electronics Co 部品実装基板の検査方法
EP0236738A3 (de) * 1986-02-05 1988-12-21 OMRON Corporation Verfahren zur Dateneingabe einer bestückten gedruckten Referenzleiterplatte für die Bildverarbeitung eines automatischen Prüfgerätes für bestückte gedruckte Leiterplatten
DE68929062T2 (de) * 1988-05-09 2000-03-16 Omron Tateisi Electronics Co Vorrichtung zum Prüfen von Leiterplatten

Also Published As

Publication number Publication date
EP0370527B1 (de) 1994-02-02
DE68912900D1 (de) 1994-03-17
EP0370527A1 (de) 1990-05-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee