DE68912008D1 - Optische Abtastvorrichtung. - Google Patents

Optische Abtastvorrichtung.

Info

Publication number
DE68912008D1
DE68912008D1 DE89201813T DE68912008T DE68912008D1 DE 68912008 D1 DE68912008 D1 DE 68912008D1 DE 89201813 T DE89201813 T DE 89201813T DE 68912008 T DE68912008 T DE 68912008T DE 68912008 D1 DE68912008 D1 DE 68912008D1
Authority
DE
Germany
Prior art keywords
optical scanner
scanner
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE89201813T
Other languages
English (en)
Other versions
DE68912008T2 (de
Inventor
Amstel Willem Dirk Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE68912008D1 publication Critical patent/DE68912008D1/de
Publication of DE68912008T2 publication Critical patent/DE68912008T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Input (AREA)
  • Lenses (AREA)
DE68912008T 1988-07-15 1989-07-10 Optische Abtastvorrichtung. Expired - Fee Related DE68912008T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8801803 1988-07-15

Publications (2)

Publication Number Publication Date
DE68912008D1 true DE68912008D1 (de) 1994-02-17
DE68912008T2 DE68912008T2 (de) 1994-07-21

Family

ID=19852635

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68912008T Expired - Fee Related DE68912008T2 (de) 1988-07-15 1989-07-10 Optische Abtastvorrichtung.

Country Status (4)

Country Link
US (1) US5013108A (de)
EP (1) EP0351011B1 (de)
JP (1) JP2920194B2 (de)
DE (1) DE68912008T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364726A (ja) * 1989-08-02 1991-03-20 Minolta Camera Co Ltd 光ビーム走査光学系
US5111325A (en) * 1989-10-16 1992-05-05 Eastman Kodak Company F-θ lens
JP3157550B2 (ja) * 1991-02-28 2001-04-16 株式会社リコー 等速光走査用結像反射鏡および光走査装置
US5255114A (en) * 1991-11-12 1993-10-19 Eastman Kodak Company High resolution scanner
JP3330248B2 (ja) * 1995-02-20 2002-09-30 松下電器産業株式会社 光走査装置、画像形成装置及び画像読み取り装置
JP2000275557A (ja) * 1999-03-26 2000-10-06 Minolta Co Ltd レーザー走査装置
US7262765B2 (en) * 1999-08-05 2007-08-28 Microvision, Inc. Apparatuses and methods for utilizing non-ideal light sources
US6661393B2 (en) * 1999-08-05 2003-12-09 Microvision, Inc. Scanned display with variation compensation
JP3349122B2 (ja) 1999-09-29 2002-11-20 松下電器産業株式会社 光走査装置
US6469729B1 (en) 1999-10-15 2002-10-22 Videojet Technologies Inc. Laser marking device and method for marking arcuate surfaces
PT102735A (pt) * 2002-03-05 2003-09-30 Ibe Ind De Bens De Equipamento Processo e maquina de corte e/ou soldadura e/ou gravacao de corpos
EP1609017A1 (de) * 2003-03-21 2005-12-28 Koninklijke Philips Electronics N.V. Post-objektiv abtastvorrichtung
US7518663B2 (en) * 2003-03-31 2009-04-14 Koninklike Philips Electronics N.V. Display device with multi-grooved light direction element and first and second alternating illuminated light sources simultaneously switched for 2D display and synchronously switched for 3D display
EP1710995A1 (de) * 2005-04-01 2006-10-11 Yuping Yang Schneller Scanner mit drehbarem Spiegel und Bildverarbeitungssystem
US7327507B2 (en) * 2005-08-02 2008-02-05 Kabushiki Kaisha Toshiba Optical beam scanning device having two sets of fθ mirrors where the mirror base and mirror face have differing coefficients of linear expansion
US7995258B2 (en) * 2007-12-06 2011-08-09 Texas Instruments Incorporated Angle diversity antispeckling in spot displays
NL2005821A (en) * 2009-12-23 2011-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate.
JP5170171B2 (ja) 2010-06-22 2013-03-27 コニカミノルタビジネステクノロジーズ株式会社 光走査装置
CN110567970B (zh) * 2019-09-23 2021-11-12 上海御微半导体技术有限公司 一种边缘缺陷检测装置及方法
JP2021110698A (ja) * 2020-01-15 2021-08-02 株式会社Xtia 光学式三次元形状測定装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3365724A (en) * 1965-12-20 1968-01-23 Dresser Systems Inc Dual presentation oscillographic recorder
US3881801A (en) * 1973-09-19 1975-05-06 Eltra Corp Optical scanning system
GB1567604A (en) * 1976-02-02 1980-05-21 Rank Organisation Ltd Optical system
US4265510A (en) * 1979-05-16 1981-05-05 Hughes Aircraft Company Three mirror anastigmatic optical system
DE3404407C1 (de) * 1984-02-08 1985-08-22 Mergenthaler Linotype Gmbh, 6236 Eschborn Optisch-mechanischer Ablenker
JPS60257417A (ja) * 1984-06-04 1985-12-19 Fuji Xerox Co Ltd 光ビ−ム走査装置
DE3431540A1 (de) * 1984-07-02 1986-03-06 Elektro Optik Gmbh & Co Kg Verfahren zur korrektur der sphaerischen aberration und des astigmatismus eines ausmittigen lichtbuendels in einer spiegeloptik
SE451636B (sv) * 1985-03-22 1987-10-19 Pharos Ab Optisk skanneranordning
US4836666A (en) * 1986-05-29 1989-06-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Compensation for primary reflector wavefront error

Also Published As

Publication number Publication date
EP0351011B1 (de) 1994-01-05
US5013108A (en) 1991-05-07
DE68912008T2 (de) 1994-07-21
JPH0284612A (ja) 1990-03-26
JP2920194B2 (ja) 1999-07-19
EP0351011A1 (de) 1990-01-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee