DE60328131D1 - Varactorvorrichtungen und verfahren - Google Patents
Varactorvorrichtungen und verfahrenInfo
- Publication number
- DE60328131D1 DE60328131D1 DE60328131T DE60328131T DE60328131D1 DE 60328131 D1 DE60328131 D1 DE 60328131D1 DE 60328131 T DE60328131 T DE 60328131T DE 60328131 T DE60328131 T DE 60328131T DE 60328131 D1 DE60328131 D1 DE 60328131D1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- electrodes
- varactory
- devices
- couple
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 abstract 3
- 239000003990 capacitor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/04—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/04—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode
- H01G5/06—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode due to rotation of flat or substantially flat electrodes
- H01G5/08—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode due to rotation of flat or substantially flat electrodes becoming active in succession
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/04—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode
- H01G5/10—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode due to rotation of helical electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
- H01G5/18—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes due to change in inclination, e.g. by flexing, by spiral wrapping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/38—Multiple capacitors, e.g. ganged
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/10—Auxiliary devices for switching or interrupting
- H01P1/12—Auxiliary devices for switching or interrupting by mechanical chopper
- H01P1/127—Strip line switches
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Saccharide Compounds (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43345402P | 2002-12-13 | 2002-12-13 | |
PCT/US2003/039806 WO2004055935A1 (en) | 2002-12-13 | 2003-12-15 | Varactor apparatuses and methods |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60328131D1 true DE60328131D1 (de) | 2009-08-06 |
Family
ID=32595192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60328131T Expired - Lifetime DE60328131D1 (de) | 2002-12-13 | 2003-12-15 | Varactorvorrichtungen und verfahren |
Country Status (6)
Country | Link |
---|---|
US (4) | US7180145B2 (de) |
EP (3) | EP2096704B1 (de) |
AT (1) | ATE434839T1 (de) |
AU (1) | AU2003300925A1 (de) |
DE (1) | DE60328131D1 (de) |
WO (1) | WO2004055935A1 (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004055935A1 (en) * | 2002-12-13 | 2004-07-01 | Wispry, Inc. | Varactor apparatuses and methods |
US20060065916A1 (en) | 2004-09-29 | 2006-03-30 | Xubai Zhang | Varactors and methods of manufacture and use |
EP1807856B1 (de) * | 2004-10-27 | 2011-12-07 | Epcos Ag | Federstruktur für mems-vorrichtung |
US20080147058A1 (en) * | 2005-06-13 | 2008-06-19 | Horrell Robin S | Electrocautery system, provided with safe lighting during operational use |
FR2889371A1 (fr) * | 2005-07-29 | 2007-02-02 | Commissariat Energie Atomique | Dispositif de conversion de l'energie mecanique en energie electrique par cycle de charges et de decharges electriques sur les peignes d'un condensateur |
WO2007072407A2 (en) * | 2005-12-22 | 2007-06-28 | Nxp B.V. | Arrangement of mems devices having series coupled capacitors |
US7489004B2 (en) * | 2006-01-24 | 2009-02-10 | Stmicroelectronics S.R.L. | Micro-electro-mechanical variable capacitor for radio frequency applications with reduced influence of a surface roughness |
WO2008070115A2 (en) * | 2006-12-05 | 2008-06-12 | Wispry, Inc. | Substrates with slotted metals and related methods |
JP4910679B2 (ja) * | 2006-12-21 | 2012-04-04 | 株式会社ニコン | 可変キャパシタ、可変キャパシタ装置、高周波回路用フィルタ及び高周波回路 |
US7718458B2 (en) * | 2007-09-11 | 2010-05-18 | Xerox Corporation | Electric field concentration minimization for MEMS |
JP4477051B2 (ja) | 2007-09-12 | 2010-06-09 | 株式会社東芝 | 半導体集積回路及びmems型可変容量キャパシタの制御方法 |
US8363380B2 (en) | 2009-05-28 | 2013-01-29 | Qualcomm Incorporated | MEMS varactors |
US8493138B2 (en) * | 2009-08-26 | 2013-07-23 | Hewlett-Packard Development Company, L.P. | Memcapacitive devices |
US8218228B2 (en) | 2009-12-18 | 2012-07-10 | Qualcomm Mems Technologies, Inc. | Two-terminal variable capacitance MEMS device |
US20110148837A1 (en) * | 2009-12-18 | 2011-06-23 | Qualcomm Mems Technologies, Inc. | Charge control techniques for selectively activating an array of devices |
US8570705B2 (en) * | 2010-01-15 | 2013-10-29 | Wispry, Inc. | MEMS sprung cantilever tunable capacitors and methods |
DE112011101135B4 (de) * | 2010-03-29 | 2021-02-11 | X-Celeprint Limited | Elektrisch verbundene Felder von aktiven Bauteilen in Überführungsdrucktechnik |
US9161448B2 (en) | 2010-03-29 | 2015-10-13 | Semprius, Inc. | Laser assisted transfer welding process |
US8490495B2 (en) | 2010-05-05 | 2013-07-23 | Consensic, Inc. | Capacitive pressure sensor with vertical electrical feedthroughs and method to make the same |
US8921144B2 (en) | 2010-06-25 | 2014-12-30 | International Business Machines Corporation | Planar cavity MEMS and related structures, methods of manufacture and design structures |
WO2012161690A1 (en) * | 2011-05-23 | 2012-11-29 | Senodia Technologies (Shanghai) Co., Ltd. | Mems devices sensing both rotation and acceleration |
KR102005335B1 (ko) | 2011-09-02 | 2019-07-30 | 카벤디시 키네틱스, 인크. | 향상된 rf 성능의 mems 가변 커패시터 |
US9412727B2 (en) | 2011-09-20 | 2016-08-09 | Semprius, Inc. | Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion |
US9413337B2 (en) | 2012-04-30 | 2016-08-09 | Wispry, Inc. | Mixed-technology combination of programmable elements |
CN108281286B (zh) * | 2012-09-20 | 2020-04-07 | 维斯普瑞公司 | 微机电系统(mems)可变电容器装置及相关方法 |
CN104051385B (zh) * | 2013-03-13 | 2017-06-13 | 台湾积体电路制造股份有限公司 | 堆叠式半导体结构及其形成方法 |
US9443657B1 (en) | 2013-12-10 | 2016-09-13 | Tdk Corporation | Piezo controlled variable capacitor |
US9424994B2 (en) | 2013-12-10 | 2016-08-23 | Tdk Corporation | Tunable interdigitated capacitor |
US9474150B2 (en) | 2013-12-10 | 2016-10-18 | Tdk Corporation | Transmission line filter with tunable capacitor |
CN106463311B (zh) * | 2014-04-01 | 2019-01-22 | 维斯普瑞公司 | 减少rf mems致动器元件中表面介电充电的系统、装置和方法 |
US9576737B2 (en) * | 2014-04-14 | 2017-02-21 | Kabushiki Kaisha Toshiba | Parallel capacitor and high frequency semiconductor device |
CN117198903A (zh) | 2014-07-20 | 2023-12-08 | 艾克斯展示公司技术有限公司 | 用于微转贴印刷的设备及方法 |
US9704821B2 (en) | 2015-08-11 | 2017-07-11 | X-Celeprint Limited | Stamp with structured posts |
US9799279B1 (en) | 2016-09-15 | 2017-10-24 | Essential Products, Inc. | Electronic display with a relief |
DE102017200111B3 (de) * | 2017-01-05 | 2018-03-15 | Robert Bosch Gmbh | Mikromechanische Schallwandleranordnung und entsprechendes Herstellungsverfahren |
US10748793B1 (en) | 2019-02-13 | 2020-08-18 | X Display Company Technology Limited | Printing component arrays with different orientations |
US11487925B1 (en) * | 2021-07-02 | 2022-11-01 | Changxin Memory Technologies, Inc. | Simulation method, apparatus, and device, and storage medium |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4954789A (en) * | 1989-09-28 | 1990-09-04 | Texas Instruments Incorporated | Spatial light modulator |
US5051643A (en) * | 1990-08-30 | 1991-09-24 | Motorola, Inc. | Electrostatically switched integrated relay and capacitor |
US5526172A (en) * | 1993-07-27 | 1996-06-11 | Texas Instruments Incorporated | Microminiature, monolithic, variable electrical signal processor and apparatus including same |
US5880921A (en) * | 1997-04-28 | 1999-03-09 | Rockwell Science Center, Llc | Monolithically integrated switched capacitor bank using micro electro mechanical system (MEMS) technology |
US6127908A (en) * | 1997-11-17 | 2000-10-03 | Massachusetts Institute Of Technology | Microelectro-mechanical system actuator device and reconfigurable circuits utilizing same |
US6094102A (en) * | 1999-04-30 | 2000-07-25 | Rockwell Science Center, Llc | Frequency synthesizer using micro electro mechanical systems (MEMS) technology and method |
US6143997A (en) * | 1999-06-04 | 2000-11-07 | The Board Of Trustees Of The University Of Illinois | Low actuation voltage microelectromechanical device and method of manufacture |
US6215644B1 (en) * | 1999-09-09 | 2001-04-10 | Jds Uniphase Inc. | High frequency tunable capacitors |
US6496351B2 (en) * | 1999-12-15 | 2002-12-17 | Jds Uniphase Inc. | MEMS device members having portions that contact a substrate and associated methods of operating |
US6229684B1 (en) | 1999-12-15 | 2001-05-08 | Jds Uniphase Inc. | Variable capacitor and associated fabrication method |
US6362018B1 (en) * | 2000-02-02 | 2002-03-26 | Motorola, Inc. | Method for fabricating MEMS variable capacitor with stabilized electrostatic drive |
US6341039B1 (en) * | 2000-03-03 | 2002-01-22 | Axsun Technologies, Inc. | Flexible membrane for tunable fabry-perot filter |
US6388438B1 (en) * | 2000-04-28 | 2002-05-14 | The United States Of America As Represented By The Secretary Of The Navy | Speed sensing circuit for underwater projectiles |
US6507475B1 (en) * | 2000-06-27 | 2003-01-14 | Motorola, Inc. | Capacitive device and method of manufacture |
US6377438B1 (en) * | 2000-10-23 | 2002-04-23 | Mcnc | Hybrid microelectromechanical system tunable capacitor and associated fabrication methods |
US6437965B1 (en) * | 2000-11-28 | 2002-08-20 | Harris Corporation | Electronic device including multiple capacitance value MEMS capacitor and associated methods |
US6418006B1 (en) * | 2000-12-20 | 2002-07-09 | The Board Of Trustees Of The University Of Illinois | Wide tuning range variable MEMs capacitor |
US6426687B1 (en) * | 2001-05-22 | 2002-07-30 | The Aerospace Corporation | RF MEMS switch |
US6717496B2 (en) * | 2001-11-13 | 2004-04-06 | The Board Of Trustees Of The University Of Illinois | Electromagnetic energy controlled low actuation voltage microelectromechanical switch |
US6714105B2 (en) * | 2002-04-26 | 2004-03-30 | Motorola, Inc. | Micro electro-mechanical system method |
US6897537B2 (en) * | 2002-06-13 | 2005-05-24 | Wispry, Inc. | Micro-electro-mechanical system (MEMS) variable capacitor apparatuses and related methods |
US6933808B2 (en) | 2002-07-17 | 2005-08-23 | Qing Ma | Microelectromechanical apparatus and methods for surface acoustic wave switching |
WO2004055935A1 (en) * | 2002-12-13 | 2004-07-01 | Wispry, Inc. | Varactor apparatuses and methods |
US6798029B2 (en) * | 2003-05-09 | 2004-09-28 | International Business Machines Corporation | Method of fabricating micro-electromechanical switches on CMOS compatible substrates |
-
2003
- 2003-12-15 WO PCT/US2003/039806 patent/WO2004055935A1/en not_active Application Discontinuation
- 2003-12-15 AU AU2003300925A patent/AU2003300925A1/en not_active Abandoned
- 2003-12-15 EP EP09163515.1A patent/EP2096704B1/de not_active Expired - Lifetime
- 2003-12-15 EP EP03813447A patent/EP1588453B1/de not_active Expired - Lifetime
- 2003-12-15 DE DE60328131T patent/DE60328131D1/de not_active Expired - Lifetime
- 2003-12-15 EP EP09163512.8A patent/EP2096703B1/de not_active Expired - Lifetime
- 2003-12-15 US US10/736,283 patent/US7180145B2/en not_active Expired - Lifetime
- 2003-12-15 AT AT03813447T patent/ATE434839T1/de not_active IP Right Cessation
-
2005
- 2005-05-05 US US11/122,379 patent/US7388316B2/en not_active Expired - Lifetime
- 2005-12-20 US US11/313,238 patent/US7361962B2/en not_active Expired - Lifetime
- 2005-12-20 US US11/313,300 patent/US7586164B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20060291134A1 (en) | 2006-12-28 |
EP2096703B1 (de) | 2016-05-04 |
WO2004055935A1 (en) | 2004-07-01 |
AU2003300925A1 (en) | 2004-07-09 |
EP2096704B1 (de) | 2017-06-21 |
WO2004055935A9 (en) | 2004-09-10 |
EP1588453A4 (de) | 2006-08-09 |
US20040173876A1 (en) | 2004-09-09 |
EP1588453B1 (de) | 2009-06-24 |
US7180145B2 (en) | 2007-02-20 |
US20050224916A1 (en) | 2005-10-13 |
EP2096704A1 (de) | 2009-09-02 |
US7361962B2 (en) | 2008-04-22 |
US7388316B2 (en) | 2008-06-17 |
ATE434839T1 (de) | 2009-07-15 |
US20060291135A1 (en) | 2006-12-28 |
US7586164B2 (en) | 2009-09-08 |
EP1588453A1 (de) | 2005-10-26 |
EP2096703A1 (de) | 2009-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |