DE60313660D1 - Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät - Google Patents

Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät

Info

Publication number
DE60313660D1
DE60313660D1 DE60313660T DE60313660T DE60313660D1 DE 60313660 D1 DE60313660 D1 DE 60313660D1 DE 60313660 T DE60313660 T DE 60313660T DE 60313660 T DE60313660 T DE 60313660T DE 60313660 D1 DE60313660 D1 DE 60313660D1
Authority
DE
Germany
Prior art keywords
saf
antiferromagnetic coupling
layer
coupling layer
antiferromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60313660T
Other languages
English (en)
Other versions
DE60313660T2 (de
Inventor
Jason Allen Janesky
Bradley N Engel
Nicholas D Rizzo
Jon M Slaughter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP USA Inc
Original Assignee
Freescale Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Freescale Semiconductor Inc filed Critical Freescale Semiconductor Inc
Publication of DE60313660D1 publication Critical patent/DE60313660D1/de
Application granted granted Critical
Publication of DE60313660T2 publication Critical patent/DE60313660T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
DE60313660T 2002-12-18 2003-10-28 Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät Expired - Fee Related DE60313660T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US322979 2002-12-18
US10/322,979 US6898112B2 (en) 2002-12-18 2002-12-18 Synthetic antiferromagnetic structure for magnetoelectronic devices
PCT/US2003/034213 WO2004061467A1 (en) 2002-12-18 2003-10-28 Synthetic antiferromagnetic structure for magnetoelectronic devices

Publications (2)

Publication Number Publication Date
DE60313660D1 true DE60313660D1 (de) 2007-06-14
DE60313660T2 DE60313660T2 (de) 2007-09-06

Family

ID=32593080

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60313660T Expired - Fee Related DE60313660T2 (de) 2002-12-18 2003-10-28 Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät

Country Status (10)

Country Link
US (2) US6898112B2 (de)
EP (1) EP1579231B1 (de)
JP (1) JP2006511957A (de)
KR (1) KR20050085721A (de)
CN (1) CN100507591C (de)
AT (1) ATE361475T1 (de)
AU (1) AU2003285059A1 (de)
DE (1) DE60313660T2 (de)
TW (1) TWI315907B (de)
WO (1) WO2004061467A1 (de)

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US6992910B1 (en) * 2004-11-18 2006-01-31 Maglabs, Inc. Magnetic random access memory with three or more stacked toggle memory cells and method for writing a selected cell
US7129098B2 (en) * 2004-11-24 2006-10-31 Freescale Semiconductor, Inc. Reduced power magnetoresistive random access memory elements
US7301801B2 (en) * 2005-10-28 2007-11-27 International Business Machines Corporation Tuned pinned layers for magnetic tunnel junctions with multicomponent free layers
US7368301B2 (en) * 2006-01-27 2008-05-06 Magic Technologies, Inc. Magnetic random access memory with selective toggle memory cells
US7280389B2 (en) * 2006-02-08 2007-10-09 Magic Technologies, Inc. Synthetic anti-ferromagnetic structure with non-magnetic spacer for MRAM applications
US7432150B2 (en) * 2006-02-10 2008-10-07 Everspin Technologies, Inc. Method of manufacturing a magnetoelectronic device
TWI307507B (en) * 2006-10-20 2009-03-11 Ind Tech Res Inst Magnetic tunnel junction devices and magnetic random access memory
US7820455B2 (en) * 2008-03-31 2010-10-26 Hitachi Global Storage Technologies Netherlands B.V. Method for manufacturing a tunnel junction magnetoresistive sensor with improved performance and having a CoFeB free layer
GB2465370A (en) * 2008-11-13 2010-05-19 Ingenia Holdings Magnetic data storage comprising a synthetic anti-ferromagnetic stack arranged to maintain solitons
US8257596B2 (en) * 2009-04-30 2012-09-04 Everspin Technologies, Inc. Two-axis magnetic field sensor with substantially orthogonal pinning directions
US7965543B2 (en) * 2009-04-30 2011-06-21 Everspin Technologies, Inc. Method for reducing current density in a magnetoelectronic device
US8580580B2 (en) 2010-04-01 2013-11-12 Seagate Technology Llc Magnetic element with varying areal extents
GB201015497D0 (en) 2010-09-16 2010-10-27 Cambridge Entpr Ltd Magnetic data storage
GB201020727D0 (en) 2010-12-07 2011-01-19 Cambridge Entpr Ltd Magnetic structure
US20120267733A1 (en) 2011-04-25 2012-10-25 International Business Machines Corporation Magnetic stacks with perpendicular magnetic anisotropy for spin momentum transfer magnetoresistive random access memory
TWI450284B (zh) * 2011-10-19 2014-08-21 Nat Univ Chung Cheng 具有垂直異向性之合成反鐵磁結構及其製法
US8611053B2 (en) * 2012-03-08 2013-12-17 HGST Netherlands B.V. Current-perpendicular-to-the-plane (CPP) magnetoresistive sensor with multilayer reference layer including a Heusler alloy
US9324939B2 (en) 2014-07-01 2016-04-26 Qualcomm Incorporated Synthetic antiferromagnet (SAF) coupled free layer for perpendicular magnetic tunnel junction (p-MTJ)
US10158065B2 (en) 2014-07-07 2018-12-18 Intel Corporation Spin-transfer torque memory (STTM) devices having magnetic contacts
CN104833928B (zh) * 2015-04-30 2017-09-29 国网四川省电力公司电力科学研究院 一种大型电力变压器剩磁检测方法
CN105093140B (zh) * 2015-08-19 2018-03-20 国网四川省电力公司阿坝供电公司 一种变压器剩磁检测及消磁的方法及其装置
US9659586B1 (en) 2015-11-12 2017-05-23 Seagate Technology Llc Reader with free layer experiencing opposite phase-shifted media torques
US9837602B2 (en) * 2015-12-16 2017-12-05 Western Digital Technologies, Inc. Spin-orbit torque bit design for improved switching efficiency
US10032978B1 (en) * 2017-06-27 2018-07-24 Spin Transfer Technologies, Inc. MRAM with reduced stray magnetic fields
CN108894794B (zh) * 2018-07-20 2024-02-27 陈成军 掘进流水线及其掘进作业方法
CN111725386B (zh) * 2019-09-23 2022-06-10 中国科学院上海微系统与信息技术研究所 一种磁性存储器件及其制作方法、存储器和神经网络系统
CN112635651A (zh) * 2019-10-08 2021-04-09 上海磁宇信息科技有限公司 磁性隧道结结构及磁性随机存储器
US11258005B2 (en) * 2019-10-17 2022-02-22 United Microelectronics Corp. Magnetoresistive random access memory device and method for fabricating the same
US11500042B2 (en) 2020-02-28 2022-11-15 Brown University Magnetic sensing devices based on interlayer exchange-coupled magnetic thin films
US11393495B2 (en) 2020-03-26 2022-07-19 Seagate Technology Llc Reader with a multi-layer synthetic ferrimagnet free layer

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Also Published As

Publication number Publication date
AU2003285059A1 (en) 2004-07-29
TW200419773A (en) 2004-10-01
WO2004061467A1 (en) 2004-07-22
ATE361475T1 (de) 2007-05-15
EP1579231B1 (de) 2007-05-02
EP1579231A1 (de) 2005-09-28
JP2006511957A (ja) 2006-04-06
US7235408B2 (en) 2007-06-26
US20050153063A1 (en) 2005-07-14
TWI315907B (en) 2009-10-11
US20040120184A1 (en) 2004-06-24
KR20050085721A (ko) 2005-08-29
US6898112B2 (en) 2005-05-24
CN100507591C (zh) 2009-07-01
DE60313660T2 (de) 2007-09-06
CN1726400A (zh) 2006-01-25

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