DE60310625D1 - Haltevorrichtung für geschnittene Bauteile und Verfahren zum Waschen davon - Google Patents

Haltevorrichtung für geschnittene Bauteile und Verfahren zum Waschen davon

Info

Publication number
DE60310625D1
DE60310625D1 DE60310625T DE60310625T DE60310625D1 DE 60310625 D1 DE60310625 D1 DE 60310625D1 DE 60310625 T DE60310625 T DE 60310625T DE 60310625 T DE60310625 T DE 60310625T DE 60310625 D1 DE60310625 D1 DE 60310625D1
Authority
DE
Germany
Prior art keywords
washing
holding device
cut components
cut
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60310625T
Other languages
English (en)
Other versions
DE60310625T2 (de
Inventor
Hiroyuki Tsuji
Kitamura Kazumasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Publication of DE60310625D1 publication Critical patent/DE60310625D1/de
Application granted granted Critical
Publication of DE60310625T2 publication Critical patent/DE60310625T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G13/00Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/08Shaping or machining of piezoelectric or electrostrictive bodies
    • H10N30/085Shaping or machining of piezoelectric or electrostrictive bodies by machining
    • H10N30/088Shaping or machining of piezoelectric or electrostrictive bodies by machining by cutting or dicing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/09Forming piezoelectric or electrostrictive materials
    • H10N30/093Forming inorganic materials
    • H10N30/097Forming inorganic materials by sintering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2041Beam type
    • H10N30/2042Cantilevers, i.e. having one fixed end
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062Prior to assembly
    • Y10T156/1067Continuous longitudinal slitting
DE60310625T 2002-02-06 2003-02-06 Haltevorrichtung für geschnittene Bauteile und Verfahren zum Waschen davon Expired - Lifetime DE60310625T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002029448A JP3978345B2 (ja) 2002-02-06 2002-02-06 切断加工部品保持構造の形成方法および切断加工部品の製造方法
JP2002029448 2002-02-06

Publications (2)

Publication Number Publication Date
DE60310625D1 true DE60310625D1 (de) 2007-02-08
DE60310625T2 DE60310625T2 (de) 2007-10-11

Family

ID=27621371

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60310625T Expired - Lifetime DE60310625T2 (de) 2002-02-06 2003-02-06 Haltevorrichtung für geschnittene Bauteile und Verfahren zum Waschen davon

Country Status (4)

Country Link
US (1) US7122091B2 (de)
EP (1) EP1337138B1 (de)
JP (1) JP3978345B2 (de)
DE (1) DE60310625T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4497893B2 (ja) * 2003-11-07 2010-07-07 日本碍子株式会社 振動子の支持構造の製造方法
WO2008079491A2 (en) * 2006-10-20 2008-07-03 Electronic Plastics, Llc Decentralized secure transaction system
DE102008051609A1 (de) * 2008-10-07 2010-04-08 Gustav Magenwirth Gmbh & Co. Kg Drehgriffeinheit

Family Cites Families (28)

* Cited by examiner, † Cited by third party
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US3084403A (en) * 1960-10-07 1963-04-09 Elmendorf Armin Roll-wall
JPS576982B2 (de) 1973-09-14 1982-02-08
US4166001A (en) * 1974-06-21 1979-08-28 Kimberly-Clark Corporation Multiple layer formation process for creped tissue
CH628926A5 (de) * 1977-02-16 1982-03-31 Guenter Schwarz Mehrschichtiges klebematerial.
JPS53112590A (en) 1977-03-11 1978-10-02 Matsushita Electric Ind Co Ltd Method for forming cut grooves
US4356676A (en) * 1981-09-21 1982-11-02 Norton Company Sealant strip
US5675212A (en) * 1992-04-10 1997-10-07 Candescent Technologies Corporation Spacer structures for use in flat panel displays and methods for forming same
JPS59213486A (ja) 1983-05-17 1984-12-03 日立金属株式会社 薄板状物品の洗浄方法
JPS6355986A (ja) 1986-08-26 1988-03-10 Nec Corp 電歪効果素子の製造方法
US4748396A (en) * 1986-11-25 1988-05-31 Valentin Pechorin Electric cell and method of producing electricity
JPH01244682A (ja) 1988-03-25 1989-09-29 Hitachi Metals Ltd 複合圧電体の製造方法
JPH0298179A (ja) 1988-10-04 1990-04-10 Nec Corp セラミック電子部品の製造方法
JPH05169425A (ja) 1991-12-19 1993-07-09 Nippon Chemicon Corp セラミック材料の切断方法
KR970002997B1 (ko) * 1993-05-04 1997-03-13 대우전자 주식회사 투사형화상표시장치용 광로조절장치의 제조방법
JPH08103978A (ja) * 1994-10-04 1996-04-23 Yokohama Rubber Co Ltd:The ハニカムコアの製造方法及びその装置
US5704105A (en) * 1996-09-04 1998-01-06 General Electric Company Method of manufacturing multilayer array ultrasonic transducers
GB2320615B (en) * 1996-12-19 2001-06-20 Lintec Corp Process for producing a chip and pressure sensitive adhesive sheet for said process
US6312800B1 (en) * 1997-02-10 2001-11-06 Lintec Corporation Pressure sensitive adhesive sheet for producing a chip
JP3955659B2 (ja) * 1997-06-12 2007-08-08 リンテック株式会社 電子部品のダイボンディング方法およびそれに使用されるダイボンディング装置
US6210514B1 (en) * 1998-02-11 2001-04-03 Xerox Corporation Thin film structure machining and attachment
JP2000074739A (ja) 1998-08-31 2000-03-14 Matsushita Electric Ind Co Ltd 電子部品の製造方法
JP3399415B2 (ja) * 1999-09-27 2003-04-21 株式会社村田製作所 センサアレイ、センサアレイの製造方法および超音波診断装置
FR2798902B1 (fr) * 1999-09-29 2001-11-23 Gaz Transport & Technigaz Cuve etanche et thermiquement isolante integree dans une structure porteuse de navire et procede de fabrication de caissons isolants destines a etre utilises dans cette cuve
JP4058223B2 (ja) 1999-10-01 2008-03-05 日本碍子株式会社 圧電/電歪デバイス及びその製造方法
JP2001284163A (ja) 2000-04-03 2001-10-12 Matsushita Electric Ind Co Ltd 積層セラミック電子部品の製造方法
JP4566439B2 (ja) 2001-03-30 2010-10-20 日本碍子株式会社 圧電/電歪デバイスおよびその製造方法
JP3873592B2 (ja) 2000-08-02 2007-01-24 セイコーエプソン株式会社 圧電デバイスの製造方法
US6484789B1 (en) * 2001-06-01 2002-11-26 Ronald S. Ober Self supporting filler for closing an opening through a structure

Also Published As

Publication number Publication date
EP1337138A3 (de) 2004-04-28
US20030178216A1 (en) 2003-09-25
US7122091B2 (en) 2006-10-17
JP2003234519A (ja) 2003-08-22
JP3978345B2 (ja) 2007-09-19
EP1337138B1 (de) 2006-12-27
EP1337138A2 (de) 2003-08-20
DE60310625T2 (de) 2007-10-11

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: TSUJI, HIROYUKI, NAGOYA CITY, AICHI-KEN, 467-8, JP

Inventor name: KITAMURA, KAZUMASA, NAGOYA CITY, AICHI-KEN, 46, JP

8364 No opposition during term of opposition