DE60236532D1 - Abtastinterferometer für asphärische oberflächen und wellenfronten - Google Patents

Abtastinterferometer für asphärische oberflächen und wellenfronten

Info

Publication number
DE60236532D1
DE60236532D1 DE60236532T DE60236532T DE60236532D1 DE 60236532 D1 DE60236532 D1 DE 60236532D1 DE 60236532 T DE60236532 T DE 60236532T DE 60236532 T DE60236532 T DE 60236532T DE 60236532 D1 DE60236532 D1 DE 60236532D1
Authority
DE
Germany
Prior art keywords
aspharic
interferometer
scratch
wave fronts
fronts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60236532T
Other languages
English (en)
Inventor
Michael Kuechel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Application granted granted Critical
Publication of DE60236532D1 publication Critical patent/DE60236532D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/65—Spatial scanning object beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
DE60236532T 2001-11-16 2002-11-15 Abtastinterferometer für asphärische oberflächen und wellenfronten Expired - Lifetime DE60236532D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33868901P 2001-11-16 2001-11-16
PCT/US2002/036733 WO2003044456A1 (en) 2001-11-16 2002-11-15 Scanning interferometer for aspheric surfaces and wavefronts

Publications (1)

Publication Number Publication Date
DE60236532D1 true DE60236532D1 (de) 2010-07-08

Family

ID=23325746

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60236532T Expired - Lifetime DE60236532D1 (de) 2001-11-16 2002-11-15 Abtastinterferometer für asphärische oberflächen und wellenfronten

Country Status (5)

Country Link
US (1) US6879402B2 (de)
EP (1) EP1444482B1 (de)
JP (1) JP4312602B2 (de)
DE (1) DE60236532D1 (de)
WO (1) WO2003044456A1 (de)

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US8668735B2 (en) 2000-09-12 2014-03-11 Revision Optics, Inc. Corneal implant storage and delivery devices
US6972849B2 (en) * 2001-07-09 2005-12-06 Kuechel Michael Scanning interferometer for aspheric surfaces and wavefronts
US6879402B2 (en) * 2001-11-16 2005-04-12 Zygo Corporation Scanning interferometer for aspheric surfaces and wavefronts
US7218403B2 (en) * 2002-06-26 2007-05-15 Zygo Corporation Scanning interferometer for aspheric surfaces and wavefronts
JP4062606B2 (ja) * 2003-01-20 2008-03-19 フジノン株式会社 低可干渉測定／高可干渉測定共用干渉計装置およびその測定方法
GB2404014B (en) * 2003-07-18 2006-06-28 Taylor Hobson Ltd Surface profiling method and apparatus
US6943896B2 (en) 2003-10-20 2005-09-13 Zygo Corporation Reconfigurable interferometer system
US7212291B2 (en) * 2003-12-18 2007-05-01 Zygo Corporation Interferometric microscopy using reflective optics for complex surface shapes
GB0402941D0 (en) * 2004-02-11 2004-03-17 Qinetiq Ltd Surface shape measurement
US8057541B2 (en) 2006-02-24 2011-11-15 Revision Optics, Inc. Method of using small diameter intracorneal inlays to treat visual impairment
US10835371B2 (en) 2004-04-30 2020-11-17 Rvo 2.0, Inc. Small diameter corneal inlay methods
US7776086B2 (en) * 2004-04-30 2010-08-17 Revision Optics, Inc. Aspherical corneal implant
US7405830B2 (en) * 2004-08-20 2008-07-29 Korea Advanced Institute Of Science And Technology (Kaist) Vibration-insensitive interferometer
US7405833B2 (en) * 2004-11-05 2008-07-29 Zygo Corporation Method for calibration and removal of wavefront errors
US7522292B2 (en) 2005-03-11 2009-04-21 Carl Zeiss Smt Ag System and method for determining a shape of a surface of an object and method of manufacturing an object having a surface of a predetermined shape
US20070129797A1 (en) * 2005-12-01 2007-06-07 Revision Optics, Inc. Intracorneal inlays
US7545511B1 (en) 2006-01-13 2009-06-09 Applied Science Innovations, Inc. Transmitted wavefront metrology of optics with high aberrations
US8743373B1 (en) 2006-01-13 2014-06-03 Applied Science Innovations, Inc. Metrology of optics with high aberrations
US8018602B1 (en) 2006-01-13 2011-09-13 Applied Science Innovations, Inc. Metrology of optics with high aberrations
US10555805B2 (en) 2006-02-24 2020-02-11 Rvo 2.0, Inc. Anterior corneal shapes and methods of providing the shapes
DE102006035022A1 (de) * 2006-07-28 2008-01-31 Carl Zeiss Smt Ag Verfahren zum Herstellen einer optischen Komponente, Interferometeranordnung und Beugungsgitter
US7612893B2 (en) * 2006-09-19 2009-11-03 Zygo Corporation Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts
DE102006057606B4 (de) * 2006-11-24 2008-12-11 Universität Stuttgart Verfahren und Messvorrichtung zur Vermessung einer optisch glatten Oberfläche
US9549848B2 (en) 2007-03-28 2017-01-24 Revision Optics, Inc. Corneal implant inserters and methods of use
US8162953B2 (en) 2007-03-28 2012-04-24 Revision Optics, Inc. Insertion system for corneal implants
US9271828B2 (en) 2007-03-28 2016-03-01 Revision Optics, Inc. Corneal implant retaining devices and methods of use
WO2009006919A1 (en) 2007-07-09 2009-01-15 Carl Zeiss Smt Ag Method of measuring a deviation an optical surface from a target shape
EP2265217A4 (de) 2008-04-04 2018-04-04 Revision Optics, Inc. Hornhaut-inlay-design und verfahren zur sehkorrektur
US9539143B2 (en) 2008-04-04 2017-01-10 Revision Optics, Inc. Methods of correcting vision
JP5307528B2 (ja) * 2008-12-17 2013-10-02 キヤノン株式会社 測定方法及び測定装置
US8469948B2 (en) 2010-08-23 2013-06-25 Revision Optics, Inc. Methods and devices for forming corneal channels
AU2012325705B2 (en) 2011-10-21 2017-07-20 Revision Optics, Inc. Corneal implant storage and delivery devices
JP6000578B2 (ja) * 2012-03-09 2016-09-28 キヤノン株式会社 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
JP6000577B2 (ja) 2012-03-09 2016-09-28 キヤノン株式会社 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
EP2653884A1 (de) * 2012-04-16 2013-10-23 Leica Geosystems AG Elektrooptische Entfernungsmessungsvorrichtung
US9097612B2 (en) * 2012-11-30 2015-08-04 Qed Technologies International, Inc. Integrated wavefront sensor and profilometer
US9435640B2 (en) 2013-12-04 2016-09-06 Zygo Corporation Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians
US20160034036A1 (en) * 2014-07-29 2016-02-04 Umm Al-Qura University Oled multi-use intelligent curtain and method
AU2015385773A1 (en) 2015-03-12 2017-10-05 Revision Optics, Inc. Methods of correcting vision
CN106813594B (zh) * 2017-01-03 2019-02-01 中国科学院上海光学精密机械研究所 大口径掠入射反射聚焦镜高精度面形检测方法
CN109448081B (zh) * 2018-11-16 2023-04-14 武汉华工图像技术开发有限公司 无点阵全息曲线光栅计算方法及装置
CN113091637B (zh) * 2021-03-22 2022-06-28 中国科学院光电技术研究所 一种超高精度平面镜全口径中频面形测量装置及方法
DE102022207884B4 (de) 2022-07-29 2024-02-15 Carl Zeiss Smt Gmbh Messvorrichtung, Verfahren zur interferometrischen Vermessung, Bearbeitungsverfahren, optisches Element und Lithografiesystem

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US4697927A (en) 1985-11-29 1987-10-06 Kabushiki Kaisha Toshiba Method and apparatus for measuring a forming error of an object
DE3836564A1 (de) * 1988-10-27 1990-05-03 Zeiss Carl Fa Verfahren zur pruefung von optischen elementen
US5187539A (en) * 1991-09-23 1993-02-16 Rockwell International Corporation Mirror surface characteristic testing
US5416586A (en) 1993-10-15 1995-05-16 Tropel Corporation Method of testing aspherical optical surfaces with an interferometer
US5548403A (en) 1994-11-28 1996-08-20 The Regents Of The University Of California Phase shifting diffraction interferometer
US5625454A (en) * 1995-05-24 1997-04-29 Industrial Technology Research Institute Interferometric method for optically testing an object with an aspherical surface
US5844670A (en) 1995-07-28 1998-12-01 Ricoh Co., Ltd. Method of and systems for measuring eccentricity of an aspherical lens surface
EP1079253A4 (de) 1998-04-07 2004-09-01 Nikon Corp Vorrichtung und verfahren zur projektionsbelichtung, und optisches system mit reflektion und brechung
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
US6222621B1 (en) * 1998-10-12 2001-04-24 Hoyo Corporation Spectacle lens evaluation method and evaluation device
US6781700B2 (en) * 2001-06-20 2004-08-24 Kuechel Michael Scanning interferometer for aspheric surfaces and wavefronts
US6714308B2 (en) * 2001-09-04 2004-03-30 Zygo Corporation Rapid in-situ mastering of an aspheric fizeau
US6879402B2 (en) * 2001-11-16 2005-04-12 Zygo Corporation Scanning interferometer for aspheric surfaces and wavefronts

Also Published As

Publication number Publication date
EP1444482A4 (de) 2006-08-30
JP2005509875A (ja) 2005-04-14
WO2003044456A1 (en) 2003-05-30
EP1444482A1 (de) 2004-08-11
US6879402B2 (en) 2005-04-12
EP1444482B1 (de) 2010-05-26
US20030103215A1 (en) 2003-06-05
JP4312602B2 (ja) 2009-08-12

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