DE602008002087D1 - Verarbeitung von Tantal-Kondensatoren auf montierten PWAs zur Erreichung einer niedrigen Fehlerrate - Google Patents

Verarbeitung von Tantal-Kondensatoren auf montierten PWAs zur Erreichung einer niedrigen Fehlerrate

Info

Publication number
DE602008002087D1
DE602008002087D1 DE602008002087T DE602008002087T DE602008002087D1 DE 602008002087 D1 DE602008002087 D1 DE 602008002087D1 DE 602008002087 T DE602008002087 T DE 602008002087T DE 602008002087 T DE602008002087 T DE 602008002087T DE 602008002087 D1 DE602008002087 D1 DE 602008002087D1
Authority
DE
Germany
Prior art keywords
pwas
achieve
processing
error rate
low error
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008002087T
Other languages
English (en)
Inventor
Allen Michael Ritter
Todd David Greenleaf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE602008002087D1 publication Critical patent/DE602008002087D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/01—Subjecting similar articles in turn to test, e.g. "go/no-go" tests in mass production; Testing objects at points as they pass through a testing station
    • G01R31/013—Testing passive components
    • G01R31/016—Testing of capacitors
DE602008002087T 2007-04-05 2008-04-03 Verarbeitung von Tantal-Kondensatoren auf montierten PWAs zur Erreichung einer niedrigen Fehlerrate Active DE602008002087D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/730,995 US7609072B2 (en) 2007-04-05 2007-04-05 Processing tantalum capacitors on assembled PWAs to yield low failure rate

Publications (1)

Publication Number Publication Date
DE602008002087D1 true DE602008002087D1 (de) 2010-09-23

Family

ID=39591810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008002087T Active DE602008002087D1 (de) 2007-04-05 2008-04-03 Verarbeitung von Tantal-Kondensatoren auf montierten PWAs zur Erreichung einer niedrigen Fehlerrate

Country Status (4)

Country Link
US (1) US7609072B2 (de)
EP (1) EP1978370B1 (de)
JP (1) JP2008256695A (de)
DE (1) DE602008002087D1 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2505566A (en) * 2012-08-31 2014-03-05 Avx Corp Iterative screening method for electrolytic capacitors
CN106655321B (zh) * 2016-10-10 2017-11-14 东南大学 电解电容器漏电流/绝缘电阻测量仪用充放电装置及方法
US10705129B2 (en) * 2017-09-13 2020-07-07 Toshiba Memory Corporation Techniques for testing PLP capacitors
CN108957360B (zh) * 2018-09-13 2020-05-08 重庆惠科金渝光电科技有限公司 电源电路及测试装置
CN111435155B (zh) * 2018-12-25 2022-03-01 北京兆易创新科技股份有限公司 一种电容检测单元、电荷泵电路及非易失存储器
WO2021202646A1 (en) 2020-03-31 2021-10-07 Avx Corporation Screening method for electrolytic capacitors that maintains individual capacitor unit identity

Family Cites Families (27)

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Publication number Priority date Publication date Assignee Title
US3268809A (en) 1964-05-20 1966-08-23 Western Electric Co Apparatus for testing capacitors for leakage current and simultaneously for indicating whether reliable electrical contact is made thereto
GB1129003A (en) 1966-08-25 1968-10-02 Marconi Co Ltd Improvements in or relating to capacitor testing equipment
US3850764A (en) 1974-04-11 1974-11-26 Corning Glass Works Method of forming a solid tantalum capacitor
US3930993A (en) 1974-11-25 1976-01-06 Corning Glass Works Capacitor testing and sorting apparatus
US3943439A (en) 1974-12-30 1976-03-09 Zehntel, Inc. Capacitor test apparatus and method
DE2547734C3 (de) 1975-10-24 1978-12-07 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren und Vorrichtung zum Nachformieren von Trocken-Elektrolytkondensatoren
US4164455A (en) 1976-04-05 1979-08-14 Corning Glass Works Process of forming a solid tantalum capacitor
US4160284A (en) 1977-07-27 1979-07-03 Graham Magnetics, Inc. Capacitors and process for making same
US4184112A (en) 1978-03-03 1980-01-15 Cox Elbert W Capacitor testing apparatus
FR2432204A1 (fr) 1978-07-28 1980-02-22 Lignes Telegraph Telephon Procede de fabrication de condensateurs a electrolyte solide au tantale
JPS5739360A (en) * 1980-08-20 1982-03-04 Nec Corp Screening method for capacitor
JPS5746168A (en) * 1980-09-04 1982-03-16 Nec Home Electronics Ltd Method for ispecting characteristics of electronic part
US4330777A (en) 1980-11-05 1982-05-18 The United States Of America As Represented By The United States Department Of Energy Device for detecting imminent failure of high-dielectric stress capacitors
US4450049A (en) 1981-03-19 1984-05-22 Matsushita Electric Industrial Co., Ltd. Method of forming tantalum capacitor anodes and making the capacitors
JPS58102173A (ja) 1981-12-14 1983-06-17 Fujitsu Ltd コンデンサの漏洩電流測定回路
US4706375A (en) 1986-08-15 1987-11-17 Sprague Electric Company Method of forming a solid tantalum capacitor
US4781802A (en) 1987-04-27 1988-11-01 Sprague Electric Company Solid tantalum capacitor process
US5882719A (en) 1995-12-13 1999-03-16 H. C. Starck, Inc. Solid tantalum capacitor test
US6054864A (en) 1996-11-18 2000-04-25 Butts; Joseph R. In-circuit capacitor checker
JP3684802B2 (ja) 1997-05-09 2005-08-17 株式会社村田製作所 電子部品の抵抗測定装置
US6706059B2 (en) 1999-12-01 2004-03-16 Cardiac Pacemakers, Inc. Reforming wet-tantalum capacitors in implantable medical devices
US6283985B1 (en) 1999-12-01 2001-09-04 Cardiac Pacemakers, Inc. Reforming wet-tantalum capacitors in implantable defibrillators and other medical devices
JP4008173B2 (ja) * 2000-01-25 2007-11-14 株式会社 東京ウエルズ 蓄電器の絶縁抵抗測定方法および絶縁抵抗測定装置
US6509745B1 (en) 2000-09-25 2003-01-21 Detroit Diesel Corporation Method and apparatus for measuring liquid dielectric behavior
KR100400773B1 (ko) * 2001-06-29 2003-10-08 주식회사 하이닉스반도체 강유전체 랜덤 억세스 메모리의 강유전 캐패시터 테스트회로
JP2003043098A (ja) * 2001-07-27 2003-02-13 Nec Tohoku Ltd コンデンサの絶縁耐圧試験方法および試験装置
US7917217B2 (en) 2003-05-07 2011-03-29 Medtronic, Inc. Wet tantalum reformation method and apparatus

Also Published As

Publication number Publication date
EP1978370A1 (de) 2008-10-08
US7609072B2 (en) 2009-10-27
US20080246492A1 (en) 2008-10-09
JP2008256695A (ja) 2008-10-23
EP1978370B1 (de) 2010-08-11

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